Method for producing semiconductor device having alignment mark

Claim 1

A method for producing a semiconductor device comprising: a first step for forming an insulative film on a substrate with a conductive or semiconductive surface; a second step for forming, in the insulative film, an opening through which the conductive or semiconductive surface is exposed and a concave section for use as an alignment mark; a third step for depositing a conductor selectively in the opening, within a first chamber, so that the surface of the conductor and the surface of the insulative film are on the same level; a fourth step for forming a conductive film on the concave section to cover the concave section, the insulative film and the deposited conductor; and a fifth step for performing alignment using the concave section covered with the conductive film and patterning a portion of the conductive film, so as to form a wiring electrically connecting the surface of the conductive or semiconductive surface to the patterned portion of the conductive film through the deposited conductor, wherein in the third and fourth steps, following the selective deposition of the conductor within the first chamber, without exposing the substrate to atmosphere, the substrate is moved into a second chamber, and the conductive film is formed non-selectively within the second chamber, wherein said second step comprises the step of forming a concave section comprising an aperture larger than the opening, wherein the bottom of the concave section comprises a part of the conductive or semiconductive surface.

Claim 2

A method for producing a semiconductor device comprising: a first step for forming an insulative film on a substrate with a conductive or semiconductive surface; a second step for forming, in the insulative film, an opening through which the conductive or semiconductive surface is exposed and a concave section for use as an alignment mark; a third step for depositing a conductor selectively in the opening, within a first chamber, so that the surface of the conductor and the surface of the insulative film are on the same level; a fourth step for forming a conductive film on the concave section to cover the concave section, the insulative film and the deposited conductor; and a fifth step for performing alignment using the concave section covered with the conductive film and patterning a portion of the conductive film, so as to form a wiring electrically connecting the surface of the conductive or semiconductive surface to the patterned portion of the conductive film through the deposited conductor, wherein in the third and fourth steps, following the selective deposition of the conductor within the first chamber, without exposing the substrate to atmosphere, the substrate is moved into a second chamber, and the conductive film is formed non-selectively within the second chamber, wherein said second step comprises the step of forming a concave section comprising an aperture larger than the opening, wherein the bottom of the concave section comprises a part of the conductive or semiconductive surface.