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US5661072A
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Method for reducing oxide thinning during the formation of a semiconductor device
Assignee: Micron Technology Inc
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Filing: 1996-05-23
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Granted: 1997-08-26
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Expires: 2016-05-23
Abstract
Abstract A method of forming a semiconductor device comprises the steps of forming a patterned pad oxide layer having a first nitrogen concentration over a semiconductor substrate assembly such as a semiconductor substrate. The substrate is oxidized to form field oxide which also forms an area of Kooi nitride at the interface of the field oxide and the active area. The Kooi nitride comprises a second nitrogen concentration which is less than the nitrogen concentration of the pad oxide. Next, the pad oxide and the Kooi nitride are oxidized thereby forming gate oxide over the pad oxide. The nitridized pad oxide oxidizes slower than the Kooi nitride, and therefore gate oxide thinning which is known to result from Kooi nitride is reduced or eliminated. Further, the need for the growth of a sacrificial oxide layer to remove the Kooi nitride, and a subsequent strip of the sacrificial oxide is eliminated thereby reducing thinning of the field oxide.
Inventors
- 👤 Nanseng Jeng
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:04
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/01; H10D64/013; H10D64/01302; H10D64/01332; H10D64/01336; H10D64/0134; H10D64/01344; H10D64/60; H10D64/66; H10D64/68; H10D64/693; H10P; H10P14/00; H10P14/60; H10P14/61; Y; Y10; Y10S; Y10S438/00; Y10S438/981
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
54 words
A method for forming a semiconductor device comprising the following steps: forming a patterned first oxide layer over a semiconductor substrate assembly, said first oxide layer having a first nitrogen concentration; forming an area of Kooi nitride, said Kooi nitride having a second nitrogen concentration; oxidizing said first oxide layer and said Kooi nitride.
Claim 2
Independent Claim
54 words
A method for forming a semiconductor device comprising the following steps: forming a patterned first oxide layer over a semiconductor substrate assembly, said first oxide layer having a first nitrogen concentration; forming an area of Kooi nitride, said Kooi nitride having a second nitrogen concentration; oxidizing said first oxide layer and said Kooi nitride.
Claim 3
Dependent Claim
20 words
The method of claim 1 wherein said first oxide and said Kooi nitride are oxidized during a single oxidizing step.
Claim 4
Dependent Claim
17 words
The method of claim 2 wherein said first nitrogen concentration is greater than said second nitrogen concentration.
Claim 5
Dependent Claim
16 words
The method of claim 2 wherein said Kooi nitride oxidizes faster than said first oxide layer.
Claim 6
Dependent Claim
19 words
The method of claim 1 wherein said Kooi nitride is formed during a step of oxidizing said substrate assembly.
Claim 7
Dependent Claim
25 words
The method of claim 1 wherein said first oxide layer and said Kooi nitride are oxidized during a single oxidation step which forms gate oxide.
Claim 8
Dependent Claim
16 words
The method of claim 1 wherein said first concentration is between about 5% and about 20%.
Claim 9
Independent Claim
96 words
A method of forming a semiconductor device comprising the following steps: forming a blanket first oxide layer over a semiconductor substrate assembly, said first oxide having at least a portion comprising a nitrogen-rich oxide layer; forming a blanket nitride layer over said first oxide layer; patterning said nitride layer and said first oxide layer; oxidizing said substrate assembly which is uncovered by said nitride layer to form a second oxide layer; removing said nitride layer and leaving at least a portion of said nitrogen-rich oxide layer; forming a third oxide layer over said nitrogen-rich oxide layer.
Claim 10
Independent Claim
96 words
A method of forming a semiconductor device comprising the following steps: forming a blanket first oxide layer over a semiconductor substrate assembly, said first oxide having at least a portion comprising a nitrogen-rich oxide layer; forming a blanket nitride layer over said first oxide layer; patterning said nitride layer and said first oxide layer; oxidizing said substrate assembly which is uncovered by said nitride layer to form a second oxide layer; removing said nitride layer and leaving at least a portion of said nitrogen-rich oxide layer; forming a third oxide layer over said nitrogen-rich oxide layer.
Claim 11
Dependent Claim
28 words
The method of claim 8 wherein said first oxide layer is pad oxide, said second oxide layer is field oxide, and said third oxide layer is gate oxide.
Claim 12
Dependent Claim
48 words
The method of claim 9 wherein said nitrogen-rich oxide layer has a first nitrogen concentration, further comprising the step of forming an area of Kooi nitride prior to forming said gate oxide, said Kooi nitride having a second nitrogen concentration which is less than said first nitrogen concentration.
Claim 13
Dependent Claim
19 words
The method of claim 10 wherein said Kooi nitride is formed during said step of oxidizing said substrate assembly.
Claim 14
Dependent Claim
27 words
The method of claim 10 wherein during said step of forming said gate oxide, said nitrogen-rich oxide layer oxidizes at a slower rate than said Kooi nitride.
Claim 15
Dependent Claim
17 words
The method of claim 8 wherein said nitrogen-rich oxide layer comprises between about 5% and 20% nitrogen.
Claim 16
Independent Claim
66 words
A method of forming a semiconductor device comprising the following steps: forming a patterned pad oxide layer over a semiconductor substrate assembly, said pad oxide having a first nitrogen concentration; oxidizing said substrate assembly to form field oxide and forming a nitridized area having a second nitride concentration; oxidizing said pad oxide layer and said nitridized area thereby forming gate oxide over said pad oxide layer.
Claim 17
Independent Claim
66 words
A method of forming a semiconductor device comprising the following steps: forming a patterned pad oxide layer over a semiconductor substrate assembly, said pad oxide having a first nitrogen concentration; oxidizing said substrate assembly to form field oxide and forming a nitridized area having a second nitride concentration; oxidizing said pad oxide layer and said nitridized area thereby forming gate oxide over said pad oxide layer.
Claim 18
Dependent Claim
29 words
The method of claim 14 further comprising the step of removing a portion of said pad oxide subsequent to forming said field oxide thereby thinning said pad oxide layer.
Claim 19
Dependent Claim
30 words
The method of claim 14 wherein said semiconductor substrate assembly is a semiconductor wafer, and said thinned pad oxide and said gate oxide separate a transistor gate from said wafer.
Claim 20
Dependent Claim
15 words
The method of claim 14 wherein stud pad oxide is formed using rapid thermal nitridation.
Claim 21
Dependent Claim
15 words
The method of claim 14 the pad oxide is formed using a gas comprising nitrogen.
Claim 22
Dependent Claim
21 words
The method of claim 15 wherein said pad oxide layer and said nitridized area are oxidized during a single oxidation step.
Claim 23
Dependent Claim
16 words
The method of claim 14 wherein said first nitrogen concentration is between about 5% and 20%.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-08-25 | 2001-02-24 | 2001-08-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-08-25 | 2005-02-24 | 2005-08-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-08-25 | 2009-02-24 | 2009-08-26 | $7700.00 | Window Closed / Lapsed |