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US5619103A
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Inductively coupled plasma generating devices
Assignee: Wisconsin Alumni Research Foundation
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Filing: 1995-06-07
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Granted: 1997-04-08
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Expires: 2015-06-07
Abstract
Abstract A broad area plasma lighting device in which a sealed gas envelope placed adjacent to a planar inductive coupling structure generates visible light. Representative planar inductive coupling structures include a planar spiral coil and a parallel conductor coupling structure. According to the invention, a parallel conductor coupling structure has two basic forms: separate parallel conductors each driven by its own generator/tuning circuit, or single conductor such as a flattened helix or series of square coils driven by one generator/tuning circuit. In addition, a plasma generating device having one or more parallel conductor inductive coupling structures is described. The resulting plasma generator can be used in such applications as plasma processing and inductive plasma lighting.
Inventors
- 👤 Jeffrey A. Tobin
- 👤 Guifang Li
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 12:10
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H01J65/00; H01J65/04; H01J65/042; H01J65/048
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
98 words
An inductive coupling device comprising a first inductive coupling structure, wherein the first inductive coupling structure comprises a plurality of separate conductors including a first and a second conductor, wherein the first conductor runs approximately parallel to the second conductor and within a first plane approximately parallel to a coupling plane, wherein the coupling device further comprises a second inductive coupling structure having a plurality of separate conductors including a first and a second conductor, wherein the first and second conductors of said second inductive coupling structure lie within a second plane approximately parallel to the coupling plane.
Claim 2
Dependent Claim
98 words
An inductive coupling device comprising a first inductive coupling structure, wherein the first inductive coupling structure comprises a plurality of separate conductors including a first and a second conductor, wherein the first conductor runs approximately parallel to the second conductor and within a first plane approximately parallel to a coupling plane, wherein the coupling device further comprises a second inductive coupling structure having a plurality of separate conductors including a first and a second conductor, wherein the first and second conductors of said second inductive coupling structure lie within a second plane approximately parallel to the coupling plane.
Claim 3
Dependent Claim
28 words
The inductive coupling device according to claim 1 wherein the conductors of the second inductive coupling structure are woven through the conductors of the first inductive coupling structure.
Claim 4
Dependent Claim
31 words
The inductive coupling device according to claim 1 wherein the coupling device further comprises an impedance matching circuit electrically connected to the conductors of the first and second inductive coupling structures.
Claim 5
Independent Claim
68 words
A method of varying a field profile used to generate a plasma within a gas, the method comprising the steps of: providing a planar conductor inductive coupling structure having a first and a second conducting path; determining a desired field profile to be generated in an adjacent gas; and positioning the first conducting path relative to the second conducting path so as to obtain the desired field profile.
Claim 6
Independent Claim
68 words
A method of varying a field profile used to generate a plasma within a gas, the method comprising the steps of: providing a planar conductor inductive coupling structure having a first and a second conducting path; determining a desired field profile to be generated in an adjacent gas; and positioning the first conducting path relative to the second conducting path so as to obtain the desired field profile.
Claim 7
Dependent Claim
32 words
The method according to claim 4 wherein the step of positioning comprises the step of spacing the first and second conducting paths within a coupling plane to achieve the desired field profile.
Claim 8
Dependent Claim
48 words
The method according to claim 4 wherein the step of positioning comprises the steps of: placing the first and second conducting paths at a desired spacing within a plane; and moving the second conducting path in a direction orthogonal to the plane to achieve the desired field profile.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-04-07 | 2000-10-07 | 2001-04-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-04-07 | 2004-10-07 | 2005-04-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-04-07 | 2008-10-07 | 2009-04-08 | $7700.00 | Window Closed / Lapsed |