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Patent US5647912A successfully refreshed from Google Patents.
US5647912A
Expired / Lapsed
US
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Plasma processing apparatus
Assignee: NEC Electronics Corp
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Filing: 1996-04-01
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Granted: 1997-07-15
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Expires: 2016-04-01
Abstract
Abstract A permeable container having a plurality of holes whose diameters are equal to or less than two times the sheath length is provided in a vacuum container. provided at the bottom of this permeable container is an electrode on which an object to be processed is to be placed. A high-frequency power supply is connected to this electrode, and the permeable container is grounded. The permeable container and the electrode are insulated from each other by an insulator. When a process gas supplied into the vacuum container is guided into the permeable container through its holes and a high-frequency voltage is applied to the electrode, plasma is produced in the permeable container. Because the diameters of the holes are equal to or less than two times the sheath length, plasma is trapped inside the permeable container, thus improving the stability and density of plasma. This invention can therefore prevent plasma from becoming non-uniform and unstable and having a lower density, which, if occurred, raise a problem in the plasma process in a low-pressure area, and can efficiently trap plasma, thus ensuring uniform and high-density plasma on the to-be-processed object.
Inventors
- 👤 Takahiro Kaminishizono
- 👤 Takeshi Akimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:00
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/32431; H01J37/3244; H01J37/32532; H01J37/32541
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
91 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container disposed within said first container and having a plurality of holes for permeability, said holes having diameters equal to or less than two times a sheath length of plasma to be produced; a first electrode constituting a part of said second container, an object to be processed being placed on said first electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second container.
Claim 2
Dependent Claim
91 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container disposed within said first container and having a plurality of holes for permeability, said holes having diameters equal to or less than two times a sheath length of plasma to be produced; a first electrode constituting a part of said second container, an object to be processed being placed on said first electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second container.
Claim 3
Dependent Claim
35 words
The plasma processing apparatus according to claim 1, wherein said voltage applying means has a high-frequency power supply for applying a high-frequency voltage to said first electrode, and grounding means for grounding said second container.
Claim 4
Dependent Claim
24 words
The plasma processing apparatus according to claim 1, wherein said first electrode and said second container are insulated from each other by an insulator.
Claim 5
Dependent Claim
20 words
The plasma processing apparatus according to claim 1, wherein said first electrode and said second container can change relative positions.
Claim 6
Dependent Claim
24 words
The plasma processing apparatus according to claim 3, wherein relative positions of said first electrode and said insulator to said second container are changeable.
Claim 7
Dependent Claim
111 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container disposed within said first container and having a plurality of holes for permeability; a first electrode constituting a part of said second container, an object to be processed being placed on said first electrode, a hollow electrode and a cylindrical electrode surrounding said hollow electrode, disposed in said first container in contact with said second container and insulated from each other by an insulator, a negative voltage being applied to said hollow electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second container.
Claim 8
Dependent Claim
111 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container disposed within said first container and having a plurality of holes for permeability; a first electrode constituting a part of said second container, an object to be processed being placed on said first electrode, a hollow electrode and a cylindrical electrode surrounding said hollow electrode, disposed in said first container in contact with said second container and insulated from each other by an insulator, a negative voltage being applied to said hollow electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second container.
Claim 9
Dependent Claim
21 words
The plasma processing apparatus according to claim 6, wherein said cylindrical electrode and said second container are fixed via an insulator.
Claim 10
Dependent Claim
17 words
The plasma processing apparatus according to claim 6, wherein said insulator also has a hole formed therein.
Claim 11
Dependent Claim
134 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container having a top surface, side surfaces, and a bottom surface, said second container disposed within said first container and having a plurality of holes for permeability in each of said surfaces, said top surface and said side surfaces being conductive and constituting a first electrode; a second electrode constituting a center part of said bottom surface and an insulator constituting an outer part of said bottom surface and having holes for permeability, said insulator formed between said second electrode and said side surfaces of said second container to insulate said first electrode from said second electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second electrode.
Claim 12
Dependent Claim
134 words
A plasma processing apparatus comprising: a first container having a gas intake portion and a gas exhaust portion; a second container having a top surface, side surfaces, and a bottom surface, said second container disposed within said first container and having a plurality of holes for permeability in each of said surfaces, said top surface and said side surfaces being conductive and constituting a first electrode; a second electrode constituting a center part of said bottom surface and an insulator constituting an outer part of said bottom surface and having holes for permeability, said insulator formed between said second electrode and said side surfaces of said second container to insulate said first electrode from said second electrode; and voltage applying means for applying a high-frequency voltage between said first electrode and said second electrode.
Claim 13
Dependent Claim
28 words
The plasma processing apparatus according to claim 9, wherein said holes have diameters equal to or less than two times a sheath length of plasma to be produced.
Claim 14
Dependent Claim
35 words
The plasma processing apparatus according to claim 9, wherein said voltage applying means has a high-frequency power supply for applying a high-frequency voltage to said second electrode, and grounding means for grounding said first electrode.
Claim 15
Dependent Claim
20 words
The plasma processing apparatus according to claim 9, wherein said first electrode and said second container can change relative positions.
References Cited (Backward Citations)
JPH0368136A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 2000-07-14 | 2001-01-13 | 2001-07-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-07-14 | 2005-01-13 | 2005-07-15 | $3760.00 | Window Closed / Lapsed |
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