US5383984A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing apparatus etching tunnel-type
Assignee: Toshiba Corp
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Filing: 1993-06-17
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Granted: 1995-01-24
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Expires: 2013-06-17
Abstract
Abstract A substrate processing apparatus comprising a process tube for enclosing a plurality of semiconductor wafers, injectors for introducing process gas into the process tube, a vacuum pump for exhausting the process tube, RF electrodes arranged along the outer circumference of the process tube and serving to generate high frequency electric field, when power is supplied, in a process-gas-introduced region so as to make process gas into plasmas, a high frequency power source for supplying power to the RF electrodes, heaters arranged in the process tube to directly heat the plural wafers, a power supply for supplying power to the heaters, and a controller for controlling the amount of power supplied from the power supply to the heaters.
Inventors
- 👤 Yutaka Shimada
- 👤 Hitoshi Kato
- 👤 Junichi Kakizaki
- 👤 Kazutugu Aoki
- 👤 Haruki Mori
- 👤 Tatsuo Shiotsuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:48
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0434; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32458; H01J37/32522; H01J2237/00; H01J2237/20; H01J2237/2001; H01J2237/32; H01J2237/33; H01J2237/334; Y; Y10; Y10S; Y10S156/00; Y10S156/912
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
179 words
An apparatus for processing substrates with plasma generated by exciting gas comprising: a processing tube for housing a plurality of substrates; means for introducing a processing gas into the processing tube; electrode means arranged along the outer circumference of said processing tube for generating a high frequency electric field, when power is supplied, in a processing gas introducing region to convert said processing gas into plasma; heater means arranged immediately adjacent to said plurality of substrates within said processing tube to directly heat said plurality of substrates; etching tunnel means arranged between the heater means and the processing gas introducing region and having a plurality of holes through which only radicals in plasma generated in said processing gas introducing region are allowed to pass toward said substrates; means for exhausting said processing gas from said processing tube; first power supply means for supplying power to said electrode means; second power supply means for supplying power to said heater means; and control means for controlling the amount of power supplied from said second power supply means to said heater means.
Claim 2
Independent Claim
179 words
An apparatus for processing substrates with plasma generated by exciting gas comprising: a processing tube for housing a plurality of substrates; means for introducing a processing gas into the processing tube; electrode means arranged along the outer circumference of said processing tube for generating a high frequency electric field, when power is supplied, in a processing gas introducing region to convert said processing gas into plasma; heater means arranged immediately adjacent to said plurality of substrates within said processing tube to directly heat said plurality of substrates; etching tunnel means arranged between the heater means and the processing gas introducing region and having a plurality of holes through which only radicals in plasma generated in said processing gas introducing region are allowed to pass toward said substrates; means for exhausting said processing gas from said processing tube; first power supply means for supplying power to said electrode means; second power supply means for supplying power to said heater means; and control means for controlling the amount of power supplied from said second power supply means to said heater means.
Claim 3
Dependent Claim
60 words
The substrate processing apparatus according to claim 1, wherein said processing tube comprises inner and outer cylinders, said substrates and said heater means are located in said inner cylinder, and said processing gas introducing means includes at least one gas injector which is arranged between said inner and outer cylinders, a plurality of holes being formed in said inner cylinder.
Claim 4
Dependent Claim
47 words
The substrate processing apparatus according to claim 1, further comprising temperature detector means for detecting the temperature in said processing tube wherein the amount of power supplied to said heater means is controlled by said control means responsive to the temperature detected by said temperature detector means.
Claim 5
Dependent Claim
21 words
The substrate processing apparatus according to claim 1, further comprising means for rotating said plurality of substrates in said processing tube.
Claim 6
Dependent Claim
38 words
The substrate processing apparatus according to claim 1, wherein said heater means includes resistance heater elements, each having a plurality of portions including heat values which are different at upper, intermediate and lower zones in said processing tube.
Claim 7
Dependent Claim
35 words
The substrate processing apparatus according to claim 1, wherein said processing gas introducing means includes gas introducing holes which are located remotely from a plurality of regions where plasma is generated by said electrode means.
Claim 8
Dependent Claim
27 words
The substrate processing apparatus according to claim 1, wherein said heater means has a resistance heating element and a protection pipe in which the element is inserted.
Claim 9
Dependent Claim
36 words
The substrate processing apparatus according to claim 1, wherein said heater means has resistance heating elements and a plurality of protection pipes for protecting the elements respectively provided in the longitudinal direction of the process tube.
Claim 10
Independent Claim
210 words
An apparatus for processing substrates with plasma generated by exciting gas, comprising: a processing tube for housing a plurality of substrates; means for introducing a processing gas into said processing tube; electrode means arranged along the outer circumference of said processing tube for generating a high frequency electric field, when power is supplied, in a processing gas introducing region to convert the processing gas into plasma; heater means arranged immediately adjacent to said plurality substrates in said processing tube to directly heat said substrates; etching tunnel means arranged between said heater means and said processing gas introducing region and including a plurality of holes through which only radicals in plasma generated in the processing gas introducing region are allowed to pass toward the substrates; means for exhausting said processing gas from said processing tube; first power supply means for supplying power to said electrode means; second power supply means for supplying power to said heater means; and control means for controlling the amount of power supplied from said second power supply means to said heater means, wherein said processing gas introducing means includes a gas injector located remotely from regions where plasma is generated by said electrode means and also remotely from said holes included in said etching tunnel means.
Claim 11
Independent Claim
210 words
An apparatus for processing substrates with plasma generated by exciting gas, comprising: a processing tube for housing a plurality of substrates; means for introducing a processing gas into said processing tube; electrode means arranged along the outer circumference of said processing tube for generating a high frequency electric field, when power is supplied, in a processing gas introducing region to convert the processing gas into plasma; heater means arranged immediately adjacent to said plurality substrates in said processing tube to directly heat said substrates; etching tunnel means arranged between said heater means and said processing gas introducing region and including a plurality of holes through which only radicals in plasma generated in the processing gas introducing region are allowed to pass toward the substrates; means for exhausting said processing gas from said processing tube; first power supply means for supplying power to said electrode means; second power supply means for supplying power to said heater means; and control means for controlling the amount of power supplied from said second power supply means to said heater means, wherein said processing gas introducing means includes a gas injector located remotely from regions where plasma is generated by said electrode means and also remotely from said holes included in said etching tunnel means.
Claim 12
Dependent Claim
51 words
The substrate processing apparatus according to claim 9, wherein said processing tube comprises inner and outer cylinders, said substrates and said heater means are located within the inner cylinder, and said gas injector is arranged between said inner and outer cylinders, a plurality of holes being formed in said inner cylinder.
Claim 13
Dependent Claim
37 words
The substrate processing apparatus according to claim 10, wherein said holes included in said etching tunnel means and said holes formed in the inner cylinder are positioned to face each other with a small distance provided therebetween.
Claim 14
Dependent Claim
37 words
The substrate processing apparatus according to claim 11, wherein the holes made in each of said etching tunnel means and said inner cylinder are arranged at the same pitch to form two rows of holes in each.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-01-23 | 1998-07-25 | 1999-01-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-23 | 2002-07-25 | 2003-01-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-23 | 2006-07-25 | 2007-01-24 | $7700.00 | Window Closed / Lapsed |