Abstract There is provided an improved method for tightening the distribution of control gate threshold voltages of erase cells in flash EEPROM devices. A relatively low positive voltage is applied to the source regions of the EEPROM devices during an entire erase cycle. The magnitude of a negative constant voltage applied to control gates of the EEPROM devices is lowered to a predetermined voltage level during the entire erase cycle so as to obtain a tighter threshold voltage distribution. The value of a load resistor coupled between the low positive voltage and source regions is reduced simultaneously to a predetermined value so as to compensate for the increased erase time caused by the lowering of the magnitude of the negative constant voltage. As a result, an improved threshold voltage V T distribution after erase is obtained without sacrificing any reduction in the erase speed.
A method for tightening the distribution of control gate threshold voltages of erased cells of flash EEPROM devices, said method comprising the steps of: applying a relatively low positive voltage to source regions of said EEPROM devices during an entire erase cycle; lowering the magnitude of a negative constant voltage applied to control gates of said EEPROM devices from a predetermined higher voltage level to a predetermined lower voltage level during the entire erase cycle so as to obtain a tighter threshold voltage distribution; and reducing simultaneously the value of a load resistor coupled between the low positive voltage and the source regions from a predetermined higher value to a predetermined lower value so as to compensate for an increased erase time caused by the lowering of the magnitude of the negative constant voltage, whereby an improved threshold voltage V T distribution after erase is obtained without sacrificing any reduction in the erase speed.
Claim 2
Independent Claim
154 words
A method for tightening the distribution of control gate threshold voltages of erased cells of flash EEPROM devices, said method comprising the steps of: applying a relatively low positive voltage to source regions of said EEPROM devices during an entire erase cycle; lowering the magnitude of a negative constant voltage applied to control gates of said EEPROM devices from a predetermined higher voltage level to a predetermined lower voltage level during the entire erase cycle so as to obtain a tighter threshold voltage distribution; and reducing simultaneously the value of a load resistor coupled between the low positive voltage and the source regions from a predetermined higher value to a predetermined lower value so as to compensate for an increased erase time caused by the lowering of the magnitude of the negative constant voltage, whereby an improved threshold voltage V T distribution after erase is obtained without sacrificing any reduction in the erase speed.
Claim 3
Dependent Claim
18 words
A method as claimed in claim 1, wherein said low positive voltage has a magnitude of +5.0 volts.
Claim 4
Dependent Claim
27 words
A method as claimed in claim 2, wherein the predetermined lower voltage level of said negative constant voltage is not below the absolute value of 9.5 volts.
Claim 5
Dependent Claim
26 words
A method as claimed in claim 3, wherein the predetermined lower value of said load resistor is not below 56 Ω for a 1 megabit array.
Claim 6
Dependent Claim
25 words
A method as claimed in claim 2, wherein the predetermined lower voltage level of said negative constant voltage has the absolute value of 9.5 volts.
Claim 7
Dependent Claim
24 words
A method as claimed in claim 3, wherein the predetermined lower value of said load resistor is 56 Ω for a 1 megabit array.