Method of forming pattern having optical angle in charged particle exposure system

Claim 2

In a charged particle exposure system having a first memory means (3, 4) for storing dimensional data (X2, Y2) of an input pattern, a second memory means (1, 2) for storing start-point coordinate data (X1, Y1) of the input pattern, a pitch memory (5, 6, 7), connected to said first memory means, for determining dimensions (Sx, Sy) of a rectangular beam pattern in scanning and non-scanning directions, a means for calculating coordinates of rectangular beam patterns according to the dimensional data stored in the pitch memory and the start-point coordinate data stored in the second memory means, and a multiplier for independently changing at least one of the dimensions of each of the rectangular beam patterns along an X or Y axis and the start-point coordinates of the rectangular beam pattern according to optional angle generating data, a method for generating exposure data of a plurality of the rectangular beam patterns to form a required right triangle pattern having a predetermined angle, comprising the steps of: selecting the dimensions (Sx, Sy) in scanning and non-scanning directions of a reference rectangular beam pattern to form an isosceles right triangle pattern from the pitch memory according to the required right triangle pattern; specifying the dimensions and start-point coordinates of the reference rectangular beam pattern: calculating the dimensional and coordinate data of a plurality of the rectangular beam patterns to form the required right triangle pattern having the predetermined angle by using a multiplier in which one of the dimensions of the required rectangular beam pattern along X or Y axis is obtained according to a value of tan θ of the angle; and generating exposure data of a plurality of the rectangular beam patterns to form the required right triangle pattern having said predetermined angle.

Claim 3

The method as set forth in claim 1, further comprising the steps of: repeating the calculating step thereby to obtain the dimensions and the start-point coordinates of all rectangular beam patterns necessary to form the required right triangle patterns.

Claim 4

The method as set forth in claim 1, further comprising the steps of: calculating the dimensions and start-point coordinates of the required rectangular beam pattern as the isosceles right triangle pattern; calculating the dimensions and start-point coordinates of a plurality of the required rectangular beam pattern as the isosceles right triangle pattern; processing, with use of the multiplier and the value of tan θ of the angle, the required rectangular beam patterns as the isosceles right triangle to obtain exposure data of a plurality of the rectangular beam patterns to form a required right triangle pattern having said predetermined angle.

Claim 5

The method as set forth in claim 1, wherein said selecting step is carried out utilizing the pitch memory comprising a rectangular pitch memory for calculating the maximum dimensions of a rectangular beam for forming a rectangular pattern, and a non-rectangular pitch memory for calculating the length in a non-scanning direction of a narrow rectangular beam for forming a non-rectangular pattern.

Claim 6

In a charged particle exposure system having a first memory means (3, 4) for storing dimensional data (X2, Y2) of an input pattern, a second memory means (1, 2) for storing start-point coordinate data (X1, Y1) of the input pattern, pitch memory means ( 5, 6, 7) for determining respective dimensions (Sx, Sy) of a rectangular beam pattern in scanning and non-scanning directions, means for calculating coordinates of rectangular beam patterns according to the dimensional data stored in the pitch memory and the start-point coordinate data stored in the second memory means, and a multiplier for independently changing at least one of the dimensions of each of the rectangular beam pattern along an X axis or a Y axis and the start-point coordinates of the rectangular beam pattern according to variable angle generating data relating to desired right triangle patterns to be exposed in accordance with the relative dimensions of the legs thereof respectively in the X axis and Y axis directions, a method for generating exposure data of a plurality of the rectangular beam patterns to form a desired right triangle pattern having respective legs in the X axis and Y axis directions having a corresponding and fixed dimensional ratio therebetween defining a corresponding, fixed angle, comprising the steps of: selecting the respective dimensions (Sx, Sy) in scanning and non-scanning directions of a reference rectangular beam pattern to form an isosceles right triangle pattern from the pitch memory according to the desired right triangle pattern; specifying the dimensions and start-point coordinates of the reference rectangular beam pattern: calculating the dimensional and coordinate data of a plurality of the rectangular beam patterns to form the desired right triangle pattern having the fixed angle by using a multiplier in which one of the dimensions of the required rectangular beam pattern, respectively along X and Y axes, is obtained according to a value of the tangent of the fixed angle; and generating exposure data of a plurality of the rectangular beam patterns to form the required right triangle pattern having the fixed angle.

Claim 7

In a charged particle exposure system having a first memory means (3, 4) for storing dimensional data (X2, Y2) of an input pattern, a second memory means (1, 2) for storing start-point coordinate data (X1, Y1) of the input pattern, pitch memory means ( 5, 6, 7) for determining respective dimensions (Sx, Sy) of a rectangular beam pattern in scanning and non-scanning directions, means for calculating coordinates of rectangular beam patterns according to the dimensional data stored in the pitch memory and the start-point coordinate data stored in the second memory means, and a multiplier for independently changing at least one of the dimensions of each of the rectangular beam pattern along an X axis or a Y axis and the start-point coordinates of the rectangular beam pattern according to variable angle generating data relating to desired right triangle patterns to be exposed in accordance with the relative dimensions of the legs thereof respectively in the X axis and Y axis directions, a method for generating exposure data of a plurality of the rectangular beam patterns to form a desired right triangle pattern having respective legs in the X axis and Y axis directions having a corresponding and fixed dimensional ratio therebetween defining a corresponding, fixed angle, comprising the steps of: selecting the respective dimensions (Sx, Sy) in scanning and non-scanning directions of a reference rectangular beam pattern to form an isosceles right triangle pattern from the pitch memory according to the desired right triangle pattern; specifying the dimensions and start-point coordinates of the reference rectangular beam pattern: calculating the dimensional and coordinate data of a plurality of the rectangular beam patterns to form the desired right triangle pattern having the fixed angle by using a multiplier in which one of the dimensions of the required rectangular beam pattern, respectively along X and Y axes, is obtained according to a value of the tangent of the fixed angle; and generating exposure data of a plurality of the rectangular beam patterns to form the required right triangle pattern having the fixed angle.

Claim 8

The method as set forth in claim 5, further comprising the steps of: repeating the calculating step thereby to obtain the dimensions and the start-point coordinates of all rectangular beam patterns necessary to form the desired right triangle patterns.

Claim 9

The method as set forth in claim 5, further comprising the steps of: calculating the dimensions and start-point coordinates of the desired rectangular beam pattern as the isosceles right triangle pattern; calculating the dimensions and start-point coordinates of a plurality of the required rectangular beam patterns as the isosceles right triangle pattern; processing, with use of the multiplier and the value of the tangent of the angle, the required rectangular beam patterns of the isosceles right triangle to obtain exposure data of a plurality of the rectangular beam patterns to form the desired right triangle pattern having the fixed angle.

Claim 10

The method as set forth in claim 5, wherein said selecting step is carried out utilizing the pitch memory comprising a rectangular pitch memory for calculating the maximum dimensions of a rectangular beam for forming a rectangular pattern, and a non-rectangular pitch memory for calculating the length in a non-scanning direction of a narrow rectangular beam for forming a non-rectangular pattern.

Claim 11

The method as set forth in claim 8, wherein the dimension and start-point coordinate along only one axis X or Y are used in forming the required pattern.

Claim 12

The method as set forth in claim 9, wherein shape codes representing specific triangles, respectively, are used.