US5517027A — Method for detecting and examining slightly irreg…

Claim 1

Independent Claim 79 words

A method for detecting a slightly irregular surface state, comprising the steps of: illuminating a surface of a sample with a light beam for detecting the slightly irregular surface state; observing a local variation of the light beam occurring due to the slightly irregular surface state within a beam spot of said light beam, and identifying a position of said local variation to specify the location of the slightly irregular surface state in an x-y plane of the sample.

Claim 2

Independent Claim 79 words

A method for detecting a slightly irregular surface state, comprising the steps of: illuminating a surface of a sample with a light beam for detecting the slightly irregular surface state; observing a local variation of the light beam occurring due to the slightly irregular surface state within a beam spot of said light beam, and identifying a position of said local variation to specify the location of the slightly irregular surface state in an x-y plane of the sample.

Claim 3

Dependent Claim 14 words

The method of claim 1, wherein said light beam is a laser light beam.

Claim 4

Dependent Claim 32 words

The method of claim 1, wherein said variation of said light beam is observed by sensing irregularly reflected light of said light beam from a dark field section of said light beam.

Claim 5

Dependent Claim 38 words

The method of claim 3, wherein said variation of said light beam is observed by means of a light-receiving element disposed as facing opposite to the beam spot of said light beam on the surface of said sample.

Claim 6

Dependent Claim 32 words

The method of claim 1, wherein said variation of said light beam is observed by sensing a dark portion of said light beam from a bright field section of said light beam.

Claim 7

Dependent Claim 32 words

The method of claim 1, wherein said variation of said light beam is observed by focusing a microscope on the beam spot of said light beam on the surface of said sample.

Claim 8

Independent Claim 108 words

A method for examining a slightly irregular surface state, comprising the steps of: illuminating a surface of a sample with a light beam for detecting the slightly irregular surface state; observing a variation of the light beam occurring due to the slightly irregular surface state to specify the location of the slightly irregular surface state in an x-y plane of the sample; making the location of a probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other; and measuring a three-dimensional image of the slightly irregular surface state by means of the scanning probe microscope.

Claim 9

Independent Claim 108 words

A method for examining a slightly irregular surface state, comprising the steps of: illuminating a surface of a sample with a light beam for detecting the slightly irregular surface state; observing a variation of the light beam occurring due to the slightly irregular surface state to specify the location of the slightly irregular surface state in an x-y plane of the sample; making the location of a probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other; and measuring a three-dimensional image of the slightly irregular surface state by means of the scanning probe microscope.

Claim 10

Dependent Claim 128 words

The method of claim 7, wherein said step of making the location of said probe needle of a scanning probe microscope and the location of the slightly irregular surface state on the sample coincide with each other includes the steps of: bringing said probe needle of said scanning probe microscope near the sample; observing a variation of said light beam occurring due to said probe needle to set the location of said probe needle in said x-y plane as coordinates (x 0 ,y 0 ); finding coordinates (x 1 ,y 1 ) of the location of said slightly irregular surface state on said sample specified in said x-y plane; and moving said probe needle or said sample a distance (x 1 -x 0 ,y 1 -y 0 ).

Claim 11

Dependent Claim 30 words

The method of claim 7, wherein said sample is a semiconductor device under fabrication or a semiconductor wafer on which the semiconductor device is being fabricated in a production process.

Claim 12

Dependent Claim 35 words

The method of claim 7, wherein said sample is a liquid crystal display device under fabrication or a transparent insulative substrate on which the liquid crystal display device is being fabricated in a production process.

Claim 13

Dependent Claim 41 words

A method for fabricating a semiconductor device comprising the steps of: cleaning, ion implantation, ion diffusion, CVD, etching, exposure and heat treatment, wherein at least one of the steps includes an inspection step utilizing a method as recited in claim 7.

Claim 14

Dependent Claim 129 words

A method for fabricating a liquid crystal display device, comprising the steps of: forming a TFT substrate having at least a thin film transistor and a pixel electrode on a transparent insulative substrate; forming a counterpart substrate having an opposing electrode; disposing the TFT substrate and the counterpart substrate in opposing relation with each other with a predetermined gap defined therebetween and bonding these substrates at a marginal portion thereof; and introducing a liquid crystal material into the gap, wherein the step of forming the TFT substrate or the counterpart substrate includes the steps of: cleaning, film formation, exposure, etching and ion implantation, CVD and heat treatment at least one of these steps involving an inspection step for examing a slightly irregular surface state as recited in claim 7.

