Organic stripping composition

Claim 2

A stripping composition for photoresists comprising: (a) from about 50 to 98% by weight of an amide compound of the formula: ##STR7## wherein R is selected from the group consisting of hydrogen, lower alkyl and phenyl; R 1 and R 2 are selected from the group consisting of hydrogen and lower alkyl; and R and R 1 together with the keto and nitrogen group to which they are attached form a five or six membered ring, (b) from about 1 to 49% by weight of an amine compound of the formula: ##STR8## wherein R 3 is selected from the group consisting of --C 2 H 5 , --C 2 H 4 OH, phenyl and CH 2 CH(OH)CH 3 , R 4 is selected from the group consisting of hydrogen, lower alkyl, alkanol and phenyl, and R 5 is selected from the group consisting of hydrogen, lower alkyl and --C 2 H 4 OH, and R 3 and R 4 together with the nitrogen group to which they are attached form a five or six membered ring, and (c) about 0.5 to 20% by weight of 8 hydroxyquinoline.

Claim 3

In a stripping composition for photoresists which are associated with a metal or metal alloy substrate comprising: (a) from about 50 to 98% by weight of an amide compound of the formula: ##STR9## wherein R is selected from the group consisting of hydrogen, lower alkyl and phenyl, R 1 and R 2 are selected from the group consisting of hydrogen and lower alkyl; and R and R 1 together with the keto and nitrogen group to which they are attached form a five or six membered ring, (b) from about 1 to 49% by weight of an amine compound of the formula: ##STR10## wherein R 4 is selected from the group consisting of --C 2 H 5 , --C 2 H 4 OH, phenyl and CH 2 CH(OH)CH 3 , R 4 is selected from the group consisting of hydrogen, lower alkyl, alkanol and phenyl, and R 5 is selected from the group consisting of hydrogen, lower alkyl and --C 2 H 4 OH, and R 3 and R 4 together with the nitrogen group to which they are attached form a five or six membered; ring, the improvement which comprises including about 0.5 to 20% by weight of 8-hydroxyquinoline, said 8-hydroxyquinoline being an inhibitor which forms a stable 5 or 6-membered coordination complex with a metal on said substrate selected from the group consisting of Al, Zn, Cr, Ti, Ta, Ni, Cu, Ga, As, and alloys thereof whereby said complex inhibits oxidation, of said substrate.

Claim 4

In a stripping composition for photoresists which are associated with a metal or metal alloy substrate comprising: (a) from about 50 to 98% by weight of an amide compound of the formula: ##STR9## wherein R is selected from the group consisting of hydrogen, lower alkyl and phenyl, R 1 and R 2 are selected from the group consisting of hydrogen and lower alkyl; and R and R 1 together with the keto and nitrogen group to which they are attached form a five or six membered ring, (b) from about 1 to 49% by weight of an amine compound of the formula: ##STR10## wherein R 4 is selected from the group consisting of --C 2 H 5 , --C 2 H 4 OH, phenyl and CH 2 CH(OH)CH 3 , R 4 is selected from the group consisting of hydrogen, lower alkyl, alkanol and phenyl, and R 5 is selected from the group consisting of hydrogen, lower alkyl and --C 2 H 4 OH, and R 3 and R 4 together with the nitrogen group to which they are attached form a five or six membered; ring, the improvement which comprises including about 0.5 to 20% by weight of 8-hydroxyquinoline, said 8-hydroxyquinoline being an inhibitor which forms a stable 5 or 6-membered coordination complex with a metal on said substrate selected from the group consisting of Al, Zn, Cr, Ti, Ta, Ni, Cu, Ga, As, and alloys thereof whereby said complex inhibits oxidation, of said substrate.

Claim 5

The stripping composition of claim 2 wherein said inhibitor is a heterocyclic compound.

Claim 6

The stripping composition of claim 3 wherein said heterocyclic compound is 8-hydroxyquinoline.

Claim 7

A process for removing a coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the composition of claim 1, for a stripping effective period of time and then removing the coating from the substrate.

Claim 8

A process for removing a coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of the composition of claim 2, for a stripping effective period of time and then removing the coating from the substrate.

Claim 9

The composition of claim 1 including water.

Claim 10

The composition of claim 1 which is non-aqueous.

Claim 11

The composition of claim 1 wherein said amine is selected from the group consisting of monoethanol amine, N-methyl aminoethanol, methylethylamine, morpholine, 1-amino-2-propanol, 2-(2-aminoethoxyethanol), 3-methoxypropylamine, 2-amino-picoline and bis (2-ethylhexyl)amine.

Claim 12

The composition of claim 1 including up to about 2% by weight of nonionic detergent.

Claim 13

The composition of claim 1 comprising about 97% by weight of dimethylacetamide, about 1% by weight of diethanolamine and about 2% by weight of 8-hydroxyquinoline.

Claim 14

A process for removing a coating from a coated substrate comprising applying to said coated substrate a stripping effective amount of a stripping composition of claim 1, for a stripping effective period of time, and then removing the coating from the substrate.