Patent FR1242368A successfully refreshed from Google Patents.
Patent US5599654A successfully refreshed from Google Patents.
US5599654A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming patterned layer of fluorinated resin and devices containing same
Assignee: Fujitsu Ltd
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Filing: 1993-08-17
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Granted: 1997-02-04
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Expires: 2013-08-17
Abstract
Abstract A resin or amorphous carbon layer is coated on a substrate and then fluorinated by exposing it in a F2 gas atmosphere. The thus fluorinated resin or amorphous carbon layer can be excellent in dielectric constant and thermal resistance. The resin may be photo-sensitive so that the resin can be patterned before the fluorination. Alternatively, the resin can be fluorinated before patterning.
Inventors
- 👤 Hiroshi Kudo
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 20:27
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; G03F7/0046; G03F7/038; G03F7/16; G03F7/168; G03F7/26; G03F7/38; G03F7/40; G03F7/405; Y; Y10; Y10S; Y10S430/00; Y10S430/143; Y10S430/145; Y10S430/146; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
81 words
A process for forming a pattern of a fluorinated resin layer on a substrate, comprising the step of: forming a photosensitive resin layer on a substrate, selectively exposing the photosensitive resin layer to a light energy ray, developing the selectively exposed photosensitive resin layer to form a pattern of the resin layer, and exposing the pattern of the resin layer to a fluorine gas atmosphere to convert the pattern of the resin layer to a fluorinated resin layer on the substrate.
Claim 2
Dependent Claim
81 words
A process for forming a pattern of a fluorinated resin layer on a substrate, comprising the step of: forming a photosensitive resin layer on a substrate, selectively exposing the photosensitive resin layer to a light energy ray, developing the selectively exposed photosensitive resin layer to form a pattern of the resin layer, and exposing the pattern of the resin layer to a fluorine gas atmosphere to convert the pattern of the resin layer to a fluorinated resin layer on the substrate.
Claim 3
Dependent Claim
27 words
A process according to claim 1, wherein said fluorinated resin layer is substantially fluorinated and wherein only a portion adjacent to the bottom thereof is not fluorinated.
Claim 4
Dependent Claim
23 words
A process according to claim 2, wherein the resin in said photosensitive resin layer comprises 1,4-cis-isoprene units and cyclic units obtained from 1,4-cis-isoprene.
Claim 5
Dependent Claim
28 words
A process according to claim 2, wherein the resin in said photosensitive resin layer is a polyethylene, polypropylene, ethylene-propylene copolymer, polystyrene, polyacrylonitrile, polyacrylamide, phenol-formamide, acrylic or methacrylic resin.
Claim 6
Dependent Claim
71 words
A process for forming a pattern of a fluorinated resin layer on a substrate, comprising the steps of: forming a photosensitive resin layer on a substrate, selectively exposing the photosensitive resin layer to light, exposing the resin layer to a fluorine gas atmosphere to convert the resin layer to a fluorinated resin layer, and developing the fluorinated resin layer to form a pattern of the fluorinated resin layer on the substrate.
Claim 7
Dependent Claim
71 words
A process for forming a pattern of a fluorinated resin layer on a substrate, comprising the steps of: forming a photosensitive resin layer on a substrate, selectively exposing the photosensitive resin layer to light, exposing the resin layer to a fluorine gas atmosphere to convert the resin layer to a fluorinated resin layer, and developing the fluorinated resin layer to form a pattern of the fluorinated resin layer on the substrate.
Claim 8
Dependent Claim
30 words
A process according to claim 5, wherein the resin in said photosensitive resin layer is substantially fluorinated and wherein only a portion adjacent to the bottom thereof is not fluorinated.
Claim 9
Dependent Claim
29 words
A process according to claim 5, wherein the resin in said photosensitive resin layer is a polyethylene, polypropylene, ethylene-propylene copolymer, polystyrene, polyacrylonitrile, polyacrylamide, phenol-formamide, acrylic or a methacrylic resin.
References Cited (Backward Citations)
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JPS6477939A
Cited
US5137754A
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JPH0362792A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-04 | 2000-08-05 | 2001-02-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-04 | 2004-08-05 | 2005-02-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-04 | 2008-08-05 | 2009-02-04 | $7700.00 | Window Closed / Lapsed |