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US5411624A
Expired / Lapsed
US
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Magnetron plasma processing apparatus
Assignee: Tokyo Electron Ltd
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Filing: 1993-12-27
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Granted: 1995-05-02
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Expires: 2013-12-27
Abstract
Abstract A magnetron plasma processing apparatus includes a reaction chamber for housing an object to be processed, an electric field generating device, provided in the reaction chamber and having a first electrode for placing the object to be processed thereon and a second electrode opposing the first electrode, for generating an electric field between the first and second electrodes, a magnetic field generating device for generating a magnetic field having a component perpendicular to the electric field, and a device for supplying a reaction gas into the reaction chamber to generate a magnetron plasma by functions of the electric field and the magnetic field. A ring for strengthening the component of the electric field perpendicular to the magnetic field and for increasing the plasma generated at the peripheral portion of the object to be processed is provided to surround the peripheral portion of the object to be processed.
Inventors
- 👤 Yoshihisa Hirano
- 👤 Yoshifumi Takara
- 👤 Masahiro Ogasawara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 06:13
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3402; H01J37/3405; H01J37/3464; H01J37/347
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
216 words
A magnetron plasma processing apparatus comprising: a reaction chamber for housing an object to be processed; first and second electrodes which are provided in the reaction chamber, the first electrode for placing the object to be processed thereon and the second electrode opposing said first electrode through the object to be processed on the first electrode; means for applying a voltage between the first and second electrodes to generate an electric field between the first and second electrodes; a permanent magnet rotatably provided outside the reaction chamber having opposing ends of different polarities to generate a magnetic field between the first and second electrodes, a component of the magnetic field above a central portion of the object to be processed being stronger than a component of the magnetic field above a peripheral portion of the object to be processed; means for rotating the permanent magnet; means for supplying a reaction gas into the reaction chamber to generate a magnetron plasma by functions of the electric field and the magnetic field; and plasma increasing means, provided to surround the peripheral portion of the object to be processed, for strengthening a component of the electric field perpendicular to the magnetic field and increasing an amount of plasma generated at the peripheral portion of the object to be processed.
Claim 2
Dependent Claim
216 words
A magnetron plasma processing apparatus comprising: a reaction chamber for housing an object to be processed; first and second electrodes which are provided in the reaction chamber, the first electrode for placing the object to be processed thereon and the second electrode opposing said first electrode through the object to be processed on the first electrode; means for applying a voltage between the first and second electrodes to generate an electric field between the first and second electrodes; a permanent magnet rotatably provided outside the reaction chamber having opposing ends of different polarities to generate a magnetic field between the first and second electrodes, a component of the magnetic field above a central portion of the object to be processed being stronger than a component of the magnetic field above a peripheral portion of the object to be processed; means for rotating the permanent magnet; means for supplying a reaction gas into the reaction chamber to generate a magnetron plasma by functions of the electric field and the magnetic field; and plasma increasing means, provided to surround the peripheral portion of the object to be processed, for strengthening a component of the electric field perpendicular to the magnetic field and increasing an amount of plasma generated at the peripheral portion of the object to be processed.
Claim 3
Dependent Claim
30 words
The apparatus according to claim 1, wherein said plasma increasing means includes a ring disposed on said first electrode to surround the peripheral portion of the object to be processed.
Claim 4
Dependent Claim
49 words
The apparatus according to claim 2, wherein said ring has a thickness with which a distance between an upper surface thereof and said second electrode is shorter than a distance between an upper surface of the object to be processed placed on said first electrode and said second electrode.
Claim 5
Dependent Claim
15 words
The apparatus according to claim 3, wherein said ring is made of a conductive material.
Claim 6
Dependent Claim
25 words
The apparatus according to claim 4, wherein said ring projects from the upper surface of the object to be processed by less than 3.5 mm.
Claim 7
Dependent Claim
13 words
The apparatus according to claim 4, wherein said ring is made of SiC.
Claim 8
Dependent Claim
24 words
The apparatus according to claim 4, wherein said ring projects from the upper surface of the object to be processed by almost 1.5 mm.
Claim 9
Dependent Claim
16 words
The apparatus according to claim 4, wherein said ring is made of SiC or amorphous carbon.
Claim 10
Dependent Claim
15 words
The apparatus according to claim 3, wherein said ring is made of an insulating member.
Claim 11
Dependent Claim
26 words
The apparatus according to claim 9, wherein said ring projects from the upper surface of the object to be processed by not more than 5 mm.
Claim 12
Dependent Claim
15 words
The apparatus according to claim 9, wherein said ring is made of SiO 2 .
Claim 13
Dependent Claim
26 words
The apparatus according to claim 2, wherein said ring has a ring-shaped member at least an upper surface of which is formed of a silicon material.
Claim 14
Dependent Claim
24 words
The apparatus according to claim 12, wherein said silicon material is made of at least one of monocrystalline silicon, polycrystalline silicon and amorphous silicon.
Claim 15
Dependent Claim
26 words
The apparatus according to claim 13, wherein said ring has the upper surface which is higher than an upper surface of the object to be processed.
Claim 16
Dependent Claim
32 words
The apparatus according to claim 14, wherein said ring has the upper surface which is higher than the upper surface of the object to be processed by 0.5 mm to 2.5 mm.
Claim 17
Dependent Claim
26 words
The apparatus according to claim 13, wherein said ring has the upper surface which is lower than the upper surface of the object to be processed.
Claim 18
Dependent Claim
29 words
The apparatus according to claim 16, wherein said ring has the upper surface which is lower than the upper surface of the object to be processed by 0.5 mm.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-05-01 | 1998-10-31 | 1999-05-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-05-01 | 2002-10-31 | 2003-05-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-05-01 | 2006-10-31 | 2007-05-02 | $7700.00 | Window Closed / Lapsed |