Illumination optical apparatus and scanning exposure apparatus

Claim 2

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a first relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 3

An illumination optical apparatus according to claim 1, wherein said light-source-image forming means is an optical integrator having a plurality of lens elements arranged in at least one line, said lens elements having a same refracting power both in the direction in which said lens elements arranged and in the direction perpendicular to the direction in which said lens element arranged.

Claim 4

An illumination optical apparatus according to claim 1, wherein the ratio of height to width of said optical integrator of said light-source-image forming means along a plane perpendicular to an optical axis of said apparatus is the same as the ratio of longitudinal and transverse length of each lens element of said optical integrator for forming light source images based on beam from said light-source-image forming means.

Claim 5

A method of fabricating a semiconductor device using an illumination optical apparatus according to claim 3, said method comprising the steps of: guiding a light from said illumination apparatus to a mask on which a predetermined circuit pattern is formed and illuminating the pattern; and with moving said mask and photo-sensitive substrate in predetermined directions respectively, projecting said pattern of the mask on the sensitive substrate.

Claim 6

An illumination optical apparatus according to claim 1, wherein said light source changing means is provided with a plurality of lens elements having a rectangular cross section.

Claim 7

An illumination optical apparatus according to claim 1, wherein said light source changing means is an internal reflection type integrator.

Claim 8

A method of fabricating a semiconductor device using an illumination optical apparatus according to claim 1, said method comprising the steps of: guiding a light from said illumination apparatus to a mask on which a predetermined circuit pattern is formed and illuminating the pattern; and with moving said mask and photo-sensitive substrate in predetermined directions respectively, projecting said pattern of the mask on the sensitive substrate.

Claim 9

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a first relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 10

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a first relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 11

An illumination optical apparatus according to claim 8, wherein said light source changing means is provided with a plurality of lens elements having a rectangular cross section.

Claim 12

An illumination optical apparatus according to claim 8, wherein said light source changing means is an internal reflection type integrator.

Claim 13

A method of fabricating a semiconductor device using an illumination optical apparatus according to claim 8, said method comprising the steps of: guiding a light from said illumination apparatus to a mask on which a predetermined circuit pattern is formed and illuminating the patter; and with moving said mask and photo-sensitive substrate in predetermined directions respectively, projecting said pattern of the mask on the sensitive substrate.

Claim 14

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; a light source located at one focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror; and a collimator lens for converting light collected by said collector mirror into substantially parallel beams.

Claim 15

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; a light source located at one focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror; and a collimator lens for converting light collected by said collector mirror into substantially parallel beams.

Claim 16

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator,wherein said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; a light source located at one focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror; and a collimator lens for converting light collected by said collector mirror into substantially parallel beams.

Claim 17

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator,wherein said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; a light source located at one focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror; and a collimator lens for converting light collected by said collector mirror into substantially parallel beams.

Claim 18

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linealy arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; and a light source located at a first focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror.

Claim 19

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linealy arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; and a light source located at a first focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror.

Claim 20

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substantially linealy arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; and a light source located at a first focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror.

Claim 21

An illumination optical apparatus comprising; a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substantially linealy arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator, said light supply means comprising: a collector mirror having an ellipsoidal surface of revolution; and a light source located at a first focal point of said ellipsoidal surface of revolution so that light emitted therefrom is reflected and collected by said collector mirror.

Claim 22

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linerly arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; a first relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator; a condenser optical system for condensing the beam from said optical integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 23

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially linerly arranged in at least one line, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; a first relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator; a condenser optical system for condensing the beam from said optical integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 24

A scanning exposure apparatus according to claim 16, wherein said reticle stage moves said reticle in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular configuration of each lens element of said optical integrator, and said wafer stage moves said wafer in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular sectional configuration of each lens element of said optical integrator.

