Apparatus for depositing diamond and refractory materials comprising rotating antenna

Claim 1

A plasma CVD apparatus suitable for forming a layer of material on a substrate comprising: a microwave generator means for generating microwave radiation; a waveguide means for guiding said microwave radiation from said microwave generator; a process chamber including a means for receiving a reactant gas for forming a plasma and further including means for holding said substrate; coupling antenna means moveable about a axis of rotation with at least two degrees of freedom for coupling said microwave radiation from said waveguide into said process chamber and for controllably directing said plasma to a locus of positions defining an optimal plasma to substrate contact with respect to said substrate to form a uniform layer of said material thereon.

Claim 6

An apparatus employing a microwave plasma for depositing a layer of material on a substrate comprising: a microwave source; a waveguide means for guiding microwaves from said microwave source; a process chamber for maintaining a constant resonant cavity including a base transparent to visible and near infrared radiation, and means for supporting said substrate over said base; coupling antenna means, swingably rotatable about an axis or rotation and adapted for changing the angle of rotation, for coupling said microwave radiation from said waveguide into said process chamber, to controllably direct a plasma ball in optimal contact with said substrate; a lamp array disposed beneath said base of said process chamber for heating said substrate through said transparent base.

Claim 7

An apparatus employing a microwave plasma for depositing a layer of material on a substrate comprising: a microwave source; a waveguide means for guiding microwaves from said microwave source; a process chamber for maintaining a constant resonant cavity including a base transparent to visible and near infrared radiation, and means for supporting said substrate over said base; coupling antenna means, swingably rotatable about an axis or rotation and adapted for changing the angle of rotation, for coupling said microwave radiation from said waveguide into said process chamber, to controllably direct a plasma ball in optimal contact with said substrate; a lamp array disposed beneath said base of said process chamber for heating said substrate through said transparent base.

Claim 10

An apparatus employing a microwave plasma for depositing a coating on the surface of a substrate comprising: a microwave source for producing microwave radiation; a waveguide means for guiding said microwave radiation and including means for impedance matching said microwave radiation into a plasma load; a process chamber for providing a stable resonant cavity for formation of a plasma, said chamber having a top surface, a base and enclosing side walls, wherein said base comprises a material transparent to visible and near infrared radiation and includes means for movably holding a substrate at a predetermined vertical distance from said base; antenna means rotatable about a pivot axis for coupling said microwave radiation into said process chamber; a lamp array means for heating said substrate through said transparent base to enhance formation of a nucleation layer on said substrate.

Claim 11

An apparatus employing a microwave plasma for depositing a coating on the surface of a substrate comprising: a microwave source for producing microwave radiation; a waveguide means for guiding said microwave radiation and including means for impedance matching said microwave radiation into a plasma load; a process chamber for providing a stable resonant cavity for formation of a plasma, said chamber having a top surface, a base and enclosing side walls, wherein said base comprises a material transparent to visible and near infrared radiation and includes means for movably holding a substrate at a predetermined vertical distance from said base; antenna means rotatable about a pivot axis for coupling said microwave radiation into said process chamber; a lamp array means for heating said substrate through said transparent base to enhance formation of a nucleation layer on said substrate.

Claim 17

An apparatus employing a microwave plasma for depositing a layer of material on a substrate comprising: a source of microwave radiation; a waveguide means for guiding said microwave radiation; a process chamber comprising an enclosure for providing a stable resonant cavity for forming a microwave plasma, including substrate holder means adapted for rotation and for movement in a vertical axis for supporting said substrate; a coupling antenna means adapted to be pivoted about an axis of rotation for coupling said microwave radiation from said waveguide into said process chamber and for controllably moving said plasma over the substrate surface; actuator means for varying the pivot angle of said coupling antenna about said axis of rotation in response to control signals; microprocessor means including a position encoding means for sensing the rotation of said substrate holder and for producing output signals to said actuator means for varying the pivot angle of said coupling antenna about said axis of rotation to maintain the resonant cavity at a constant state as said substrate is rotated.

Claim 18

An apparatus employing a microwave plasma for depositing a layer of material on a substrate comprising: a source of microwave radiation; a waveguide means for guiding said microwave radiation; a process chamber comprising an enclosure for providing a stable resonant cavity for forming a microwave plasma, including substrate holder means adapted for rotation and for movement in a vertical axis for supporting said substrate; a coupling antenna means adapted to be pivoted about an axis of rotation for coupling said microwave radiation from said waveguide into said process chamber and for controllably moving said plasma over the substrate surface; actuator means for varying the pivot angle of said coupling antenna about said axis of rotation in response to control signals; microprocessor means including a position encoding means for sensing the rotation of said substrate holder and for producing output signals to said actuator means for varying the pivot angle of said coupling antenna about said axis of rotation to maintain the resonant cavity at a constant state as said substrate is rotated.

