US5472565A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Topology induced plasma enhancement for etched uniformity improvement
Assignee: Lam Research Corp
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Filing: 1993-11-17
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Granted: 1995-12-05
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Expires: 2013-11-17
Abstract
Abstract A plasma discharge electrode having a front surface with a central portion thereof including outlets for discharging reactant gas which forms a plasma and a peripheral portion substantially surrounding the outlets. The peripheral portion has at least one recess for locally enhancing a density of the plasma formed by the electrode. The recess can be formed in a replaceable insert and the electrode can be made from a single crystal of silicon.
Inventors
- 👤 Randall S. Mundt
- 👤 David R. Kerr
- 👤 Eric H. Lenz
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:44
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; B; B44; B44C; B44C1/00; B44C1/22; H01J37/32431; H01J37/3244; H01J37/32532; H01J37/32541; H01J37/32596
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
83 words
An electrode useful in a plasma reaction chamber, comprising: one or more outlets in a central portion of the electrode for discharging reactant gas outwardly of an exposed surface of the electrode; and a groove in the exposed surface, the groove being located at a peripheral portion of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode.
Claim 2
Dependent Claim
83 words
An electrode useful in a plasma reaction chamber, comprising: one or more outlets in a central portion of the electrode for discharging reactant gas outwardly of an exposed surface of the electrode; and a groove in the exposed surface, the groove being located at a peripheral portion of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode.
Claim 3
Dependent Claim
26 words
The plasma electrode as claimed in claim 1, wherein said peripheral portion of the electrode includes a second groove in said exposed surface of the electrode.
Claim 4
Dependent Claim
20 words
The plasma electrode as claimed in claim 2, wherein said grooves extend completely around said central portion of the electrode.
Claim 5
Dependent Claim
25 words
The plasma electrode as claimed in claim 3, wherein one of said grooves includes means for discharging gas from said peripheral portion of the electrode.
Claim 6
Dependent Claim
25 words
The plasma electrode as claimed in claim 4, wherein said grooves are formed in a replaceable insert mounted in said peripheral portion of the electrode.
Claim 7
Dependent Claim
34 words
The plasma electrode as claimed in claim 1, wherein a width of said groove is between 5 and 50 times a mean free path of a molecule of the plasma formed by the electrode.
Claim 8
Dependent Claim
28 words
The plasma electrode as claimed in claim 1, wherein a shape of said groove is selected from the group consisting of U-shaped, V-shaped, channel-shaped, or any combination thereof.
Claim 9
Dependent Claim
23 words
The plasma electrode as claimed in claim 1, wherein said groove includes means for discharging gas from said peripheral portion of the electrode.
Claim 10
Dependent Claim
25 words
The plasma electrode as claimed in claim 1, wherein said groove is formed in a replaceable insert mounted in said peripheral portion of the electrode.
Claim 11
Dependent Claim
17 words
The plasma electrode as claimed in claim 1, wherein the electrode comprises a single crystal of silicon.
Claim 12
Dependent Claim
18 words
The plasma electrode as claimed in claim 1 wherein the electrode forms part of a semiconductor etching apparatus.
Claim 13
Dependent Claim
19 words
The plasma electrode as claimed in claim 1, wherein the groove has a width of 0.015 to 0.150 inch.
Claim 14
Dependent Claim
24 words
The plasma electrode as claimed in claim 1, wherein the groove is a channel-shaped groove extending completely around the central portion of the electrode.
Claim 15
Independent Claim
138 words
A method of treating an article with a plasma using an electrode having a central portion and a peripheral portion surrounding the central portion, the peripheral portion including a groove in an exposed surface of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode, said method comprising the steps of: discharging reactant gas from a central portion of the electrode; forming a plasma adjacent an exposed portion of the electrode, the plasma being in contact with the central and peripheral portions of the electrode; and topographically enhancing a density of the plasma at the peripheral portion of the electrode by contact of the plasma with surfaces of the electrode forming the groove.
Claim 16
Independent Claim
138 words
A method of treating an article with a plasma using an electrode having a central portion and a peripheral portion surrounding the central portion, the peripheral portion including a groove in an exposed surface of the electrode and extending at least partly around the central portion of the electrode, the groove being effective for topographically enhancing a local density of the plasma formed adjacent the exposed surface of the electrode, said method comprising the steps of: discharging reactant gas from a central portion of the electrode; forming a plasma adjacent an exposed portion of the electrode, the plasma being in contact with the central and peripheral portions of the electrode; and topographically enhancing a density of the plasma at the peripheral portion of the electrode by contact of the plasma with surfaces of the electrode forming the groove.
Claim 17
Dependent Claim
17 words
The method as claimed in claim 14, further comprising a step of discharging gas from the groove.
Claim 18
Dependent Claim
19 words
The method as claimed in claim 14, further comprising a step of etching a semiconductor wafer with the plasma.
Claim 19
Dependent Claim
30 words
The method as claimed in claim 14, wherein the groove has a width of between 5 and 50 times a mean free path of a molecule of the reactant gas.
Claim 20
Dependent Claim
23 words
The method as claimed in claim 14, wherein the groove is a channel-shaped groove extending completely around the central portion of the electrode.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-12-04 | 1999-06-05 | 1999-12-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-12-04 | 2003-06-05 | 2003-12-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-12-04 | 2007-06-05 | 2007-12-05 | $7700.00 | Window Closed / Lapsed |