US5131022A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure method and apparatus
Assignee: Canon Inc
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Filing: 1991-10-01
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Granted: 1992-07-14
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Expires: 2011-10-01
Abstract
Abstract An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.
Inventors
- 👤 Shigeru Terashima
- 👤 Mitsuaki Amemiya
- 👤 Isamu Shimoda
- 👤 Shunichi Uzawa
- 👤 Takao Kariya
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 21:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70558; G03F7/20; G03F7/2002; G03F7/2008; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70875
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
67 words
An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material, comprising: a filter having a radiation sensitive material; an illuminometer for measuring illuminance of light passed through said filter; and control means for setting an exposure time for the lithographic transfer of the mask pattern to the workpiece, on the basic of an output of said illuminometer.
Claim 2
Dependent Claim
67 words
An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material, comprising: a filter having a radiation sensitive material; an illuminometer for measuring illuminance of light passed through said filter; and control means for setting an exposure time for the lithographic transfer of the mask pattern to the workpiece, on the basic of an output of said illuminometer.
Claim 3
Dependent Claim
120 words
An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material, comprising: a first filter made of the same material as the substrate of the mask; a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material; illuminometer for measuring illuminance of light passed through said first and second filters, respectively; and control means for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through said first filter and a measured value as measured through said second filter.
Claim 4
Dependent Claim
120 words
An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material, comprising: a first filter made of the same material as the substrate of the mask; a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material; illuminometer for measuring illuminance of light passed through said first and second filters, respectively; and control means for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through said first filter and a measured value as measured through said second filter.
Claim 5
Dependent Claim
19 words
An apparatus according to claim 2, wherein said first and second filters are movable relative to an exposure zone.
Claim 6
Dependent Claim
11 words
An apparatus according to claim 2, wherein said light comprises X-rays.
Claim 7
Dependent Claim
101 words
An exposure apparatus for printing a pattern on a substrate with radiation, said apparatus comprising: a holder for holding a member on a path of the radiation, the member having a first portion coated with a radiation sensitive material sensitive to the radiation and a second portion not coated with the radiation sensitive material; detecting means for detecting the radiation passed through the first portion of the member and the radiation passed through the second portion of the member; and control means for controlling exposure of the substrate with the radiation on the basis of the detection by said detecting means.
Claim 8
Dependent Claim
101 words
An exposure apparatus for printing a pattern on a substrate with radiation, said apparatus comprising: a holder for holding a member on a path of the radiation, the member having a first portion coated with a radiation sensitive material sensitive to the radiation and a second portion not coated with the radiation sensitive material; detecting means for detecting the radiation passed through the first portion of the member and the radiation passed through the second portion of the member; and control means for controlling exposure of the substrate with the radiation on the basis of the detection by said detecting means.
Claim 9
Dependent Claim
14 words
An apparatus according to claim 5, wherein the member has the pattern formed thereon.
Claim 10
Dependent Claim
16 words
An apparatus according to claim 5, wherein said detecting means is movably supported along the member.
Claim 11
Dependent Claim
100 words
An exposure apparatus for printing a pattern, formed on a mask substrate, on a workpiece with radiation, said apparatus comprising: a holder for holding a sheet-like member on a path of the radiation, the member being made of the same material as the mask substrate and having an opening; detecting means for detecting the radiation passed through the sheet-like member and the radiation passed through the opening of the sheet-like member; and control means for controlling temperature of at least one of the mask substrate and the workpiece during exposure of the workpiece to the mask substrate with the radiation.
Claim 12
Dependent Claim
100 words
An exposure apparatus for printing a pattern, formed on a mask substrate, on a workpiece with radiation, said apparatus comprising: a holder for holding a sheet-like member on a path of the radiation, the member being made of the same material as the mask substrate and having an opening; detecting means for detecting the radiation passed through the sheet-like member and the radiation passed through the opening of the sheet-like member; and control means for controlling temperature of at least one of the mask substrate and the workpiece during exposure of the workpiece to the mask substrate with the radiation.
Claim 13
Dependent Claim
37 words
An apparatus according to claim 8, wherein the sheet-like member has a coating of a radiation sensitive material sensitive to the radiation, and wherein said detecting means detects the radiation passed through the radiation sensitve material coating.
Claim 14
Dependent Claim
73 words
An exposure apparatus for printing a pattern on a substrate with radiation, said apparatus comprising: a holder for holding a member on a path of the radiation, the member having a coating of a radiation sensitive material sensitive to the radiation; detecting means for detecting the radiation passed through the member; and control means for controlling exposure of the substrate with the radiation on the basis of the detection by said detecting means.
Claim 15
Dependent Claim
73 words
An exposure apparatus for printing a pattern on a substrate with radiation, said apparatus comprising: a holder for holding a member on a path of the radiation, the member having a coating of a radiation sensitive material sensitive to the radiation; detecting means for detecting the radiation passed through the member; and control means for controlling exposure of the substrate with the radiation on the basis of the detection by said detecting means.
Claim 16
Dependent Claim
20 words
An apparatus according to claim 10, wherein said holder selectively holds the member on and off the path of radiation.
Claim 17
Dependent Claim
14 words
An apparatus according to claim 10, wherein the member has the pattern formed thereon.
Claim 18
Dependent Claim
20 words
An apparatus according to claim 10, wherein said detecting means detects the radiation passed through the radiation sensitive material coating.
Claim 19
Dependent Claim
16 words
An apparatus according to claim 10, wherein said detecting means is movably supported along the member.
References Cited (Backward Citations)
DE2050707A1
Cited
EP0023709A1
Cited
JPS59203947A
Cited
US4825453A
Cited
US4707124A
Cited
DE3712049A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-07-14 | 1996-01-13 | 1996-07-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-07-14 | 2000-01-13 | 2000-07-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-07-14 | 2004-01-13 | 2004-07-14 | $7700.00 | Window Closed / Lapsed |