Patent US5616942A successfully refreshed from Google Patents.
US5616942A
Expired / Lapsed
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Flash EEPROM cell and manufacturing methods thereof
Assignee: SK Hynix Inc
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Filing: 1996-03-27
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Granted: 1997-04-01
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Expires: 2016-03-27
Abstract
Abstract This invention relates to a flash EEPROM(Electrically Erasable Programmable Read-Only Memory) cell, more particularly to the cell having an inverter structure with an n-channel part and a p-channel part which hold a floating gate in common, in which the floating gate is charged with hot electrons produced in the n-channel part in programming and the floating gate is neutralized or inverted with hot holes produced in the p-channel part in erasing.
Inventors
- 👤 Bok N. Song
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:50
CPC Classifications
H; H10; H10B; H10B69/00
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
158 words
A flash EEPROM cell, comprising: a first source and a first drain formed in a p-type silicon substrate: a second source and a second drain formed in an n-well of said p-type silicon substrate, with said second source connecting to said first drain; a first tunnel oxide and a second tunnel oxide formed on said p-type silicon substrate between said first source and said first drain, and said p-type silicon substrate between said second source and said second drain respectively; a first floating gate and a second floating gate formed on said first and second tunnel oxides, respectively, wherein said first floating gate is connected to said second floating gate; a first insulating film and a second insulating film formed on said first and second floating gates, respectively; and a first control gate and a second control gate formed on said first and second insulating films, respectively, with said first control gate connecting to said second control gate.
Claim 2
Dependent Claim
158 words
A flash EEPROM cell, comprising: a first source and a first drain formed in a p-type silicon substrate: a second source and a second drain formed in an n-well of said p-type silicon substrate, with said second source connecting to said first drain; a first tunnel oxide and a second tunnel oxide formed on said p-type silicon substrate between said first source and said first drain, and said p-type silicon substrate between said second source and said second drain respectively; a first floating gate and a second floating gate formed on said first and second tunnel oxides, respectively, wherein said first floating gate is connected to said second floating gate; a first insulating film and a second insulating film formed on said first and second floating gates, respectively; and a first control gate and a second control gate formed on said first and second insulating films, respectively, with said first control gate connecting to said second control gate.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-03-31 | 2000-09-30 | 2001-04-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-03-31 | 2004-09-30 | 2005-04-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-03-31 | 2008-09-30 | 2009-04-01 | $7700.00 | Window Closed / Lapsed |