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US4387433A Expired / Lapsed US ⏱️ 0.0 years remaining

High speed data interface buffer for digitally controlled electron beam exposure system

Assignee: International Business Machines Corp
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Filing: 1980-12-24
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Granted: 1983-06-07
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Expires: 2000-12-24
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Abstract

Abstract An electron beam exposure system for forming integrated circuit patterns in which pattern data provided by either a control processor or a mass storage device is transferred through a pattern buffer interface which contains a large buffer memory, the reading and writing of which is automatically controlled by read and write logic contained within the interface. Data is transferred to the interface over busses having a data width less than the data width capable of being stored at an addressable location in the buffer memory. Automatic assembly of larger units of data is controlled by logic within the interface which requires only initialization by the control processor. Automatic address sequencing for subsequent data transfers is carried out under control of self-incrementing storage address registers and self-decrementing word count registers. Transfers of data to the electron beam column, through a pattern generator, is provided in addressable data units, while transfers to the control processor or mass storage device are provided as sub-units of an addressable data unit compatable with their respective buss widths.

Inventors

  • 👤 Pasquale A. Cardenia
  • 👤 Thomas V. Landon
  • 👤 Alfred W. Muir

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 11:40
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/302

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 386 words
An electron beam exposure system for forming integrated circuit patterns, said system including a source of vector scan pattern data in digital form stored in a mass storage device, a control processor unit, a pattern generator coupled to an electron beam column for generating, within a predetermined time period, discrete circuit patterns from units of data, each unit representative of the location and shape of a predetermined integrated circuit image, and a pattern buffer interface interconnecting said mass storage device and said control processor to said pattern generator, the improvement wherein said pattern buffer interface comprises: a random access buffer memory unit for addressably storing said units of vector scan pattern data, said buffer memory unit being responsive to memory address signals and to read and write signals to execute a memory access cycle within a time period greater than said predetermined time period; write control logic means responsive to an address signal and a plurality of write control signals provided by said control processor for controlling the automatic transfer of a first predetermined number of said units of addressable data from a selected one of said mass storage device and said control processor unit to said first predetermined number of addressable locations in said buffer memory unit by generating, independently of said control processor unit, said first predetermined number of memory address signals and a like number of said write signals; read control logic means responsive to an address signal provided by said control processor unit and being responsive to a plurality of read control signals provided by said control processor unit and said pattern generator for controlling the automatic transfer of a second predetermined number of said addressable units of pattern data from said buffer memory unit to said pattern generator by generating, independently of said control processor unit, said second predetermined number of memory address signals and a like number of read signals in response to read request signals provided by said pattern generator; and buffer interface clock means coupled to said read and said write control logic means for controlling the timing of said automatic transfers of data within said pattern buffer interface, independently of said control processor unit, whereby said pattern generator receives said units of vector scan data at a rate substantially equal to said memory access cycle time period.
Claim 2
Dependent Claim 386 words
An electron beam exposure system for forming integrated circuit patterns, said system including a source of vector scan pattern data in digital form stored in a mass storage device, a control processor unit, a pattern generator coupled to an electron beam column for generating, within a predetermined time period, discrete circuit patterns from units of data, each unit representative of the location and shape of a predetermined integrated circuit image, and a pattern buffer interface interconnecting said mass storage device and said control processor to said pattern generator, the improvement wherein said pattern buffer interface comprises: a random access buffer memory unit for addressably storing said units of vector scan pattern data, said buffer memory unit being responsive to memory address signals and to read and write signals to execute a memory access cycle within a time period greater than said predetermined time period; write control logic means responsive to an address signal and a plurality of write control signals provided by said control processor for controlling the automatic transfer of a first predetermined number of said units of addressable data from a selected one of said mass storage device and said control processor unit to said first predetermined number of addressable locations in said buffer memory unit by generating, independently of said control processor unit, said first predetermined number of memory address signals and a like number of said write signals; read control logic means responsive to an address signal provided by said control processor unit and being responsive to a plurality of read control signals provided by said control processor unit and said pattern generator for controlling the automatic transfer of a second predetermined number of said addressable units of pattern data from said buffer memory unit to said pattern generator by generating, independently of said control processor unit, said second predetermined number of memory address signals and a like number of read signals in response to read request signals provided by said pattern generator; and buffer interface clock means coupled to said read and said write control logic means for controlling the timing of said automatic transfers of data within said pattern buffer interface, independently of said control processor unit, whereby said pattern generator receives said units of vector scan data at a rate substantially equal to said memory access cycle time period.
Claim 3
Dependent Claim 39 words
The electron beam exposure system of claim 1 further including a read data buffer for storing at least one unit of said vector scan pattern data read from said buffer memory prior to being transferred to said pattern generator.
Claim 4
Dependent Claim 48 words
The electron beam exposure system of claim 2 wherein data transfer between said pattern buffer interface and said control processor and said mass storage device is accomplished over data busses having data transfer widths of a size less than that of a unit of vector scan pattern data.
Claim 5
Dependent Claim 50 words
The electron beam exposure system of claim 4 further comprising a data in funnel and a data out funnel under control of said write and read control logic means for controlling the transfers of data between said pattern buffer interface and said control processor unit and said mass storage device.

References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-06-06 1986-12-06 1987-06-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-06-06 1990-12-06 1991-06-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-06-06 1994-12-06 1995-06-07 $7700.00 Window Closed / Lapsed

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