US5567574A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Removing agent composition for photoresist and method of removing
Assignee: Mitsubishi Gas Chemical Co Inc
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Filing: 1995-12-08
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Granted: 1996-10-22
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Expires: 2015-12-08
Abstract
Abstract A removing agent composition for a photoresist is disclosed which comprises 5 to 50% by weight of an alkanolamine, an alkoxyalkylamine or an alkoxyalkanolamine, 1 to 30% by weight of a glycol monoalkyl ether, 0.5 to 15% by weight of a sugar or a sugaralcohol, 0.01 to 10% by weight of a quaternary ammonium hydroxide, if necessary, and water as the balance; and a method of removing by the use of this composition is also disclosed herein. According to the present invention, there can be provided the removing agent composition for the photoresist which can easily remove, at a low temperature in a short time, a photoresist film applied onto an inorganic substrate in a manufacturing process of semiconductor integrated patterns, a remaining photoresist layer after dry etching or a remaining photoresist residue after ashing and which does not corrode a wiring material at all and which can be rinsed with water alone.
Inventors
- 👤 Ryuji Hasemi
- 👤 Keiichi Iwata
- 👤 Mayumi Hada
- 👤 Hidetoshi Ikeda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:24
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/36; H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; C; C09; C09D; C09D9/00; G03F7/42; G03F7/422; G03F7/425; Y; Y10; Y10S; Y10S438/00; Y10S438/906
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
173 words
A removing agent composition for a photoresist which comprises (1) 5 to 50% by weight of an alkanolamine, an alkoxyalkylamine or an alkoxyalkanolamine represented by the general formula R 1 R 2 --NC m H 2m OR 3 wherein R 1 and R 2 are each a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a hydroxyethyl group; R 3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyethyl group, a methoxyethyl group or an ethoxyethyl group; and m is an integer of 2 to 4, (2) 1 to 30% by weight of a glycol monoalkyl ether represented by the general formula R 4 --(C p H 2p O) q --R 4 wherein R 4 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; p is an integer of 2 to 3; and q is an integer of 1 to 3, (3) 0.5 to 15% by weight of a sugar or a sugaralcohol, and water as the balance.
Claim 2
Dependent Claim
173 words
A removing agent composition for a photoresist which comprises (1) 5 to 50% by weight of an alkanolamine, an alkoxyalkylamine or an alkoxyalkanolamine represented by the general formula R 1 R 2 --NC m H 2m OR 3 wherein R 1 and R 2 are each a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a hydroxyethyl group; R 3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyethyl group, a methoxyethyl group or an ethoxyethyl group; and m is an integer of 2 to 4, (2) 1 to 30% by weight of a glycol monoalkyl ether represented by the general formula R 4 --(C p H 2p O) q --R 4 wherein R 4 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; p is an integer of 2 to 3; and q is an integer of 1 to 3, (3) 0.5 to 15% by weight of a sugar or a sugaralcohol, and water as the balance.
Claim 3
Dependent Claim
29 words
A method for releasing a photoresist which comprises the step of releasing the photoresist by the use of a removing agent composition for a photoresist described in claim 1.
Claim 4
Dependent Claim
21 words
The method for releasing a photoresist according to claim 2 wherein a photoresist film applied onto an inorganic substrate is removed.
Claim 5
Dependent Claim
43 words
The method for releasing a photoresist according to claim 2 wherein a mask is formed from a photoresist film on an inorganic substrate, the unmasked portions of the substrate are dry etched, and the photoresist layer formed into the mask is then removed.
Claim 6
Dependent Claim
50 words
The method for releasing a photoresist according to claim 2 wherein a mask is formed from a photoresist film on an inorganic substrate, the unmasked portions of the substrate are dry etched, the photoresist layer formed into the mask is further ashed, and a remaining photoresist residue is then removed.
Claim 7
Dependent Claim
228 words
A removing agent composition for a photoresist which comprises (1) 5 to 45% by weight of an alkanolamine, an alkoxyalkylamine or an alkoxyalkanolamine represented by the general formula R 1 R 2 --NC m H 2m OR 3 wherein R 1 and R 2 are each a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a hydroxyethyl group; R 3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyethyl group, a methoxyethyl group or an ethoxyethyl group; and m is an integer of 2 to 4, (2) 1 to 25% by weight of a glycol monoalkyl ether represented by the general formula R 4 --(C p H 2p O) q --R 4 wherein R 4 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; p is an integer of 2 to 3; and q is an integer of 1 to 3, (3) 0.5 to 15% by weight of a sugar or a sugaralcohol, (4) 0.01 to 10% by weight of a quaternary ammonium hydroxide represented by the general formula [(R 5 ) 3 N--R 6 ] + OH - wherein R 5 is an alkyl group having 1 to 4 carbon atoms, R 6 is an alkyl group or a hydroxyalkyl group having 1 to 4 carbon atoms, and water as the balance.
Claim 8
Dependent Claim
228 words
A removing agent composition for a photoresist which comprises (1) 5 to 45% by weight of an alkanolamine, an alkoxyalkylamine or an alkoxyalkanolamine represented by the general formula R 1 R 2 --NC m H 2m OR 3 wherein R 1 and R 2 are each a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or a hydroxyethyl group; R 3 is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a hydroxyethyl group, a methoxyethyl group or an ethoxyethyl group; and m is an integer of 2 to 4, (2) 1 to 25% by weight of a glycol monoalkyl ether represented by the general formula R 4 --(C p H 2p O) q --R 4 wherein R 4 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; p is an integer of 2 to 3; and q is an integer of 1 to 3, (3) 0.5 to 15% by weight of a sugar or a sugaralcohol, (4) 0.01 to 10% by weight of a quaternary ammonium hydroxide represented by the general formula [(R 5 ) 3 N--R 6 ] + OH - wherein R 5 is an alkyl group having 1 to 4 carbon atoms, R 6 is an alkyl group or a hydroxyalkyl group having 1 to 4 carbon atoms, and water as the balance.
Claim 9
Dependent Claim
29 words
A method for releasing a photoresist which comprises the step of releasing the photoresist by the use of a removing agent composition for a photoresist described in claim 6.
Claim 10
Dependent Claim
21 words
The method for releasing a photoresist according to claim 7 wherein a photoresist film applied onto an inorganic substrate is removed.
Claim 11
Dependent Claim
43 words
The method for releasing a photoresist according to claim 7 wherein a mask is formed from a photoresist film on an inorganic substrate, the unmasked portions of the substrate are dry etched, and the photoresist layer formed into the mask is then removed.
Claim 12
Dependent Claim
50 words
The method for releasing a photoresist according to claim 7 wherein a mask is formed from a photoresist film on an inorganic substrate, the unmasked portions of the substrate are dry etched, the photoresist layer formed into the mask is further ashed, and a remaining photoresist residue is then removed.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1999-10-22 | 2000-04-22 | 2000-10-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-10-22 | 2004-04-22 | 2004-10-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-10-22 | 2008-04-22 | 2008-10-22 | $7700.00 | Window Closed / Lapsed |