Claim 15

Dependent Claim 111 words

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising: an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; a light beam variation sensor, disposed in a dark field section of the light beam, for sensing irregularly reflected light of the light beam caused by the slightly irregular surface state; and an x-y actuator for specifying the location of the slightly irregular surface state.

Claim 16

Dependent Claim 111 words

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising: an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; a light beam variation sensor, disposed in a dark field section of the light beam, for sensing irregularly reflected light of the light beam caused by the slightly irregular surface state; and an x-y actuator for specifying the location of the slightly irregular surface state.

Claim 17

Dependent Claim 16 words

The scanning probe microscope of claim 13, wherein said light source is a laser light source.

Claim 18

Dependent Claim 43 words

A method for fabricating a semiconductor device comprising the steps of: cleaning, ion implantation, ion diffusion, CVD, etching, exposure and heat treatment, wherein at least one of the steps includes an inspection step utilizing a scanning probe microscope as recited in claim 13.

Claim 19

Dependent Claim 135 words

A method for fabricating a liquid crystal display device, comprising the steps of: forming a TFT substrate having at least a thin film transistor and a pixel electrode on a transparent insulative substrate; forming a counterpart substrate having an opposing electrode; disposing the TFT substrate and the counterpart substrate in opposing relation with each other with a predetermined gap defined therebetween and bonding these substrates at a marginal portion thereof; and introducing a liquid crystal material into the gap, wherein the step of forming the TFT substrate or the counterpart substrate includes the steps of: cleaning, film formation, exposure, etching, ion implantation, CVD and heat treatment at least one of these steps involving an inspection step for examining a slightly irregular surface state by means of a scanning probe microscope as recited in claim 13.

Claim 20

Dependent Claim 111 words

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising: an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; a light beam variation sensor, disposed in a bright field section of the light beam, for sensing a dark portion of the light beam developed by the slightly irregular surface state; and an x-y actuator for specifying the location of the slightly irregular surface state.

Claim 21

Dependent Claim 111 words

A scanning probe microscope for measuring a three-dimensional image of a surface of a sample, comprising: an xyz actuator for three-dimensionally adjusting a position of a probe needle of the scanning probe microscope or the sample to bring the probe needle near the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; a light beam variation sensor, disposed in a bright field section of the light beam, for sensing a dark portion of the light beam developed by the slightly irregular surface state; and an x-y actuator for specifying the location of the slightly irregular surface state.

Claim 22

Dependent Claim 115 words

An atomic force microscope for measuring a three-dimensional image of a surface of a sample, comprising: a cantilever; a probe needle mounted on a tip of the cantilever and which can be brought near the surface of the sample; a light-emitting element and a light-receiving element which are provided for detecting a bending degree of the cantilever; an xyz actuator for three-dimensionally adjusting a position of the sample or the cantilever; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; and an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

Claim 23

Dependent Claim 115 words

An atomic force microscope for measuring a three-dimensional image of a surface of a sample, comprising: a cantilever; a probe needle mounted on a tip of the cantilever and which can be brought near the surface of the sample; a light-emitting element and a light-receiving element which are provided for detecting a bending degree of the cantilever; an xyz actuator for three-dimensionally adjusting a position of the sample or the cantilever; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; and an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

Claim 24

Dependent Claim 103 words

A scanning tunnel microscope for measuring a three-dimensional image of a surface of a sample, comprising: a metallic probe needle which can be brought near the surface of the sample for making tunnel current flow between the sample and the metallic probe needle; an xyz actuator for three-dimensionally adjusting a position of the metallic probe needle or the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; and an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

Claim 25

Dependent Claim 103 words

A scanning tunnel microscope for measuring a three-dimensional image of a surface of a sample, comprising: a metallic probe needle which can be brought near the surface of the sample for making tunnel current flow between the sample and the metallic probe needle; an xyz actuator for three-dimensionally adjusting a position of the metallic probe needle or the sample; a light source for providing a light beam for detecting a slightly irregular surface state present on the surface of the sample; and an x-y actuator capable of specifying the location of the slightly irregular surface state present on the surface of the sample.

Claim 26

Independent Claim 144 words

A method for detecting a slightly irregular surface state, comprising the steps of: specifying the location of the slightly irregular surface state present on a surface of a sample by means of a particle detector; transferring the sample onto a coordinate stage of a scanning probe microscope; approximately linking the location of the slightly irregular surface state specified by the particle detector to a coordinate system of the coordinate stage of the scanning probe microscope; illuminating with a light beam a limited region of the surface of the sample which includes the location of the slightly irregular surface state represented in terms of the coordinate system of the coordinate stage to again specify the location of the slightly irregular surface state; and registering the location of the slightly irregular surface state again specified in terms of the coordinate system of the scanning probe microscope.