Claim 25

A method of fabricating a semiconductor device using a scanning exposure apparatus according to claim 17, said method comprising the steps of: guiding a light from said condenser optical system to a said reticle and illuminating said reticle; and with moving said reticle stage and said wafer stage in predetermined directions respectively, projecting a pattern of said reticle on said wafer to perform the exposure.

Claim 26

A scanning exposure apparatus according to claim 16, wherein said light-source-image forming means comprises an optical integrator having a plurality of lens elements arranged in at least one line.

Claim 27

A scanning exposure apparatus according to claim 19, wherein the ratio of height to width of said optical integrator of said light-source-image forming means along a plane perpendicular to an optical axis of said optical integrator is proportional to the ratio of longitudinal and transverse length of each lens element of said optical integrator for forming light source images based on the beam from said light-source-image forming means.

Claim 28

A scanning exposure apparatus according to claim 20, wherein said reticle stage moves said reticle in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular configuration of each lens element of said optical integrator, and said wafer stage moves said wafer in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular sectional configuration of each lens element of said optical integrator.

Claim 29

A method of fabricating a semiconductor device using a scanning exposure apparatus according to claim 20, said method comprising the steps of: guiding a light from said condenser optical system to a said reticle and illuminating said reticle; and with moving said reticle stage and said wafer stage in predetermined directions respectively, projecting a pattern of said reticle on said wafer to perform the exposure.

Claim 30

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially and linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator; a condenser optical system for condensing the beam from said internal reflection type integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 31

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images which are substatially and linearly arranged in at least one line, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator; a condenser optical system for condensing the beam from said internal reflection type integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located, said light supply means including; a light source system for emitting light having a beam cross section of substantially square or circle; light source changing means for forming a plurality of light source images, based on the light from said light source system; and a second relay optical system located between said light source changing means and said light-source-image forming means, for making a position of the light source images formed by said light source changing means conjugate with a position of the light source images formed by said light-source-image forming means.

Claim 32

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator.

Claim 33

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; and a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator.

Claim 34

An illumination optical apparatus according to claim 24, wherein said light-source-image forming means is an optical integrator having a plurality of lens elements arranged in at least one line, said lens elements having a same refracting power both in the direction in which said lens elements arranged and in the direction perpendicular to the direction in which said lens elements arranged.

Claim 35

An illumination optical apparatus according to claim 25, wherein the ratio of height to width of said optical integrator of said light-source-image forming means along a plane perpendicular to an optical axis of said apparatus is the same as the ratio of longitudinal and transverse length of each lens element of said optical integrator for forming light source images based on the beam from said light-source-image forming means.

Claim 36

An illumination optical apparatus according to claim 24, further comprising: a conversion member for converting plural light-source-images formed by said optical integrator into a light-source-image having a ring shape or a light-source-image of which center is shifted from an optical axis of optical system of said illumination optical apparatus.

Claim 37

A method of fabricating a semiconductor device using an illumination optical apparatus according to claim 24, said method comprising the steps of: guiding a light from said illumination apparatus to a mask on which a predetermined circuit pattern is formed and illuminating the pattern; and with moving said mask and photo-sensitive substrate in predetermined directions respectively, projecting said pattern of the mask on the sensitive substrate.

Claim 38

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator.

Claim 39

An illumination optical apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; and a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator.

Claim 40

An illumination optical apparatus according to claim 29, wherein said light-source-image forming means is an optical integrator having a plurality of lens elements arranged in at least one line, said lens elements having a same refracting power both in the direction in which said lens elements arranged and in the direction perpendicular to the direction in which said lens elements arranged.

Claim 41

An illumination optical apparatus according to claim 29, further comprising: a conversion member for converting plural light-source-images formed by said optical integrator into a light-source-image having a ring shape or a light-source-image of which center is shifted from an optical axis of optical system of said illumination optical apparatus.

Claim 42

A method of fabricating a semiconductor device using an illumination optical apparatus according to claim 29, said method comprising the steps of: guiding a light from said illumination apparatus to a mask on which a predetermined circuit pattern is formed and illuminating the pattern; and with moving said mask and photo-sensitive substrate in predetermined directions respectively, projecting said pattern of the mask on the sensitive substrate.

