Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
192 words
A process for producing an electrode plate comprising a patterned indium tin oxide film having thereon an aluminum-based metal wiring disposed via a molybdenum alloy layer, comprising the steps of: (a) forming an indium tin oxide film on a glass substrate and patterning the film into a prescribed pattern according to a photolithographic process; (b) coating the indium tin oxide film in the prescribed pattern on the glass substrate successively with a first metal film of an alloy of molybdenum with an additive metal selected from the group consisting of Ta, Ti, Si, Cr, V, Nb and W to control the etching speed of said first metal film, and a second metal film of aluminum or an aluminum alloy having a thickness larger than that of said first metal film; (c) coating the second metal film with a photoresist film, exposing the photoresist film in a prescribed pattern, and developing the photoresist film with an alkaline developer to expose a part of the second metal film; and (d) etching the exposed part of the second metal film and the first metal film therebelow with a single etchant at substantially equal etching speeds.
Claim 2
Dependent Claim
192 words
A process for producing an electrode plate comprising a patterned indium tin oxide film having thereon an aluminum-based metal wiring disposed via a molybdenum alloy layer, comprising the steps of: (a) forming an indium tin oxide film on a glass substrate and patterning the film into a prescribed pattern according to a photolithographic process; (b) coating the indium tin oxide film in the prescribed pattern on the glass substrate successively with a first metal film of an alloy of molybdenum with an additive metal selected from the group consisting of Ta, Ti, Si, Cr, V, Nb and W to control the etching speed of said first metal film, and a second metal film of aluminum or an aluminum alloy having a thickness larger than that of said first metal film; (c) coating the second metal film with a photoresist film, exposing the photoresist film in a prescribed pattern, and developing the photoresist film with an alkaline developer to expose a part of the second metal film; and (d) etching the exposed part of the second metal film and the first metal film therebelow with a single etchant at substantially equal etching speeds.
Claim 3
Dependent Claim
18 words
A process according to claim 1, wherein said first metal film comprises an alloy of molybdenum and tantalum.
Claim 4
Dependent Claim
18 words
A process according to claim 1, wherein said first metal film comprises an alloy of molybdenum and titanium.
Claim 5
Dependent Claim
19 words
A process according to claim 1, wherein said additive metal is contained in a proportion of 1-30 wt. %.
Claim 6
Dependent Claim
19 words
A process according to claim 1, wherein said additive metal is contained in a proportion of 5-15 wt. %.