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US5486267A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for applying photoresist

Assignee: International Business Machines Corp
•
Filing: 1994-02-28
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Granted: 1996-01-23
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Expires: 2014-02-28
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Abstract

Abstract The invention provides a method for substrate preparation prior to applying photoresist to the substrate. A substrate, such as a TEOS-based silicon dioxide or silicon nitride film, is selected and treated with reactive oxygen. The reactive oxygen can comprise ozone or ozone plasma, for example. After treatment of the substrate, the photoresist, preferably an acid-catalyzed photoresist for use with deep UV sensitization, is applied.

Inventors

  • 👤 Stephen E. Knight
  • 👤 Stephen E. Luce
  • 👤 Thomas L. McDevitt

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 03:29
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/69215; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/65; H10P14/6516; H10P14/6529; H10P14/6532; H10P14/66; H10P14/668; H10P14/6681; H10P14/6684; H10P14/6686; H10P14/694; H10P14/6943; H10P14/69433; H10P95/00; Y; Y10; Y10S; Y10S438/00; Y10S438/906; Y10S438/942; Y10S438/948

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 43 words
A method for substrate preparation comprising: providing a substrate comprising a film selected from the group of silicon dioxide and silicon nitride; treating said substrate with ozone; then applying a resist to said treated substrate and patterning said resist over said treated substrate.
Claim 2
Independent Claim 43 words
A method for substrate preparation comprising: providing a substrate comprising a film selected from the group of silicon dioxide and silicon nitride; treating said substrate with ozone; then applying a resist to said treated substrate and patterning said resist over said treated substrate.
Claim 3
Dependent Claim 11 words
The method of claim 1 wherein said film comprises silicon dioxide.
Claim 4
Dependent Claim 13 words
The method of claim 1 wherein said film comprises a tetraethoxysilane-based silicon dioxide.
Claim 5
Dependent Claim 11 words
The method of claim 1 wherein said film comprises silicon nitride.
Claim 6
Dependent Claim 12 words
The method of claim 1 wherein said film is chemically vapor deposited.
Claim 7
Dependent Claim 23 words
The method of claim 1 further comprising applying electromagnetic excitation to said ozone to generate a reactive ozone plasma to treat said substrate.
Claim 8
Dependent Claim 12 words
The method of claim 1 wherein said resist comprises an acid-catalyzed resist.
Claim 9
Dependent Claim 21 words
The method of claim 1 wherein said ozone is present in a concentration from 5% by weight to 100% by weight.
Claim 10
Independent Claim 29 words
A method for substrate preparation comprising: selecting a substrate; treating said substrate with one of ozone and an oxygen plasma; and applying an acid-catalyzed resist to said treated substrate.
Claim 11
Independent Claim 29 words
A method for substrate preparation comprising: selecting a substrate; treating said substrate with one of ozone and an oxygen plasma; and applying an acid-catalyzed resist to said treated substrate.
Claim 12
Dependent Claim 15 words
The method of claim 9 wherein treating said substrate comprises treatment with an ozone plasma.
Claim 13
Independent Claim 28 words
A method for substrate preparation comprising: providing a substrate comprising a tetraethoxysilane-based silicon dioxide film; treating said substrate with ozone; and applying a resist to said treated substrate.
Claim 14
Independent Claim 28 words
A method for substrate preparation comprising: providing a substrate comprising a tetraethoxysilane-based silicon dioxide film; treating said substrate with ozone; and applying a resist to said treated substrate.

References Cited (Backward Citations)

US4491628A Cited
US4615763A Cited
JPH02125449A Cited
US4902647A Cited
US4877482A Cited
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JPH05166769A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-01-22 1999-07-24 2000-01-23 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-01-22 2003-07-24 2004-01-23 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-01-22 2007-07-24 2008-01-23 $7700.00 Window Closed / Lapsed

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