Claim 20

An apparatus employing a microwave plasma for depositing a layer of material such as diamond on a substrate comprising; a source of microwave radiation; a waveguide means for guiding said microwave radiation along a predetermined path and including means for impedance matching said microwave radiation with a plasma load; a process chamber means for providing a stable resonant cavity for the formation of a plasma, including means for receiving a reactant gas and means for holding said substrate adapted for vertical movement; a coupling antenna means pivotally rotatable about a central axis for coupling said microwave radiation from said waveguide means into said process chamber to form said plasma, and for directing the plasma to an optimal locus of positions for creating a uniform coating over the surface of the substrate.

Claim 21

An apparatus employing a microwave plasma for depositing a layer of material such as diamond on a substrate comprising; a source of microwave radiation; a waveguide means for guiding said microwave radiation along a predetermined path and including means for impedance matching said microwave radiation with a plasma load; a process chamber means for providing a stable resonant cavity for the formation of a plasma, including means for receiving a reactant gas and means for holding said substrate adapted for vertical movement; a coupling antenna means pivotally rotatable about a central axis for coupling said microwave radiation from said waveguide means into said process chamber to form said plasma, and for directing the plasma to an optimal locus of positions for creating a uniform coating over the surface of the substrate.

Claim 25

An apparatus for depositing diamond and refractory materials on a substrate comprising: a source of microwave radiation; a waveguide means for receiving said source of microwave radiation; antenna means for coupling said source of microwave radiation from said waveguide means into a process chamber for igniting a stable plasma therein for treating said substrate; tuner means operatively connected with said waveguide means for oscillating the E field component of said microwave radiation to produce an E field of maximized intensity at said antenna in said waveguide means; means for swiveling said antenna about an axis of rotation with at least two degrees of freedom to thereby direct said plasma into desired contact said substrate.

Claim 26

An apparatus for depositing diamond and refractory materials on a substrate comprising: a source of microwave radiation; a waveguide means for receiving said source of microwave radiation; antenna means for coupling said source of microwave radiation from said waveguide means into a process chamber for igniting a stable plasma therein for treating said substrate; tuner means operatively connected with said waveguide means for oscillating the E field component of said microwave radiation to produce an E field of maximized intensity at said antenna in said waveguide means; means for swiveling said antenna about an axis of rotation with at least two degrees of freedom to thereby direct said plasma into desired contact said substrate.

Claim 28

An apparatus for depositing diamond or a refractory material, or the like on a substrate comprising: a source of microwave radiation; a first waveguide means for concentrating said source of microwave radiation to a maximum intensity; a plurality of output waveguide means operatively connected with said first waveguide means for directing said microwave radiation to a plurality of locations with respect to a process chamber; a plurality of antenna means, each having a first end disposed in a corresponding output waveguide means or for receiving said maximized concentration of microwave energy therein and a transmitting end disposed in a portion of said process chamber for transmitting said microwave radiation to ignite a respective plasma in contact with a substrate in said process chamber; rotary switch means connected between said plurality of output waveguide means and said first waveguide means for switching said microwave energy from said first waveguide means into said plurality of output waveguide means; such that a plurality of plasmas ignited at the transmitting end of each corresponding antenna are controllably directed to a corresponding portion of said substrate simultaneously.

Claim 29

An apparatus for depositing diamond or a refractory material, or the like on a substrate comprising: a source of microwave radiation; a first waveguide means for concentrating said source of microwave radiation to a maximum intensity; a plurality of output waveguide means operatively connected with said first waveguide means for directing said microwave radiation to a plurality of locations with respect to a process chamber; a plurality of antenna means, each having a first end disposed in a corresponding output waveguide means or for receiving said maximized concentration of microwave energy therein and a transmitting end disposed in a portion of said process chamber for transmitting said microwave radiation to ignite a respective plasma in contact with a substrate in said process chamber; rotary switch means connected between said plurality of output waveguide means and said first waveguide means for switching said microwave energy from said first waveguide means into said plurality of output waveguide means; such that a plurality of plasmas ignited at the transmitting end of each corresponding antenna are controllably directed to a corresponding portion of said substrate simultaneously.

Claim 30

An apparatus for depositing diamond or refractory materials or the like on a substrate comprising: a source of microwave radiation; a waveguide means for guiding said source of microwave radiation; a process chamber including a substrate holder for holding said substrate therein; antenna means rotatable about a pivot axis with at least 2 degrees of freedom for coupling said microwave radiation from said waveguide means into said process chamber to thereby controllably direct a plasma in desired contact with said substrate; tuner means disposed in said waveguide means for selectively oscillating an E field component of said microwave radiation to provide an E field of maximum intensity for coupling into said antenna.

Claim 31

An apparatus for depositing diamond or refractory materials or the like on a substrate comprising: a source of microwave radiation; a waveguide means for guiding said source of microwave radiation; a process chamber including a substrate holder for holding said substrate therein; antenna means rotatable about a pivot axis with at least 2 degrees of freedom for coupling said microwave radiation from said waveguide means into said process chamber to thereby controllably direct a plasma in desired contact with said substrate; tuner means disposed in said waveguide means for selectively oscillating an E field component of said microwave radiation to provide an E field of maximum intensity for coupling into said antenna.