Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
133 words
A method of at least one of heating or cooling substrates in a vacuum system including at least one vacuum chamber, comprising: a) providing a plurality of thermally-conductive shelves in contact with interior sidewalls of a cassette in said vacuum chamber so that heat is conducted to and from said conductive shelves; b) supporting the substrates on dielectric supports mounted on said conductive shelves to provide a gap between the substrates and said shelves, thereby avoiding direct contact of the substrates with said shelves; and c) changing the temperature of the interior sidewalls to effect at least one of heating the substrates to a temperature of about 350°-400° C. or cooling the substrates to ambient temperature from a temperature of about 350°-400° C. at a rate to avoid thermal stress in the substrates.
Claim 2
Independent Claim
133 words
A method of at least one of heating or cooling substrates in a vacuum system including at least one vacuum chamber, comprising: a) providing a plurality of thermally-conductive shelves in contact with interior sidewalls of a cassette in said vacuum chamber so that heat is conducted to and from said conductive shelves; b) supporting the substrates on dielectric supports mounted on said conductive shelves to provide a gap between the substrates and said shelves, thereby avoiding direct contact of the substrates with said shelves; and c) changing the temperature of the interior sidewalls to effect at least one of heating the substrates to a temperature of about 350°-400° C. or cooling the substrates to ambient temperature from a temperature of about 350°-400° C. at a rate to avoid thermal stress in the substrates.
Claim 3
Independent Claim
135 words
A method for heating or cooling glass substrates in a vacuum chamber, comprising: a) providing a plurality of heat conductive shelves in contact with interior sidewalls of a cassette in the vacuum chamber to conduct heat to and from the shelves to heat or cool the glass substrates by radiant heating or cooling; b) supporting the glass substrates on dielectric supports to provide a gap between the glass substrates and the shelves to minimize direct thermal contact between the shelves and the glass substrates; and c) at least one of heating or cooling the interior sidewalls to heat the glass substrates to a temperature of about 350°-400° C. or to cool the glass substrates to ambient temperature from a temperature of about 350°-400° C. at a rate to avoid thermal stress in the glass substrates.
Claim 4
Independent Claim
135 words
A method for heating or cooling glass substrates in a vacuum chamber, comprising: a) providing a plurality of heat conductive shelves in contact with interior sidewalls of a cassette in the vacuum chamber to conduct heat to and from the shelves to heat or cool the glass substrates by radiant heating or cooling; b) supporting the glass substrates on dielectric supports to provide a gap between the glass substrates and the shelves to minimize direct thermal contact between the shelves and the glass substrates; and c) at least one of heating or cooling the interior sidewalls to heat the glass substrates to a temperature of about 350°-400° C. or to cool the glass substrates to ambient temperature from a temperature of about 350°-400° C. at a rate to avoid thermal stress in the glass substrates.
Claim 5
Independent Claim
187 words
A method of heating or cooling substrates in a vacuum system, comprising: a) providing a plurality of thermally-conductive shelves in contact with interior sidewalls of a cassette in a vacuum chamber so that heat is conducted to said conductive shelves; b) supporting the substrates on dielectric supports mounted on said conductive shelves to provide a gap between the substrates and said shelves, thereby avoiding direct contact of the substrates with said shelves; c) changing the temperature of the interior sidewalls to effect heating of the substrates to a temperature of about 350°-400° C.; d) transferring the substrates one-at-a-time to a film processing chamber; e) depositing one or more thin films on a substrate in said film processing chamber; f) transferring the substrate from said film processing chamber to a cooling chamber under vacuum and positioning the substrate in a cassette in said cooling chamber by supporting said substrate on dielectric supports mounted on thermally-conductive shelves of said cassette in said cooling chamber so the substrate is interleaved with said shelves, and a gap is formed between the substrate and said shelves; and g) radiantly cooling the substrate.
Claim 6
Independent Claim
187 words
A method of heating or cooling substrates in a vacuum system, comprising: a) providing a plurality of thermally-conductive shelves in contact with interior sidewalls of a cassette in a vacuum chamber so that heat is conducted to said conductive shelves; b) supporting the substrates on dielectric supports mounted on said conductive shelves to provide a gap between the substrates and said shelves, thereby avoiding direct contact of the substrates with said shelves; c) changing the temperature of the interior sidewalls to effect heating of the substrates to a temperature of about 350°-400° C.; d) transferring the substrates one-at-a-time to a film processing chamber; e) depositing one or more thin films on a substrate in said film processing chamber; f) transferring the substrate from said film processing chamber to a cooling chamber under vacuum and positioning the substrate in a cassette in said cooling chamber by supporting said substrate on dielectric supports mounted on thermally-conductive shelves of said cassette in said cooling chamber so the substrate is interleaved with said shelves, and a gap is formed between the substrate and said shelves; and g) radiantly cooling the substrate.
Claim 7
Dependent Claim
24 words
A method according to claim 3 wherein said cooling chamber is vented to atmospheric pressure when all of the substrates therein have been cooled.
Claim 8
Dependent Claim
18 words
A method according to claim 3 wherein one or more thin films are deposited by chemical vapor deposition.