US5469200A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Polycrystalline silicon substrate having a thermally-treated surface, and process of making the same
Assignee: Canon Inc
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Filing: 1992-11-12
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Granted: 1995-11-21
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Expires: 2012-11-12
Abstract
Abstract A substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, characterized in that said substrate includes a base member constituted by a polycrystalline material and said polycrystalline base member has a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment. A process for producing said substrate, a liquid jet recording head in which said substrate is used, and a liquid jet recording apparatus in which said substrate is used. By using the above specific substrate, there can be provided a desirable elongated recording head which is free of a warpage or a curved portion at a reduced production cost.
Inventors
- 👤 Haruhiko Terai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 05:41
CPC Classifications
B; B41; B41J; B41J2/00; B41J2/005; B41J2/01; B41J2/135; B41J2/16; B41J2/1601; B41J2/1604; B41J2/1621; B41J2/1631; B41J2/1632; B41J2/164; B41J2/1642; B41J2/1646; B41J2202/00; B41J2202/01; B41J2202/03
Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
104 words
A process for producing a substrate for liquid jet recording head provided with an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor is formed, characterized by comprising: providing a member composed of a polycrystalline material as a constituent base member of said substrate, and thermally oxidizing the surface of said polycrystalline member and thermally softening the surface of said polycrystalline member at a temperature in the range of 1230° C. to 1330° C., to thereby form a thermal oxide layer on the surface of said polycrystalline member.
Claim 2
Dependent Claim
104 words
A process for producing a substrate for liquid jet recording head provided with an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor is formed, characterized by comprising: providing a member composed of a polycrystalline material as a constituent base member of said substrate, and thermally oxidizing the surface of said polycrystalline member and thermally softening the surface of said polycrystalline member at a temperature in the range of 1230° C. to 1330° C., to thereby form a thermal oxide layer on the surface of said polycrystalline member.
Claim 3
Dependent Claim
24 words
A process for producing a substrate for liquid jet recording head according to claim 1, wherein the polycrystalline member is a polycrystalline silicon member.
Claim 4
Dependent Claim
28 words
A process for producing a substrate for liquid jet recording head according to claim 1, wherein the thermally oxidizing step and the thermally softening step are successively conducted.
Claim 5
Dependent Claim
28 words
A process for producing a substrate for liquid jet recording head according to claim 1, wherein the thermally oxidizing step and the thermally softening step are concurrently conducted.
Claim 6
Dependent Claim
28 words
A process for producing a substrate for liquid jet recording head according to claim 1 which further comprises a step of diffusing an impurity into the polycrystalline member.
Claim 7
Dependent Claim
55 words
A process for producing a substrate for liquid jet recording head according to claim 5, wherein the amount of the impurity incorporated into the polycrystalline member is adjusted to be 1×10 21 atoms/cm 3 or less and the thermally softening step is conducted at a temperature in the range of 1130° C. to 1330° C.
Claim 8
Dependent Claim
88 words
A substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, characterized in that said substrate includes a base member constituted by a polycrystalline material and said polycrystalline base member has a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.
Claim 9
Dependent Claim
88 words
A substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, characterized in that said substrate includes a base member constituted by a polycrystalline material and said polycrystalline base member has a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.
Claim 10
Dependent Claim
22 words
A substrate for liquid jet recording head according to claim 7, wherein the polycrystalline base member is a polycrystalline silicon base member.
Claim 11
Dependent Claim
45 words
A substrate for liquid jet recording head according to claim 7, wherein the substrate is a substrate for full line type recording head which has a length corresponding to the entire width of the recording area of a recording member on which recording is conducted.
Claim 12
Dependent Claim
112 words
A liquid jet recording head which includes a substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, and a liquid supplying pathway disposed in the vicinity of said electrothermal converting body of said substrate, characterized in that said substrate includes a base member constituted by a polycrystalline material and said polycrystalline base member has a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.
Claim 13
Dependent Claim
112 words
A liquid jet recording head which includes a substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, and a liquid supplying pathway disposed in the vicinity of said electrothermal converting body of said substrate, characterized in that said substrate includes a base member constituted by a polycrystalline material and said polycrystalline base member has a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.
Claim 14
Dependent Claim
19 words
A liquid jet recording head according to claim 10, wherein the polycrystalline member is a polycrystalline silicon base member.
Claim 15
Dependent Claim
43 words
A liquid jet recording head according to claim 10, wherein the substrate is a substrate for full line type recording head which has a length corresponding to the entire width of the recording area of a recording member on which recording is conducted.
Claim 16
Dependent Claim
135 words
A liquid jet recording apparatus comprising: a liquid jet recording head including a substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, and a liquid supplying pathway disposed in the vicinity of said electrothermal converting body of said substrate wherein said substrate includes a base member constituted by a polycrystalline material, said polycrystalline base member having a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.; and an electric signal supplying means capable of supplying an electric signal to said heat generating resistor of said recording head.
Claim 17
Dependent Claim
135 words
A liquid jet recording apparatus comprising: a liquid jet recording head including a substrate for liquid jet recording head including an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, and a liquid supplying pathway disposed in the vicinity of said electrothermal converting body of said substrate wherein said substrate includes a base member constituted by a polycrystalline material, said polycrystalline base member having a thermal oxide layer formed by subjecting the surface of said polycrystalline base member to thermal oxidation treatment and thermally softening treatment at a temperature in the range of 1230° C. to 1330° C.; and an electric signal supplying means capable of supplying an electric signal to said heat generating resistor of said recording head.
Claim 18
Dependent Claim
19 words
A liquid jet recording apparatus according to claim 13, wherein the polycrystalline member is a polycrystalline silicon base member.
Claim 19
Dependent Claim
43 words
A liquid jet recording apparatus according to claim 13, wherein the substrate is a substrate for full line type recording head which has a length corresponding to the entire width of the recording area of a recording member on which recording is conducted.
Claim 20
Dependent Claim
124 words
A process for producing a substrate for a liquid jet recording head provided with an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, comprising the steps of: providing a member composed of a polycrystalline material as a constituent base member of said substrate, diffusing an impurity into said polycrystalline member in an amount of not more than about 1×10 21 atoms/cm 3 , and thermally oxidizing the surface of said polycrystalline member and thermally softening the surface of said polycrystalline member at a temperature in the range of 1230° C. to 1330° C., to thereby form a thermal oxide layer on the surface of said polycrystalline member.
Claim 21
Dependent Claim
124 words
A process for producing a substrate for a liquid jet recording head provided with an electrothermal converting body comprising a heat generating resistor capable of generating thermal energy and a pair of wirings electrically connected to said heat generating resistor, comprising the steps of: providing a member composed of a polycrystalline material as a constituent base member of said substrate, diffusing an impurity into said polycrystalline member in an amount of not more than about 1×10 21 atoms/cm 3 , and thermally oxidizing the surface of said polycrystalline member and thermally softening the surface of said polycrystalline member at a temperature in the range of 1230° C. to 1330° C., to thereby form a thermal oxide layer on the surface of said polycrystalline member.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1998-11-20 | 1999-05-22 | 1999-11-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-11-20 | 2003-05-22 | 2003-11-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-11-20 | 2007-05-22 | 2007-11-21 | $7700.00 | Window Closed / Lapsed |