Process for forming solid state imager with microlenses

Claim 2

A process for forming a solid state imager, the process comprising: providing a substrate having substantially planar radiation-sensitive regions and spaced electrode regions which are not radiation-sensitive and extend above the plane of the radiation-sensitive regions, forming a substantially conformal layer of a first material over the substrate, said conformal layer extending across both the radiation-sensitive regions and the electrode regions of the substrate and having a thickness of at least about 0.7 μm and forming a substantially conformal layer of a second material on the layer of the first material, and thereafter removing upstanding portions of the conformal layer of the second material to render the upper surface of the layer of second material substantially parallel to the plane of the radiation-sensitive regions, thereby forming a layer of the second material having a lower surface in contact with the conformal layer of the first material and an upper surface substantially planar and substantially parallel to the plane of the radiation-sensitive regions so that the remaining portions of the layer of second material form microlenses disposed above the radiation-sensitive regions, the second material having a refractive index higher than that of the first material at a wavelength to which the radiation-sensitive regions are sensitive; and thereafter forming a color filter superposed on the remaining portions of the layer of second material, and thus leaving the upper surface of the layer second material lying substantially parallel to the plane of the radiation-sensitive regions.

Claim 3

A process according to claim 1 wherein the removal of the upstanding portions of the conformal layer of the second material is effected by mechanical abrasion.

Claim 4

A process according to claim 1 wherein the removal of the upstanding portions of the conformal layer of the second material is effected by applying a layer of photoresist to the conformal layer of the second material, and thereafter etching the layer of photoresist and the upstanding portions of the conformal layer of the second material using an etching process which does not etch the photoresist more quickly than the second material.

Claim 5

A process according to claim 1 wherein, following the formation of the microlenses but before formation of the color filter, a layer of passivating material is formed on the layer of the second material, and the color filter is formed on the layer of passivating material.

Claim 6

A process according to claim 1 wherein the second material has a refractive index at least about 0.3 greater than the refractive index of the first material at a wavelength to which the radiation-sensitive regions are sensitive.

Claim 7

A process according to claim 5 wherein the first material comprises silicon dioxide and the second material comprises silicon nitride.

Claim 8

A process according to claim 1 further comprising depositing a layer of a glass on the substrate before depositing the layer of the first material thereon.

Claim 9

A process for forming a solid state imager, the process comprising: providing a substrate having substantially planar radiation-sensitive regions and spaced electrode regions which are not radiation-sensitive and extend above the plane of the radiation-sensitive regions, forming a substantially conformal layer of a first material over the substrate, said conformal layer extending across both the radiation-sensitive regions and the electrode regions of the substrate and having a thickness of at least about 0.7 μm; and forming a substantially conformal layer of a second material on the layer of the first material, the second material having a refractive index higher than that of the first material at a wavelength to which the radiation-sensitive regions are sensitive; applying a layer of photoresist to the conformal layer of the second material; etching the layer of photoresist and upstanding portions of the conformal layer of the second material using an etching process which does not etch the photoresist more quickly than the second material, thereby rendering the upper surface of the layer of second material substantially parallel to the plane of the radiation-sensitive regions, and thereby forming a layer of the second material having a lower surface in contact with the conformal layer of the first material and an upper surface substantially planar and substantially parallel to the plane of the radiation-sensitive regions so that the remaining portions of the layer of second material form microlenses disposed above the radiation-sensitive regions; forming a layer of passivating material on the layer of the second material and thereafter forming a color filter superposed on the layer of passivating material, and thus leaving the upper surface of the layer second material lying substantially parallel to the plane of the radiation-sensitive regions.

Claim 10

A process for forming a solid state imager, the process comprising: providing a substrate having substantially planar radiation-sensitive regions and spaced electrode regions which are not radiation-sensitive and extend above the plane of the radiation-sensitive regions, forming a substantially conformal layer of a first material over the substrate, said conformal layer extending across both the radiation-sensitive regions and the electrode regions of the substrate and having a thickness of at least about 0.7 μm; and forming a substantially conformal layer of a second material on the layer of the first material, the second material having a refractive index higher than that of the first material at a wavelength to which the radiation-sensitive regions are sensitive; applying a layer of photoresist to the conformal layer of the second material; etching the layer of photoresist and upstanding portions of the conformal layer of the second material using an etching process which does not etch the photoresist more quickly than the second material, thereby rendering the upper surface of the layer of second material substantially parallel to the plane of the radiation-sensitive regions, and thereby forming a layer of the second material having a lower surface in contact with the conformal layer of the first material and an upper surface substantially planar and substantially parallel to the plane of the radiation-sensitive regions so that the remaining portions of the layer of second material form microlenses disposed above the radiation-sensitive regions; forming a layer of passivating material on the layer of the second material and thereafter forming a color filter superposed on the layer of passivating material, and thus leaving the upper surface of the layer second material lying substantially parallel to the plane of the radiation-sensitive regions.