Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
161 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed on a photoelectric conversion portion, the method comprising the steps of: forming a layer of transparent material above the photoelectric conversion portion, said layer of transparent material having a refractive index higher than that of each of the convex type micro-lens and the support layer; forming a resist lattice pattern of photosensitive resin material over the surface of the layer of transparent material, said lattice pattern having a through-hole opposite to the photoelectric conversion portion; hot-melting the resist lattice pattern to convert the resist lattice pattern into a resist layer having a concave micro-lens configuration; and etching the resist layer, thereby transferring the concave micro-lens configuration of the resist layer onto the layer of transparent material underlying the resist layer so that the layer of transparent material is converted into the concave type micro-lens layer.
Claim 2
Independent Claim
161 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed on a photoelectric conversion portion, the method comprising the steps of: forming a layer of transparent material above the photoelectric conversion portion, said layer of transparent material having a refractive index higher than that of each of the convex type micro-lens and the support layer; forming a resist lattice pattern of photosensitive resin material over the surface of the layer of transparent material, said lattice pattern having a through-hole opposite to the photoelectric conversion portion; hot-melting the resist lattice pattern to convert the resist lattice pattern into a resist layer having a concave micro-lens configuration; and etching the resist layer, thereby transferring the concave micro-lens configuration of the resist layer onto the layer of transparent material underlying the resist layer so that the layer of transparent material is converted into the concave type micro-lens layer.
Claim 3
Dependent Claim
14 words
The method of claim 1 wherein said etching step is a dry etching step.
Claim 4
Independent Claim
113 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer of photosensitive resin material above the photoelectric conversion portion so as to enable lens formation, said photosensitive resin material having a light transmission property and a refractive index higher than that of a constituent material of the support layer, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and hot-melting the lattice pattern layer, whereby the lattice pattern layer is converted into the concave type micro-lens layer.
Claim 5
Independent Claim
113 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer of photosensitive resin material above the photoelectric conversion portion so as to enable lens formation, said photosensitive resin material having a light transmission property and a refractive index higher than that of a constituent material of the support layer, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and hot-melting the lattice pattern layer, whereby the lattice pattern layer is converted into the concave type micro-lens layer.
Claim 6
Independent Claim
101 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer above the photoelectric conversion portion by patterning a photosensitive resin material to a lattice configuration and curing said photosensitive resin material, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and forming an overcoat layer made of transparent resin on the lattice pattern layer so that the overcoat layer becomes the concave type micro-lens layer.
Claim 7
Independent Claim
101 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising the steps of: forming a lattice pattern layer above the photoelectric conversion portion by patterning a photosensitive resin material to a lattice configuration and curing said photosensitive resin material, said lattice pattern layer having a through-hole opposite to the photoelectric conversion portion; and forming an overcoat layer made of transparent resin on the lattice pattern layer so that the overcoat layer becomes the concave type micro-lens layer.
Claim 8
Dependent Claim
22 words
The method of claim 4 wherein said overcoat layer made of transparent resin has a refractivity substantially equal to that of polystyrene.
Claim 9
Dependent Claim
27 words
The method of claim 4 further including a step of adding another overcoat layer made of resin having a lower refractivity than said concave type micro-lens layer.
Claim 10
Dependent Claim
30 words
The method of claim 4 wherein the formation of said concave type micro-lens layer is controlled by adjusting a line width of a resist pattern of said lattice pattern layer.
Claim 11
Independent Claim
97 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising steps of: forming a concave micro-lens over said photoelectric conversion portion; depositing a resist on the concave micro-lens; exposing the resist by photolithography to form a lattice pattern which surrounds an aperture portion opposite to said photoelectric conversion portion; curing the resist; and overcoating the resist and the concave microlens with a resin, after the curing step to form a concave lens seat.
Claim 12
Independent Claim
97 words
A method of manufacturing a solid state imaging device wherein a concave type micro-lens layer, a support layer, and a convex type micro-lens are sequentially formed above a photoelectric conversion portion, the method comprising steps of: forming a concave micro-lens over said photoelectric conversion portion; depositing a resist on the concave micro-lens; exposing the resist by photolithography to form a lattice pattern which surrounds an aperture portion opposite to said photoelectric conversion portion; curing the resist; and overcoating the resist and the concave microlens with a resin, after the curing step to form a concave lens seat.
Claim 13
Dependent Claim
31 words
The method of claim 8 further including the step of providing a further overcoating resin on said concave lens seat, said further overcoating resin having a higher refractivity than the resin.
Claim 14
Dependent Claim
19 words
The method of claim 9 wherein said further overcoating resin has a refractivity substantially equal to that of polystyrene.
Claim 15
Dependent Claim
16 words
The method of claim 8 wherein said resin has a lower refractivity than said concave microlens.