US5431769A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and system for plasma treatment
Assignee: Sony Corp
•
Filing: 1993-10-25
•
Granted: 1995-07-11
•
Expires: 2013-10-25
Abstract
Abstract A plasma treatment method and system allowing the plasma intensity to be controllably distributed perpendicularly to the inner wall and ensuring effective and uniform treatment in the case of executing plasma cleaning, plasma CVD, RIE or the like. In the plasma treatment where plasma is generated within a chamber 1 for plasma treatment, magnetic field 31 is applied perpendicularly to the inner wall of the chamber to produce plasma whose intensity is directed perpendicularly to the inner wall of the chamber or in parallel with the surface to be treated. Further, the magnetic filed 31 rendered into a revolving field 32 may be applied to rotate the plasma to accomplish a uniform and effective treatment.
Inventors
- 👤 Toshiro Kisakibaru
- 👤 Akira Kojima
- 👤 Takayuki Fukunaga
- 👤 Yoshinori Hata
- 👤 Yasushi Kato
- 👤 Isao Honbori
- 👤 Tomohide Jozaki
- 👤 Hirohisa Kooriyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:55
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32798; H01J37/32853; H01J37/32862; H01J37/32623; H01J37/3266; H01J37/32678; H01J37/32688
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
225 words
A self-cleaning plasma treatment system for performing plasma operations including plasma cleaning, plasma chemical vapor deposition, reactive ion etching, plasma planarization, plasma polishing, said system comprising: a substantially elongated cylindrical treatment chamber having a peripheral sidewall and having a length dimension, a plurality of coils arranged outwardly circumferentially along the peripheral sidewall of said treatment chamber having a length dimension substantially equal to the length dimension of the treatment chamber, and effective on application of alternating current to define a rotating magnetic field in the treatment chamber directed substantially orthogonal to the sidewall of the treatment chamber over the length thereof, a pair of parallel spaced plate electrodes disposed in the treatment chamber for generating plasma therebetween, the parallel plate electrodes being spaced apart by a distance less than the length of the treatment chamber and less than the length of the coils, means for introducing non-depositional plasma-forming gas into the treatment chamber, means for defining a plasma generating electrical field between the plate electrodes and means for applying alternating current to the coils, whereby a plasma treatment may be provided wherein the intensity of the plasma generated is distributed substantially parallel to a workpiece placed between the spaced plate electrodes and substantially normal to an inner surface of the peripheral sidewall over substantially the total length thereof to provide a self-cleaning plasma treatment system.
Claim 2
Dependent Claim
225 words
A self-cleaning plasma treatment system for performing plasma operations including plasma cleaning, plasma chemical vapor deposition, reactive ion etching, plasma planarization, plasma polishing, said system comprising: a substantially elongated cylindrical treatment chamber having a peripheral sidewall and having a length dimension, a plurality of coils arranged outwardly circumferentially along the peripheral sidewall of said treatment chamber having a length dimension substantially equal to the length dimension of the treatment chamber, and effective on application of alternating current to define a rotating magnetic field in the treatment chamber directed substantially orthogonal to the sidewall of the treatment chamber over the length thereof, a pair of parallel spaced plate electrodes disposed in the treatment chamber for generating plasma therebetween, the parallel plate electrodes being spaced apart by a distance less than the length of the treatment chamber and less than the length of the coils, means for introducing non-depositional plasma-forming gas into the treatment chamber, means for defining a plasma generating electrical field between the plate electrodes and means for applying alternating current to the coils, whereby a plasma treatment may be provided wherein the intensity of the plasma generated is distributed substantially parallel to a workpiece placed between the spaced plate electrodes and substantially normal to an inner surface of the peripheral sidewall over substantially the total length thereof to provide a self-cleaning plasma treatment system.
Claim 3
Dependent Claim
24 words
A plasma treatment system according to claim 1, further comprising control means for controlling the frequency of alternating current being supplied to said coils.
Claim 4
Dependent Claim
21 words
A plasma treatment system according to claim 1, further comprising cooling means for cooling the peripheral sidewall of the treatment chamber.
Claim 5
Dependent Claim
30 words
A plasma treatment system according to claim 3, wherein said cooling means is a heat exchanger intended to cool an outer surface of the peripheral sidewall of said treatment chamber.
Claim 6
Dependent Claim
23 words
A plasma treatment system according to claim 1, wherein said inner surface of said treatment chamber is provided with a plasma resistant coating.
References Cited (Backward Citations)
US3615956A
Cited
US4747368A
Cited
US4950956A
Cited
US4919783A
Cited
US5000113A
Cited
US5215619A
Cited
US4740268A
Cited
US5013401A
Cited
US5038013A
Cited
US5045166A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-07-10 | 1999-01-09 | 1999-07-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-07-10 | 2003-01-09 | 2003-07-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-07-10 | 2007-01-09 | 2007-07-11 | $7700.00 | Window Closed / Lapsed |