Patent US5566044A successfully refreshed from Google Patents.
US5566044A
Expired / Lapsed
US
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Base capacitor coupled photosensor with emitter tunnel oxide for very wide dynamic range in a contactless imaging array
Assignee: Foveon Inc
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Filing: 1995-05-10
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Granted: 1996-10-15
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Expires: 2015-05-10
Abstract
Abstract A technique for decreasing the effective gain of a bipolar phototransistor at high light levels makes the image usable over a greatly extended range of illumination conditions. The effective current gain at high light levels is reduced by fabricating a "non-ideal" emitter, such as by inserting a thin 20 521 tunnel oxide between the emitter and base junction. The tunnel oxide between the emitter and base serves as a variable resistor as well as a good junction for carrier injection from the emitter. The total base voltage is the sum of the oxide voltage and the intrinsic base voltage. At high image intensity, the bipolar phototransistor will gradually enter into the saturation mode, i.e., the base to collector junction is forward biased. The beta is thus reduced. The bias of the collector should be about 0.3-0.8 V higher than the emitter at the 20Å tunnel oxide thickness for optimum operation.
Inventors
- 👤 Albert Bergemont
- 👤 Carver A. Mead
- 👤 Min-Hwa Chi
- 👤 Hosam Haggag
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 01:46
CPC Classifications
H; H10; H10F; H10F30/00; H10F30/20; H10F30/21; H10F30/24; H10F30/245; H10F39/00; H10F39/10; H10F39/12; H10F39/197
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
112 words
A method of manufacturing a capacitor coupled contactless image structure in a semiconductor substrate, the method comprising: forming a collector region of N-type conductivity in the semiconductor substrate; forming a base region of P-type conductivity in the collector region; forming tunnel oxide about 20Å thick on a specified surface of the base region; forming a n-doped silicon emitter contact on the tunnel oxide such that an n+ epitaxial emitter region is defined in the base region beneath the emitter contact; forming silicon dioxide over the emitter contact and exposed surfaces of the base region; and forming a layer of second polysilicon on the silicon dioxide to define a base row select line.
Claim 2
Independent Claim
112 words
A method of manufacturing a capacitor coupled contactless image structure in a semiconductor substrate, the method comprising: forming a collector region of N-type conductivity in the semiconductor substrate; forming a base region of P-type conductivity in the collector region; forming tunnel oxide about 20Å thick on a specified surface of the base region; forming a n-doped silicon emitter contact on the tunnel oxide such that an n+ epitaxial emitter region is defined in the base region beneath the emitter contact; forming silicon dioxide over the emitter contact and exposed surfaces of the base region; and forming a layer of second polysilicon on the silicon dioxide to define a base row select line.
Claim 3
Dependent Claim
110 words
A capacitor coupled contactless imager structure formed in a semiconductor substrate, the image structure comprising: a collector region of N-type conductivity formed in the semiconductor substrate; a base region of P-type conductivity formed in the collector region; an n-doped polysilicon emitter contact formed over a surface of the base region but separated from said surface by tunnel oxide about 20Å thick such that an n+ epitaxial emitter region is formed in the base region beneath the emitter contact; silicon dioxide formed over the emitter contact and exposed surfaces of the base region; and a layer of second polysilicon formed on the silicon dioxide to define a base row select line.
Claim 4
Dependent Claim
110 words
A capacitor coupled contactless imager structure formed in a semiconductor substrate, the image structure comprising: a collector region of N-type conductivity formed in the semiconductor substrate; a base region of P-type conductivity formed in the collector region; an n-doped polysilicon emitter contact formed over a surface of the base region but separated from said surface by tunnel oxide about 20Å thick such that an n+ epitaxial emitter region is formed in the base region beneath the emitter contact; silicon dioxide formed over the emitter contact and exposed surfaces of the base region; and a layer of second polysilicon formed on the silicon dioxide to define a base row select line.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-10-15 | 2000-04-15 | 2000-10-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-10-15 | 2004-04-15 | 2004-10-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-10-15 | 2008-04-15 | 2008-10-15 | $7700.00 | Window Closed / Lapsed |