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US5593913A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing solid state imaging device having high sensitivity and exhibiting high degree of light utilization

Assignee: Sharp Corp
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Filing: 1995-05-24
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Granted: 1997-01-14
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Expires: 2015-05-24
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Abstract

Abstract There are provided a solid state imaging device having high sensitivity and exhibiting high degree of light utilization and a method of manufacturing the same. An insulating film 42, a transfer electrode 43, a light shielding film 44, a protective film 45, and a flat layer 51 are formed above a layer having a photoelectric conversion portion, and a concave lens layer 52 is formed on the flat layer 51 to a lattice pattern. The concave lens layer 52 of the lattice pattern is hot melted for conversion into a concave type micro-lens 52. A resin layer 53 having a refractive index smaller than that of the concave lens 52, a buffer layer 54, and a convex type micro-lens 57 are sequentially formed above the concave type micro-lens 52. The concave type micro-lens 52 functions to bring light rays focused by the convex type micro-lens 57 to a position close to light incident vertically upon the photoelectric conversion portion 41.

Inventors

  • 👤 Tetsuro Aoki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 02:41
CPC Classifications
H; H10; H10F; H10F39/00; H10F39/80; H10F39/805; G; G02; G02B; G02B3/00; G02B3/0006; G02B3/0012; G02B3/0018; H10F39/011; H10F39/024; H10F39/10; H10F39/12; H10F39/15; H10F39/806; H10F39/8063; H10F77/00; H10F77/40; H10F77/413; H10F39/18

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 161 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed on a photoelectric conversion portion, the method comprising the steps of: forming a layer of transparent material above the photoelectric conversion portion, said layer of transparent material having a refractive index higher than that of each of the convex type micro-lens and the support layer; forming a resist lattice pattern of photosensitive resin material over the surface of the layer of transparent material, said lattice pattern having a through-hole opposite to the photoelectric conversion portion; hot-melting the resist lattice pattern to convert the resist lattice pattern into a resist layer having a concave micro-lens configuration; and etching the resist layer, thereby transferring the concave micro-lens configuration of the resist layer onto the layer of transparent material underlying the resist layer so that the layer of transparent material is converted into the concave type micro-lens layer.
Claim 2
Independent Claim 161 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed on a photoelectric conversion portion, the method comprising the steps of: forming a layer of transparent material above the photoelectric conversion portion, said layer of transparent material having a refractive index higher than that of each of the convex type micro-lens and the support layer; forming a resist lattice pattern of photosensitive resin material over the surface of the layer of transparent material, said lattice pattern having a through-hole opposite to the photoelectric conversion portion; hot-melting the resist lattice pattern to convert the resist lattice pattern into a resist layer having a concave micro-lens configuration; and etching the resist layer, thereby transferring the concave micro-lens configuration of the resist layer onto the layer of transparent material underlying the resist layer so that the layer of transparent material is converted into the concave type micro-lens layer.
Claim 3
Dependent Claim 14 words
The method of claim 1 wherein said etching step is a dry etching step.
Claim 4
Independent Claim 113 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer of photosensitive resin material above the photoelectric conversion portion so as to enable lens formation, said photosensitive resin material having a light transmission property and a refractive index higher than that of a constituent material of the support layer, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and hot-melting the lattice pattern layer, whereby the lattice pattern layer is converted into the concave type micro-lens layer.
Claim 5
Independent Claim 113 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer of photosensitive resin material above the photoelectric conversion portion so as to enable lens formation, said photosensitive resin material having a light transmission property and a refractive index higher than that of a constituent material of the support layer, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and hot-melting the lattice pattern layer, whereby the lattice pattern layer is converted into the concave type micro-lens layer.
Claim 6
Independent Claim 101 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer above the photoelectric conversion portion by patterning a photosensitive resin material to a lattice configuration and curing said photosensitive resin material, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and forming an overcoat layer made of transparent resin on the lattice pattern layer so that the overcoat layer becomes the concave type micro-lens layer.
Claim 7
Independent Claim 101 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer above the photoelectric conversion portion by patterning a photosensitive resin material to a lattice configuration and curing said photosensitive resin material, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and forming an overcoat layer made of transparent resin on the lattice pattern layer so that the overcoat layer becomes the concave type micro-lens layer.
Claim 8
Dependent Claim 22 words
The method of claim 4 wherein said overcoat layer made of transparent resin has a refractivity substantially equal to that of polystyrene.
Claim 9
Dependent Claim 27 words
The method of claim 4 further including a step of adding another overcoat layer made of resin having a lower refractivity than said concave type micro-lens layer.
Claim 10
Dependent Claim 30 words
The method of claim 4 wherein the formation of said concave type micro-lens layer is controlled by adjusting a line width of a resist pattern of said lattice pattern layer.
Claim 11
Independent Claim 97 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising steps of: forming a concave micro-lens over said photoelectric conversion portion; depositing a resist on the concave micro-lens; exposing the resist by photolithography to form a lattice pattern which surrounds an aperture portion opposite to said photoelectric conversion portion; curing the resist; and overcoating the resist and the concave microlens with a resin, after the curing step to form a concave lens seat.
Claim 12
Independent Claim 97 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising steps of: forming a concave micro-lens over said photoelectric conversion portion; depositing a resist on the concave micro-lens; exposing the resist by photolithography to form a lattice pattern which surrounds an aperture portion opposite to said photoelectric conversion portion; curing the resist; and overcoating the resist and the concave microlens with a resin, after the curing step to form a concave lens seat.
Claim 13
Dependent Claim 31 words
The method of claim 8 further including the step of providing a further overcoating resin on said concave lens seat, said further overcoating resin having a higher refractivity than the resin.
Claim 14
Dependent Claim 19 words
The method of claim 9 wherein said further overcoating resin has a refractivity substantially equal to that of polystyrene.
Claim 15
Dependent Claim 16 words
The method of claim 8 wherein said resin has a lower refractivity than said concave microlens.

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-01-14 2000-07-15 2001-01-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-01-14 2004-07-15 2005-01-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-01-14 2008-07-15 2009-01-14 $7700.00 Window Closed / Lapsed

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