Patent US2999626A successfully refreshed from Google Patents.
US5543032A
Expired / Lapsed
US
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Electroetching method and apparatus
Assignee: GlobalFoundries Inc
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Filing: 1995-06-02
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Granted: 1996-08-06
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Expires: 2015-06-02
Abstract
Abstract A tool and process for electroetching metal films or layers on a substrate employs a linear electrode and a linear jet of electrolyte squirted from the electrode. The electrode is slowly scanned over the film by a drive mechanism. The current is preferably intermittent. In one embodiment a single wafer surface (substrate) is inverted and the jet is scanned underneath. In another embodiment wafers are held vertically on opposite sides of a holder and two linear electrodes, oriented horizontally and on opposite sides of the holder, are scanned vertically upward at a rate such that the metal layers are completely removed in one pass. The process is especially adapted for fabricating C4 solder balls with triple seed layers of Ti--W (titanium-tungsten alloy) on a substrate, phased Cr--Cu consisting of 50% chromium (Cr) and 50% copper (Cu), and substantially pure Cu. Solder alloys are through-mask electrodeposited on the Cu layer. The seed layers conduct the plating current. During etching the seed layers are removed between the solder bumps to isolate them. The phased Cr--Cu and Cu layers are removed by a single electroetching operation in aqueous potassium sulfate and glycerol with cell voltage set to dissolve the phased layer more quickly than the Cu, avoiding excessive solder bump undercutting in the copper layer. The cell voltage may be such that the solder bump is only slightly undercut so as to form a stepped base C4 structure upon reflowing. Ti--W is removed by a chemical process.
Inventors
- 👤 Madhav Datta
- 👤 Ravindra V. Shenoy
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 04:51
CPC Classifications
C; C25; C25F; C25F3/00; C25F3/02; C25F3/14; H; H10; H10W; H10W72/00; H10W72/01; H10W72/012; H10W72/019; H10W72/20; H10W72/251; H10W72/90; H10W72/921; H10W72/923; H10W72/951; H10W72/952
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
116 words
Apparatus for electroetching metallic depositions on a substrate surface, comprising: a chamber; first pump means for drawing an aqueous salt solution electrolyte from said chamber; a nozzle assembly creating a linear jet of electrolyte, the nozzle assembly coupled to the first pump means to receive electrolyte therefrom, the linear jet disposed to impinge along an etching line perpendicular to the substrate surface; second pump means for drawing said aqueous salt solution from said chamber independently of said first pump means; a filter for filtering said aqueous salt solution, said filter coupled to the second pump means to receive electrolyte therefrom; and a drive mechanism for moving the linear jet across and parallel to the substrate surface.
Claim 2
Dependent Claim
116 words
Apparatus for electroetching metallic depositions on a substrate surface, comprising: a chamber; first pump means for drawing an aqueous salt solution electrolyte from said chamber; a nozzle assembly creating a linear jet of electrolyte, the nozzle assembly coupled to the first pump means to receive electrolyte therefrom, the linear jet disposed to impinge along an etching line perpendicular to the substrate surface; second pump means for drawing said aqueous salt solution from said chamber independently of said first pump means; a filter for filtering said aqueous salt solution, said filter coupled to the second pump means to receive electrolyte therefrom; and a drive mechanism for moving the linear jet across and parallel to the substrate surface.
Claim 3
Dependent Claim
47 words
Apparatus for electroetching metallic depositions on a substrate surface according to claim 1, wherein the drive mechanism moves the linear jet in a single upward pass over the substrate surface at a substantially constant speed so that the substrate surface is etched in said single upward pass.
Claim 4
Dependent Claim
45 words
Apparatus for electroetching metallic depositions on a substrate surface according to claim 1, wherein the nozzle assembly further comprises a metal cathode plate at least partially bounding a header space for pressurized electrolyte and at least one opening to create the linear jet of electrolyte.
Claim 5
Dependent Claim
32 words
Apparatus for electroetching metallic depositions on a substrate surface according to claim 3, wherein the metal cathode plate includes a substantially planar rectangular portion having a length perpendicular to the linear jet.
Claim 6
Dependent Claim
42 words
Apparatus for electroetching metallic depositions on a substrate surface according to claim 4, wherein the metal cathode has a rectangular portion and a plurality of openings disposed along a line of the rectangular portion of the metal cathode parallel to the length.
Claim 7
Dependent Claim
81 words
Apparatus for electroetching metallic depositions on a substrate surface, comprising: pressure means pressurizing an aqueous salt solution electrolyte; a nozzle assembly creating a linear jet of electrolyte, the nozzle assembly coupled to the pressure means, the linear jet disposed to impinge along an etching line perpendicular to the substrate surface; a drive mechanism for moving the linear jet across and parallel to the substrate surface; and switching means for intermittently applying an electrolytic cell voltage to said nozzle assembly for electroetching.
Claim 8
Dependent Claim
81 words
Apparatus for electroetching metallic depositions on a substrate surface, comprising: pressure means pressurizing an aqueous salt solution electrolyte; a nozzle assembly creating a linear jet of electrolyte, the nozzle assembly coupled to the pressure means, the linear jet disposed to impinge along an etching line perpendicular to the substrate surface; a drive mechanism for moving the linear jet across and parallel to the substrate surface; and switching means for intermittently applying an electrolytic cell voltage to said nozzle assembly for electroetching.
Claim 9
Independent Claim
68 words
A method of electroetching metallic depositions on a substrate surface, comprising the steps of: a) drawing an aqueous salt solution electrolyte from a chamber containing an electrolyte; b) creating a linear jet of electrolyte; c) directing the linear jet of electrolyte to the substrate surface; d) moving the linear jet of electrolyte across the substrate surface; and e) filtering electrolyte drawn from the chamber separately from step a).
Claim 10
Independent Claim
68 words
A method of electroetching metallic depositions on a substrate surface, comprising the steps of: a) drawing an aqueous salt solution electrolyte from a chamber containing an electrolyte; b) creating a linear jet of electrolyte; c) directing the linear jet of electrolyte to the substrate surface; d) moving the linear jet of electrolyte across the substrate surface; and e) filtering electrolyte drawn from the chamber separately from step a).
Claim 11
Independent Claim
105 words
A method of electroetching metallic depositions on a substrate surface, comprising: pressurizing an aqueous salt solution electrolyte; directing said electrolyte through a plurality of holes and towards said substrate surface; creating a flow of electrolyte which is uniform on said substrate surface both a) at portions of said substrate surface corresponding in position to said holes and b) in between portions of said substrate surface corresponding in position to said holes; and moving the flow of electrolyte across the substrate surface in a single pass over the substrate surface at a substantially constant speed so that the substrate surface is etched in said single pass.
Claim 12
Independent Claim
105 words
A method of electroetching metallic depositions on a substrate surface, comprising: pressurizing an aqueous salt solution electrolyte; directing said electrolyte through a plurality of holes and towards said substrate surface; creating a flow of electrolyte which is uniform on said substrate surface both a) at portions of said substrate surface corresponding in position to said holes and b) in between portions of said substrate surface corresponding in position to said holes; and moving the flow of electrolyte across the substrate surface in a single pass over the substrate surface at a substantially constant speed so that the substrate surface is etched in said single pass.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-08-06 | 2000-02-05 | 2000-08-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-08-06 | 2004-02-05 | 2004-08-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-08-06 | 2008-02-05 | 2008-08-06 | $7700.00 | Window Closed / Lapsed |