Abstract A process for applying a TiN contact/via adhesion layer to high aspect ratio contact/via openings etched in a dielectric comprises providing a first layer of TiN on the bottom of the contact/via openings and then depositing the second layer of TiN on the first layer of TiN and on the sidewalls of the contact/via openings. The second layer of TiN serves as the contact/via adhesion layer for structurally supporting the adhesion of a tungsten plug in the contact/via openings. In the case where a contact is etched in the dielectric down to a junction with a titanium silicide layer on top, the first layer of TiN on the bottom of the contact opening is provided by a rapid thermal anneal in a nitrogen-containing atmosphere which converts the top part of the titanium silicide layer in the contact into a barrier TiN layer. Alternatively, in the case where a contact is etched in the dielectric down to an underlying barrier TiN layer, the first layer of TiN on the bottom of the contact opening can be provided by a contact etch which is able to stop on an underlying barrier TiN layer with minimum TiN loss. In the case where a via is etched in the dielectric down to an underlying TiN anti-reflection coating on top of a metal layer, the first layer of TiN on the bottom of the via is provided by a via etch which is able to stop on the underlying TiN anti-reflection coating on top of the metal layer with minimum TiN loss.
A multilayer interconnect structure formed in a dielectric comprising: (a) at least one high aspect ratio contact/via opening etched in said dielectric, each said contact/via opening having a bottom and sidewalls; (b) a first layer of TiN on said bottom of said contact/via openings having a thickness; (c) a second layer of TiN having a thickness deposited on said first layer of TiN and on said sidewalls of said contact/via openings, said second layer of TiN substantially covering said sidewalls and serving as an adhesion layer, said thickness of said second layer of TiN being smaller than said thickness of said first layer of TiN; and (d) a metal plug in each said contact/via opening and adhered to said bottom and sidewalls thereof by said second layer of TiN.
Claim 2
Dependent Claim
129 words
A multilayer interconnect structure formed in a dielectric comprising: (a) at least one high aspect ratio contact/via opening etched in said dielectric, each said contact/via opening having a bottom and sidewalls; (b) a first layer of TiN on said bottom of said contact/via openings having a thickness; (c) a second layer of TiN having a thickness deposited on said first layer of TiN and on said sidewalls of said contact/via openings, said second layer of TiN substantially covering said sidewalls and serving as an adhesion layer, said thickness of said second layer of TiN being smaller than said thickness of said first layer of TiN; and (d) a metal plug in each said contact/via opening and adhered to said bottom and sidewalls thereof by said second layer of TiN.
Claim 3
Dependent Claim
20 words
The multilayer interconnect structure of claim 1 wherein said second layer of TiN comprises at least a monolayer of TiN.
Claim 4
Dependent Claim
21 words
The multilayer interconnect structure of claim 2 wherein said second layer of TiN has a maximum thickness of about 400 Å.
Claim 5
Dependent Claim
27 words
The multilayer interconnect structure of claim 1 wherein said metal plug consists essentially of a metal selected from the group consisting of tungsten, copper, gold, and aluminum.
Claim 6
Dependent Claim
40 words
The multilayer interconnect structure of claim 1 wherein each said contact/via opening is formed over a doped region in said semiconductor substrate, over a polysilicon layer, over a polycide layer, over a salicide layer, or over an aluminum metal layer.