Claim 43

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator; a condenser optical system for condensing the beam from said optical integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located.

Claim 44

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an optical integrator having a plurality of lens elements for forming a plurality of light source images, based on the beam from said light-source-image forming means, said lens elements having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length, said lens elements having a same refracting power both in the direction of the longer side of the rectangular cross section and in the direction of the shorter side thereof; a relay optical system disposed between said light-source-image forming means and said optical integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said optical integrator; a condenser optical system for condensing the beam from said optical integrator to illuminate a surface of a reticle; a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located.

Claim 45

A scanning exposure apparatus according to claim 33, wherein said reticle stage moves said reticle in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular configuration of each lens element of said optical integrator, and said wafer stage moves said wafer in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular sectional configuration of each lens element of said optical integrator.

Claim 46

A scanning exposure apparatus according to claim 33, wherein said light-source-image forming means comprises an optical integrator having a plurality of lens elements arranged in at least one line.

Claim 47

A scanning exposure apparatus according to claim 35, wherein the ratio of height to width of said optical integrator of said light-source-image forming means along a plane perpendicular to an optical axis of said optical integrator is proportional to the ratio of longitudinal and transverse length of each lens element of said optical integrator for forming light source images based on the beam from said light-source-image forming means.

Claim 48

A scanning exposure apparatus according to claim 36, wherein said reticle stage moves said reticle in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular configuration of each lens element of said optical integrator, and said wafer stage moves said wafer in a direction perpendicular to an optical axis of said apparatus and along a short side of a rectangular sectional configuration of each lens element of said optical integrator.

Claim 49

A method of fabricating a semiconductor device using a scanning exposure apparatus according to claim 37, said method comprising the steps of: guiding a light from said condenser optical system to said reticle to illuminate said reticle; and with moving said reticle and said wafer stage in predetermined directions respectively, projecting a pattern of the reticle on said wafer to perform the exposure.

Claim 50

An illumination optical apparatus according to claim 33, further comprising: a conversion member for converting plural light-source-images formed by said optical integrator into a light-source-image having a ring shape or a light-source-image of which center is shifted from an optical axis of optical system of said illumination optical apparatus.

Claim 51

A method of fabricating a semiconductor device using a scanning exposure apparatus according to claim 33, said method comprising the steps of: guiding a light from said condenser optical system to said reticle to illuminate said reticle; and with moving said reticle stage and said wafer stage in predetermined directions respectively, projecting a pattern of said reticle on said wafer to perform the exposure.

Claim 52

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator; a condenser optical system for condensing the beam from said internal reflection type integrator to illuminate a surface of a reticle a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located.

Claim 53

A scanning exposure apparatus comprising: a light supply means for supplying a beam; a light-source-image forming means for forming a plurality of light source images in a substantially linear arrangement, based on the beam from said light supply means; an internal reflection type integrator having two reflection planes parallel to each other for forming a plurality of light source images, based on the beam from said light-source-image forming means, said internal reflection type integrator having a rectangular cross section, two sides adjacent to each other of said rectangular cross section being different in length; a relay optical system disposed between said light-source-image forming means and said internal reflection type integrator, for making a position of the light source images formed by said light-source-image forming means conjugate with a position of the light source images formed by said internal reflection type integrator; a condenser optical system for condensing the beam from said internal reflection type integrator to illuminate a surface of a reticle a reticle stage for moving said reticle in a direction parallel to said surface of reticle; a wafer stage for carrying a wafer on which integrated circuits are to be formed, and moving said wafer in a direction parallel to a surface of said wafer; and a projection optical system disposed between said reticle and said wafer, for making a position at which said reticle is located conjugate with a position at which said wafer is located.

Claim 54

An illumination optical apparatus according to claim 41, further comprising: a conversion member for converting plural light-source-images formed by said optical integrator into a light-source-image having a ring shape or a light-source-image of which center is shifted from an optical axis of optical system of said illumination optical apparatus.