Projection exposure apparatus and semiconductor device manufacturing method

Claim 2

A projection exposure apparatus comprising: an illumination optical system comprising an illumination source for illuminating an original having an exposure pattern, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said changing mechanism including a selecting mechanism for selecting one of predetermined illumination source shapes, said selecting mechanism including a turret having a plurality of apertures for determining the illumination source shapes; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; and adjusting means responsive to said changing mechanism to adjust said projection optical system.

Claim 3

An apparatus according to claim 1, wherein said adjusting means adjusts aberration of said projection optical system.

Claim 4

An apparatus according to claim 1, wherein said adjusting means adjusts field of curvature of said projection optical system.

Claim 5

An apparatus according to claim 1, wherein said adjusting means adjusts one side blurness of said projection optical system.

Claim 6

An apparatus according to claim 1, wherein said adjusting means adjusts pivotal inclination of said projection optical system.

Claim 7

An apparatus according to claim 1, wherein said adjusting means adjusts projection magnification of said projection optical system.

Claim 8

An apparatus according to claim 1, wherein said adjusting means adjusts a distance between the original and said projection optical system.

Claim 9

An apparatus according to claim 1, wherein said adjusting means adjusts power of said projection optical system.

Claim 10

An apparatus according to claim 1, further comprising input means for inputting information indicative of a kind of the original, wherein said changing mechanism changes the shape in accordance with information inputted to said input means.

Claim 11

An apparatus according to claim 9, wherein said input means includes a bar code reader for reaching a bar code on the original.

Claim 12

An apparatus according to claim 1, wherein said illumination optical system includes a radiation source and an optical integrator, and wherein said illumination source is formed behind the optical integrator as a second illumination source.

Claim 13

An apparatus according to claim 1, wherein said plural illumination source shapes includes one corresponding to a zone including the optical axis.

Claim 14

An apparatus according to claim 1, wherein said plural illumination source shapes include one corresponding to a zone outside the optical axis.

Claim 15

An apparatus according to claim 13, wherein said one has a substantially circular ring shape around the optical axis.

Claim 16

An apparatus according to claim 13, wherein the one has a substantially rectangular ring shape around the optical axis.

Claim 17

An apparatus according to claim 13, wherein the one has four illumination source portions in respective quadrants in an orthogonal coordinate with its origin at the optical axis.

Claim 18

An apparatus according to claim 16, wherein the exposure pattern is substantially codirectional with the ordinate and the abscissa of the coordinate.

Claim 19

A projection exposure apparatus comprising: an illumination optical system comprising an illumination source for illuminating an original having an exposure pattern, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said changing mechanism including a selecting mechanism for selecting one of predetermined illumination source shapes, wherein the selecting mechanism includes a turret having a plurality of apertures for determining the illumination source shapes, a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; and processing means responsive to said changing means to change a parameter and for calculating an optical property of said projection optical system.

Claim 20

A projection exposure apparatus comprising: an illumination optical system comprising an illumination source for illuminating an original having an exposure pattern, said illumination optical system including a changing mechanism for changing a shape of the illumination source, said changing mechanism including a selecting mechanism for selecting one of predetermined illumination source shapes, wherein the selecting mechanism includes a turret having a plurality of apertures for determining the illumination source shapes, a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; and processing means responsive to said changing means to change a parameter and for calculating an optical property of said projection optical system.

Claim 21

An apparatus according to claim 18, wherein the optical property includes at least one of focus point and projection magnification of said projection optical system.

Claim 22

An apparatus according to claim 18, further comprising adjusting means responsive to said processing means to adjust said projection optical system.

Claim 23

An apparatus according to claim 18, further comprising input means for inputting information indicative of a kind of the original, wherein said changing mechanism changes the shape in accordance with information inputted to said input means.

Claim 24

An apparatus according to claim 21, wherein said input means includes a bar code reader for reaching a bar code on the original.

Claim 25

A projection exposure apparatus, comprising: an illumination optical system constituting an illumination source for illuminating an original having an exposure pattern, said illumination optical system including a changing mechanism for changing the shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto the surface to be exposed; and processing means, responsive to said changing mechanism to change a parameter, for calculating an optical property of said projection optical system, other than the focus point and the projection magnification thereof.

Claim 26

A projection exposure apparatus, comprising: an illumination optical system constituting an illumination source for illuminating an original having an exposure pattern, said illumination optical system including a changing mechanism for changing the shape of the illumination source; a projection optical system for projecting an image of the exposure pattern onto the surface to be exposed; and processing means, responsive to said changing mechanism to change a parameter, for calculating an optical property of said projection optical system, other than the focus point and the projection magnification thereof.

Claim 27

An apparatus according to claim 23, further comprising adjusting means responsive to said processing means to adjust said projection optical system.

Claim 28

An apparatus according to claim 23, further comprising input means for inputting information indicative of the type of the original, wherein said changing mechanism changes the shape of the illumination source in accordance with the information inputted to said input means.

Claim 29

An apparatus according to claim 25, wherein said input means includes a bar code reader for reading a bar code provided on the original.

Claim 30

A projection exposure apparatus, comprising: an illumination optical system having an illumination source, for illuminating an original having an exposure pattern, said illumination optical system including means for changing the shape of said illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; and processing means responsive to said changing means to change a parameter for calculating a change in the optical property of said projection optical system, other than the imaging position and the projection magnification thereof.

Claim 31

A projection exposure apparatus, comprising: an illumination optical system having an illumination source, for illuminating an original having an exposure pattern, said illumination optical system including means for changing the shape of said illumination source; a projection optical system for projecting an image of the exposure pattern onto a surface to be exposed; and processing means responsive to said changing means to change a parameter for calculating a change in the optical property of said projection optical system, other than the imaging position and the projection magnification thereof.

Claim 32

A exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting an aberration of said projection optical system, in accordance with the change in said illumination source.

Claim 33

A exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting an aberration of said projection optical system, in accordance with the change in said illumination source.

Claim 34

An apparatus according to claim 28, wherein said adjusting means adjusts the distortion of the image of the pattern illuminated.

Claim 35

An apparatus according to claim 28, wherein said adjusting means adjusts the field of curvature of said projection optical system, in accordance with the change in said illumination source.

Claim 36

An apparatus according to claim 30, wherein said adjusting means adjusts the distortion of the image of the pattern illuminated.

Claim 37

An apparatus according to claim 28, wherein said changing means serves to define one of an on-axis illumination source and an off-axis illumination source.

Claim 38

An exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting one side blurness of said projection optical system, in accordance with the change in said illumination source.

Claim 39

An exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting one side blurness of said projection optical system, in accordance with the change in said illumination source.

Claim 40

An apparatus according to claim 33, wherein said changing means serves to define one of an on-axis illumination source and an off-axis illumination source.

Claim 41

An exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting the pivotal inclination of said projection optical system, in accordance with the change in said illumination source.

Claim 42

An exposure apparatus, comprising: means for changing the shape of an illumination source illuminating a pattern; a projection optical system for projecting an image of the pattern illuminated by said illumination source, onto a substrate; and means for adjusting the pivotal inclination of said projection optical system, in accordance with the change in said illumination source.

Claim 43

An apparatus according to claim 26, wherein said changing means serves to define one of an on-axis illumination system and an off-axis illumination system.