Liquid material supply apparatus and method

Claim 1

A deposition liquid material supply apparatus for supplying through pipes a low vapor pressure liquid material for deposition to a deposition chamber for depositing films on objects to be processed, the apparatus comprising: a reservoir for storing the low vapor pressure liquid material; an evaporator for exposing the low vapor pressure liquid material to a high flow rate gas to evaporate the liquid material; a pressurization passage for pushing out the low vapor pressure liquid material by a pressure gas separately supplied by means connected to the reservoir; a pressure liquid supply passage interconnecting the reservoir and the evaporator; a flow rate control unit inserted in the pressure liquid supply passage for controlling a flow rate of the low vapor pressure liquid material flowing through the pressure liquid supply passage; a vapor feed passage interconnecting the evaporator and the deposition chamber for flowing evaporated gas; and heating means disposed in the vapor feed passage for preventing the evaporated liquid material from reliquefying, wherein the pressure liquid supply passage and the vapor feed passage are connected to a discharge passage for low vapor pressure liquid material residue and gas residue in the pressure liquid supply passage and the evaporator through respective discharge shut-off valves, and the pressure liquid supply passage is connected to a purge liquid supply passage with a purge liquid supply valve inserted therein so as to clean the interior of the pressure liquid supply passage with a purge liquid when required, and discharge the used purge liquid through the discharge passage.