US5279771A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Stripping compositions comprising hydroxylamine and alkanolamine
Assignee: EKC Technology Inc
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Filing: 1990-11-05
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Granted: 1994-01-18
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Expires: 2010-11-05
Abstract
Abstract A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.
Inventors
- 👤 Wai M. Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 17:13
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/27; H10P70/273; B; B24; B24B; B24B37/00; B24B37/04; B24B37/042; C; C09; C09D; C09D9/00; C11; C11D; C11D3/00; C11D3/16; C11D3/20; C11D3/2003; C11D3/2041; C11D3/2058; C11D3/2065; C11D3/2075; C11D3/2086; C11D3/26; C11D3/30; C11D3/34; C11D3/3427; C11D3/3472; C11D3/43; C11D7/00; C11D7/22; C11D7/26; C11D7/261; C11D7/262; C11D7/263; C11D7/265; C11D7/267; C11D7/32; C11D7/3209; C11D7/3218; C11D7/3227; C11D7/3245; C11D7/3254; C11D7/3263; C11D7/3272; C11D7/3281; C11D7/34; C11D7/50; C11D7/5004; C11D7/5013; C23; C23G; C23G1/00; C23G1/02; C23G1/10; C23G1/103; C23G1/14; C23G1/20; C23G1/205; G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/423; G03F7/425; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P70/23; H10P70/234; H10W; H10W20/00; H10W20/01; H10W20/031; H10W20/063; H10W20/071; H10W20/081; C11D2111/00; C11D2111/10; C11D2111/14; C11D2111/22; C11D2111/24; H10P70/10; H10P70/15
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
46 words
A composition for the removal of a resist from a substrate, said composition consisting essentially of hydroxylamine and at least one alkanolamine which is miscible with said hydroxylamine wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove a resist from a substrate.
Claim 2
Dependent Claim
46 words
A composition for the removal of a resist from a substrate, said composition consisting essentially of hydroxylamine and at least one alkanolamine which is miscible with said hydroxylamine wherein said hydroxylamine and said alkanolamine are present in sufficient amounts to remove a resist from a substrate.
Claim 3
Dependent Claim
19 words
A composition according to claim 1 wherein said hydroxylamine is present in an amount from about 5%-90% by weight.
Claim 4
Dependent Claim
23 words
A composition according to claim 1 wherein said at least one alkanolamine is present in an amount of from about 10%-95% by weight.
Claim 5
Dependent Claim
13 words
A composition according to claim 1 further comprising at least one polar solvent.
Claim 6
Dependent Claim
24 words
A composition according to claim 4 wherein said at least one polar solvent is present in an amount of from about 5%-85% by weight.
Claim 7
Dependent Claim
57 words
A composition according to claim 4 or claim 5 wherein said at least one polar solvent is selected from the group consisting essentially of ethylene glycol, ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl ether, propylene glycol, propylene glycol alkyl ether, dipropylene glycol alkyl ether, tripropylene glycol alkyl ether, N-substituted pyrrolidone, ethylenediamine, and ethylenetriamine.
Claim 8
Dependent Claim
23 words
A composition according to claim 1 wherein the alkanol group of said at least one alkanolamine contains from 1 to 5 carbon atoms.
Claim 9
Dependent Claim
24 words
A composition according to claim 1 wherein said at least one alkanolamine is selected from a group consisting essentially of monoamines, diamines, and triamines.
Claim 10
Dependent Claim
57 words
A composition according to claim 1 wherein said at least one alkanolamine has the formula R 1 R 2 --N--CH 2 CH 2 --O--R 3 wherein R 1 and R 2 can be H, CH 3 , CH 3 CH 2 , or CH 2 CH 2 OH and R 3 is CH 2 CH 2 OH.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-01-17 | 1997-07-19 | 1998-01-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-01-17 | 2001-07-19 | 2002-01-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-01-17 | 2005-07-19 | 2006-01-18 | $7700.00 | Window Closed / Lapsed |