US5492724A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor
Assignee: Osram Sylvania Inc
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Filing: 1994-02-22
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Granted: 1996-02-20
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Expires: 2014-02-22
Abstract
Abstract Method and apparatus for the controlled delivery of vaporized chemical precursor to a low pressure chemical vapor deposition (LPCVD) reactor. A flow of liquid precursor containing dissolved inert gas is passed through a restrictor element. The dissolved inert gas is released from the liquid precursor at or near the downstream side of the restrictor element. The inert gas is separated from the liquid precursor, thereby producing a continuous flow of liquid precursor, and this flow is fed into an inlet of a-vaporizer. The vaporized precursor is delivered into an LPCVD reactor.
Inventors
- 👤 Keith A. Klinedinst
- 👤 Joseph E. Lester
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 14:22
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4481; C23C16/4401; C23C16/4402
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
80 words
A method for the controlled delivery of a vaporized chemical precursor to a low-pressure chemical vapor deposition reactor comprising the steps of: providing a flow of liquid precursor containing a quantity of dissolved inert gas; restricting said flow of liquid precursor; separating said quantity of dissolved inert gas from said liquid precursor whereby a continuous flow of liquid precursor is produced; vaporizing said continuous flow of liquid precursor; and delivering said vaporized precursor to said low-pressure chemical vapor deposition reactor.
Claim 2
Independent Claim
80 words
A method for the controlled delivery of a vaporized chemical precursor to a low-pressure chemical vapor deposition reactor comprising the steps of: providing a flow of liquid precursor containing a quantity of dissolved inert gas; restricting said flow of liquid precursor; separating said quantity of dissolved inert gas from said liquid precursor whereby a continuous flow of liquid precursor is produced; vaporizing said continuous flow of liquid precursor; and delivering said vaporized precursor to said low-pressure chemical vapor deposition reactor.
Claim 3
Dependent Claim
32 words
The method of claim 1 wherein said separating is carried out in a gas/liquid separator into which additional inert gas other than the inert gas dissolved in the liquid precursor is introduced.
Claim 4
Dependent Claim
40 words
The method of claim 1 wherein the dissolved inert gas is separated from the liquid precursor in a conduit which connects a flow restrictor element used to effect said restricting and a vaporizer in which said vaporizing is carried out.
Claim 5
Dependent Claim
36 words
The method of claim 2 wherein the gas/liquid separator comprises a conduit which connects a flow restrictor element used to effect said restricting and an input of a vaporizer in which said vaporizing is carried out.
References Cited (Backward Citations)
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Cited
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Cited
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Cited
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Cited
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Cited
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Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-02-19 | 1999-08-21 | 2000-02-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-02-19 | 2003-08-21 | 2004-02-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-02-19 | 2007-08-21 | 2008-02-20 | $7700.00 | Window Closed / Lapsed |