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US5705230A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for filling small holes or covering small recesses in the surface of substrates

Assignee: Ebara Corp
•
Filing: 1994-10-17
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Granted: 1998-01-06
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Expires: 2014-10-17
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Abstract

Abstract The improved method comprises contacting a substrate 5 at least once by a liquid containing the elements that compose a pure metal or an alloy with which the small holes or recesses 3a in the substrate 5 are to be filled or covered, whereby the liquid wets the inner surfaces of said small holes or recesses 3a while, at the same time, said pure metal or said alloy is deposited on the surface of said substrate 5. The method is capable of filling small holes or covering small recesses in the surface of the substrate 5 with improved efficiency while, at the same time, it improves the heat resistance and materials stability of the part that contains the formed filling or covering layer.

Inventors

  • 👤 Toru Matanabe
  • 👤 Hirokazu Ezawa
  • 👤 Masahiro Miyata
  • 👤 Yukio Ikeda
  • 👤 Manabu Tsujimura
  • 👤 Hiroaki Inoue
  • 👤 Takeyuki Odaira
  • 👤 Naoaki Ogure

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:12
CPC Classifications
C; C23; C23C; C23C18/00; C23C18/16; C23C18/1601; C23C18/1603; C23C18/1607; C23C18/1608; C23C18/1612; C23C18/1633; C23C18/1646; C23C18/165; C23C18/1651; C23C18/1655; C23C18/1664; C23C18/1666; C23C18/18; C23C18/1803; C23C18/1824; C23C18/1827; C23C18/1831; H; H05; H05K; H05K3/00; H05K3/40; H05K3/42; H05K3/422; H10; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/056; H10W70/00; H10W70/01; H10W70/05; H10W70/095

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 255 words
A method of filling a recess of not more than about 1 μm in depth and width in a surface of a substrate, which comprises contacting the recess in the surface of the substrate by a solution of a mixture of potassium silver cyanide and potassium cyanide so that said solution wets inner surfaces of said recess to have a silver layer deposited, the method including applying a light energy to the surface of the substrate such that light energy is applied to the surface of the substrate including the recess while said silver layer is being deposited, thereby causing the solution to penetrate deeply to a bottom of the recess so as to permit a filling of the recess, the method further including depositing a Ni--B alloy on at least the silver filling layer by performing electroless plating using a solution of a mixture of NiSO 4 -6H 2 O, a complexing agent and a reducing agent. wherein: the step of applying a light energy includes providing a light source and directing light from said light source through a condenser lens and onto said substrate; a voltage is applied at a maximum of 20 volts to the surface of the substrate as the silver layer is deposited thereon; the voltage is applied as a pulsed waveform; and a copper layer is provided in said recess of said substrate prior to contacting said recess with the solution of a mixture of potassium silver cyanide and potassium cyanide such that said solution wets said copper layer.
Claim 2
Independent Claim 255 words
A method of filling a recess of not more than about 1 μm in depth and width in a surface of a substrate, which comprises contacting the recess in the surface of the substrate by a solution of a mixture of potassium silver cyanide and potassium cyanide so that said solution wets inner surfaces of said recess to have a silver layer deposited, the method including applying a light energy to the surface of the substrate such that light energy is applied to the surface of the substrate including the recess while said silver layer is being deposited, thereby causing the solution to penetrate deeply to a bottom of the recess so as to permit a filling of the recess, the method further including depositing a Ni--B alloy on at least the silver filling layer by performing electroless plating using a solution of a mixture of NiSO 4 -6H 2 O, a complexing agent and a reducing agent. wherein: the step of applying a light energy includes providing a light source and directing light from said light source through a condenser lens and onto said substrate; a voltage is applied at a maximum of 20 volts to the surface of the substrate as the silver layer is deposited thereon; the voltage is applied as a pulsed waveform; and a copper layer is provided in said recess of said substrate prior to contacting said recess with the solution of a mixture of potassium silver cyanide and potassium cyanide such that said solution wets said copper layer.
Claim 3
Dependent Claim 22 words
A method according to claim 1 wherein a vibration energy is applied as the silver layer and the Ni--B layer are formed.
Claim 4
Dependent Claim 17 words
A method according to claim 2 wherein the vibration energy has a frequency of 45 Hz-2.5 GHz.

References Cited (Backward Citations)

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US4217183A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2001-01-05 2001-07-07 2002-01-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2005-01-05 2005-07-07 2006-01-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2009-01-05 2009-07-07 2010-01-06 $7700.00 Window Closed / Lapsed

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