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US5680428A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for holding an object

Assignee: Canon Inc
•
Filing: 1995-08-28
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Granted: 1997-10-21
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Expires: 2015-08-28
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Abstract

Abstract Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

Inventors

  • 👤 Mitsuaki Amemiya
  • 👤 Shunichi Uzawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-07 12:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70716; G03F7/70783; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875; Y; Y10; Y10T; Y10T279/00; Y10T279/11

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 85 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; measuring a strain of the object held on the chuck; detecting whether the measured strain falls within a tolerance range; performing the following steps when the measured strain falls out of the tolerance range: releasing the holding of the object; correcting the size of the object; and holding the object again on the chuck while maintaining the corrected size; and exposing the object held on the chuck.
Claim 2
Dependent Claim 85 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; measuring a strain of the object held on the chuck; detecting whether the measured strain falls within a tolerance range; performing the following steps when the measured strain falls out of the tolerance range: releasing the holding of the object; correcting the size of the object; and holding the object again on the chuck while maintaining the corrected size; and exposing the object held on the chuck.
Claim 3
Dependent Claim 27 words
A process according to claim 1, wherein said object is a wafer, and wherein said exposing step comprises the step of forming a pattern on the wafer.
Claim 4
Dependent Claim 24 words
A process according to claim 2, wherein said exposing step is performed when a mask and the wafer are positioned close to one another.
Claim 5
Dependent Claim 21 words
A process according to claim 3, wherein said exposing step comprises the step of exposing the object to an x-ray beam.
Claim 6
Dependent Claim 13 words
A process according to claim 1, wherein the strain is a process strain.
Claim 7
Dependent Claim 20 words
A process according to claim 1, wherein said correcting step comprises the step of changing the temperature of the object.
Claim 8
Dependent Claim 75 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; releasing the object from the chuck; correcting the size of the object by setting the temperature of the object which is different from the temperature of the chuck; holding the object again on the chuck while maintaining the corrected size regardless of the temperature of the object; and exposing the object held on the chuck with radiation.
Claim 9
Dependent Claim 75 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; releasing the object from the chuck; correcting the size of the object by setting the temperature of the object which is different from the temperature of the chuck; holding the object again on the chuck while maintaining the corrected size regardless of the temperature of the object; and exposing the object held on the chuck with radiation.
Claim 10
Dependent Claim 12 words
A process according to claim 7, wherein said object is a wafer.
Claim 11
Dependent Claim 12 words
A process according to claim 7, wherein said object is a wafer.
Claim 12
Dependent Claim 75 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; releasing the object from the chuck; correcting the size of the object; holding the object again on the chuck while maintaining the corrected size regardless of the temperature of the object by a holding force which is stronger than the contracting or expanding force of the object; and exposing the object held on the chuck with radiation.
Claim 13
Dependent Claim 75 words
A process for holding and exposing an object, comprising the steps of: holding the object on a chuck; releasing the object from the chuck; correcting the size of the object; holding the object again on the chuck while maintaining the corrected size regardless of the temperature of the object by a holding force which is stronger than the contracting or expanding force of the object; and exposing the object held on the chuck with radiation.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-10-20 2001-04-21 2001-10-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-10-20 2005-04-21 2005-10-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-10-20 2009-04-21 2009-10-21 $7700.00 Window Closed / Lapsed

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