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US5412596A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor storage device with a ferroelectric transistor storage cell

Assignee: Rohm Co Ltd
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Filing: 1994-04-28
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Granted: 1995-05-02
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Expires: 2014-04-28
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Abstract

Abstract A semiconductor storage device having a memory array composed of storage ceils arranged in a matrix. The storage cells include a ferroelectric transistor having a metal-ferroelectrics-semiconductor structure and a switching transistor. A source electrode of one of the transistors and a drain electrode of the other transistors are connected to each other. According to the present invention, the necessary time for writing becomes short, realizing a rapid operation of nano second order. Further, many times (1010 order) of rewriting is possible. This brings a longer life thereof compared with a EEPROM which is rewritable about 104 times. Since the reading out is non-destructive, the rewriting is not required so that the life of the device is further lengthened.

Inventors

  • 👤 Kazuhiro Hoshiba

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 17:44
CPC Classifications
G; G11; G11C; G11C11/00; G11C11/21; G11C11/22; G11C11/223; H; H10; H10B; H10B53/00

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 135 words
A semiconductor storage device having a memory array composed of storage cells arranged in a matrix on a semiconductor substrate, said storage cells each comprising: a ferroelectric transistor having source and drain regions provided in said semiconductor substrate, a ferroelectric film provided directly on a surface of said semiconductor substrate between said source and drain regions, and a first gate electrode provided on said ferroelectric film, said ferroelectric transistor to store information by utilizing residual polarization of said ferroelectric film; and a switching transistor having a channel region provided in said semiconductor substrate and adjacent to said ferroelectric transistor, and a second gate electrode provided over both the channel region and said first gate electrode; wherein a source electrode of one of the two transistors is connected to a drain electrode of the other transistor.
Claim 2
Dependent Claim 135 words
A semiconductor storage device having a memory array composed of storage cells arranged in a matrix on a semiconductor substrate, said storage cells each comprising: a ferroelectric transistor having source and drain regions provided in said semiconductor substrate, a ferroelectric film provided directly on a surface of said semiconductor substrate between said source and drain regions, and a first gate electrode provided on said ferroelectric film, said ferroelectric transistor to store information by utilizing residual polarization of said ferroelectric film; and a switching transistor having a channel region provided in said semiconductor substrate and adjacent to said ferroelectric transistor, and a second gate electrode provided over both the channel region and said first gate electrode; wherein a source electrode of one of the two transistors is connected to a drain electrode of the other transistor.
Claim 3
Dependent Claim 134 words
The semiconductor device of claim 1, wherein the memory array comprises a first word line, a second word line, a bit line and a source line, the first word line connecting gate electrodes of switching transistors in one lateral or longitudinal line of the array; the second word line connecting gate electrodes of ferroelectric transistors in one lateral or longitudinal line of the array; the bit line connecting drain electrodes of one of said switching or ferroelectric transistors of which source electrodes are connected to drain electrodes of the other one of said switching or ferroelectric transistors in one longitudinal or lateral line which is perpendicular to the second word line; and the source line connecting source electrodes of said other one of said switching or ferroelectric transistors and said semiconductor substrate to ground.

References Cited (Backward Citations)

US4161038A Cited
US4873664A Cited
US5010520A Cited
US4888630A Cited
US5198994A Cited
US5197027A Cited
US5218568A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1998-05-01 1998-10-31 1999-05-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2002-05-01 2002-10-31 2003-05-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2006-05-01 2006-10-31 2007-05-02 $7700.00 Window Closed / Lapsed

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