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US5512151A
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US
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Method of making thin-layer component
Assignee: Minolta Co Ltd
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Filing: 1994-06-07
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Granted: 1996-04-30
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Expires: 2014-06-07
Abstract
Abstract The present invention relates to a thin-layer component having a thin layer of (100)-oriented platinum or the other metals in Group VIII, which is formed on amorphous silicon dioxide, and further relates to a thin-layer producing system for producing such thin-layer components, the thin-layer producing system being a sputtering system wherein an auxiliary electrode is provided between two electrodes.
Inventors
- 👤 Shunichi Hayamizu
- 👤 Tomoko Miyaura
- 👤 Noboru Saeki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 11:09
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/14; C23C14/18; C23C14/185; C23C14/22; C23C14/34; C23C14/3435; C23C14/345; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3438
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
111 words
A method for producing a thin layer component (100)-oriented platinum in a vacuum chamber which has a target as a first electrode and an auxiliary electrode providing spaces through which particles sputtered out of the target can pass, comprising: setting a substrate as a second electrode in a manner such that the auxiliary electrode is arranged between the target and the substrate; introducing an argon and oxygen gas mixture into the vacuum chamber; and forming an electric field between the auxiliary electrode and the target independently of an electric field formed between the auxiliary electrode and the substrate, such that plasma is generated only between the auxiliary electrode and the target.
Claim 2
Independent Claim
111 words
A method for producing a thin layer component (100)-oriented platinum in a vacuum chamber which has a target as a first electrode and an auxiliary electrode providing spaces through which particles sputtered out of the target can pass, comprising: setting a substrate as a second electrode in a manner such that the auxiliary electrode is arranged between the target and the substrate; introducing an argon and oxygen gas mixture into the vacuum chamber; and forming an electric field between the auxiliary electrode and the target independently of an electric field formed between the auxiliary electrode and the substrate, such that plasma is generated only between the auxiliary electrode and the target.
Claim 3
Dependent Claim
24 words
The method of claim 1, further comprising: adjusting the electric field between the auxiliary electrode and the substrate to control conditions for layer formation.
Claim 4
Dependent Claim
31 words
The method of claim 1, further comprising: sputtering the particles out of the target; and depositing the sputtered particles, which pass through the spaces on the auxiliary electrode, on the substrate.
Claim 5
Dependent Claim
27 words
The method of claim 3, wherein the sputtering step includes the following step: colliding argon ions, accelerated by the plasma, with the target to sputter the particles.
Claim 6
Dependent Claim
35 words
The method of claim 1, wherein the substrate is an amorphous silicon dioxide layer formed on a silicon wafer, and wherein the thin layer of (100)-oriented platinum is deposited on the amorphous silicon dioxide layer.
Claim 7
Dependent Claim
18 words
The method of claim 1, wherein the substrate temperature is maintained from about 100° C. to 300° C.
Claim 8
Dependent Claim
26 words
The method of claim 1, wherein the auxiliary electrode is grounded, and wherein a bias voltage between 60 and 200 volts is applied to the substrate.
Claim 9
Dependent Claim
25 words
The method of claim 1, wherein a total pressure of the argon and oxygen gas mixtures is maintained between 5×10 -2 and 2×10 -1 Torr.
Claim 10
Dependent Claim
21 words
The method of claim 1, wherein the partial pressure of oxygen gas is maintained between 2×10 -4 and 1×10 -3 Torr.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-04-30 | 1999-10-30 | 2000-04-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-04-30 | 2003-10-30 | 2004-04-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-04-30 | 2007-10-30 | 2008-04-30 | $7700.00 | Window Closed / Lapsed |