Claim 27

Independent Claim 144 words

A method for detecting a slightly irregular surface state, comprising the steps of: specifying the location of the slightly irregular surface state present on a surface of a sample by means of a particle detector; transferring the sample onto a coordinate stage of a scanning probe microscope; approximately linking the location of the slightly irregular surface state specified by the particle detector to a coordinate system of the coordinate stage of the scanning probe microscope; illuminating with a light beam a limited region of the surface of the sample which includes the location of the slightly irregular surface state represented in terms of the coordinate system of the coordinate stage to again specify the location of the slightly irregular surface state; and registering the location of the slightly irregular surface state again specified in terms of the coordinate system of the scanning probe microscope.

Claim 28

Dependent Claim 41 words

The method of claim 20, wherein said limited region covers all regional ranges of errors which are possible to occur when positional information of the slightly irregular surface state obtained by said particle detector is transmitted to said scanning probe microscope.

Claim 29

Dependent Claim 14 words

The method of claim 20, wherein said light beam is a laser light beam.

Claim 30

Dependent Claim 12 words

The method of claim 20, wherein said light beam is s-polarized light.

Claim 31

Dependent Claim 35 words

The method of claim 20, wherein the second detection of the slightly irregular surface state is achieved by detecting irregularly reflected light of said light beam from a dark field section of the light beam.

Claim 32

Dependent Claim 40 words

The method of claim 20, wherein the second detection of the slightly irregular surface state is achieved by detecting a dark portion developed by irregularly reflected light of said light beam from a bright field section of the light beam.

Claim 33

Dependent Claim 42 words

The method of claim 20, wherein the second detection of the slightly irregular surface state is achieved by observing the slightly irregular surface state through a microscope focusing onto the beam spot of said light beam on the surface of the sample.

Claim 34

Dependent Claim 19 words

The method of claim 26, wherein said microscope is provided with a CCD camera at an eyepiece portion thereof.

Claim 35

Dependent Claim 13 words

The method of claim 27, wherein said CCD camera has an image intensifier.

Claim 36

Dependent Claim 24 words

The method of claim 26, wherein said microscope has a visual field which is larger than the region covering the regional ranges of errors.

Claim 37

Dependent Claim 21 words

The method of claim 20, wherein the second detection of the slightly irregular surface state is achieved using a light-receiving element.

Claim 38

Dependent Claim 36 words

The method of claim 30, wherein said light-receiving element is capable of sensing reflected light from a region of the surface of the sample which is larger than the region covering the regional ranges of errors.

Claim 39

Dependent Claim 20 words

The method of claim 20, wherein said scanning probe microscope is an atomic force microscope as recited in claim 14.

Claim 40

Dependent Claim 20 words

The method of claim 20, wherein said scanning probe microscope is a scanning tunnel microscope as recited in claim 15.

Claim 41

Dependent Claim 30 words

The method of claim 20, wherein said sample is a semiconductor device under fabrication or a semiconductor wafer on which the semiconductor device is being fabricated in a production process.

Claim 42

Dependent Claim 35 words

The method of claim 20, wherein said sample is a liquid crystal display device under fabrication or a transparent insulative substrate on which the liquid crystal display device is being fabricated in a production process.

Claim 43

Dependent Claim 48 words

A method for fabricating a semiconductor device comprising the steps of: cleaning, ion implantation, ion diffusion, CVD, etching, exposure and heat treatment, wherein at least one of the steps includes an inspection step utilizing a method for detecting a slightly irregular surface state as recited in claim 20.

Claim 44

Dependent Claim 128 words

A method for fabricating a liquid crystal display device, comprising the steps of: forming a TFT substrate having at least a thin film transistor and a pixel electrode on a transparent insulative substrate; forming a counterpart substrate having an opposing electrode; disposing the TFT substrate and the counterpart substrate in opposing relation with each other with a predetermined gap defined therebetween and bonding these substrates at a marginal portion thereof; and introducing a liquid crystal material into the gap, wherein the step of forming the TFT substrate or the counterpart substrate includes the steps of: cleaning, film formation, exposure, etching and ion implantation, at least one of these steps involving an inspection step for detecting a slightly irregular surface state by a method as recited in claim 20.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1999-05-14	1999-11-13	2000-05-14	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2003-05-14	2003-11-13	2004-05-14	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2007-05-14	2007-11-13	2008-05-14	$7700.00	Window Closed / Lapsed

Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these

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