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US5217560A Expired / Lapsed US ⏱️ 0.0 years remaining

Vertical type processing apparatus

Assignee: Tokyo Electron Ltd
•
Filing: 1992-02-13
•
Granted: 1993-06-08
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Expires: 2012-02-13
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Abstract

Abstract An ashing apparatus of the vertical type comprises a reaction tube erected in the vertical direction to house therein a plurality of semiconductor wafers, an inner tube arranged in the reaction tube to enclose the semiconductor wafers and having a plurality of holes through which activated radicals in plasma can be selectively passed, a reaction gas supply pipe for supplying reaction gases into a space between the reaction tube and the inner tube, and plasma generating electrode unit located outside the reactor tube to generate plasma of the reaction gases only in the space between the reaction tube and the inner tube.

Inventors

  • 👤 Yoichi Kurono
  • 👤 Shigeru Handa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 13:14
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244; H10; H10P; H10P50/00; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H10P72/0431; H10P72/0434; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/334; H01J2237/3342; Y; Y10; Y10S; Y10S156/00; Y10S156/912

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 152 words
A vertical type processing apparatus, comprising: a reaction tube erected in the vertical direction to house therein a plurality of objects to be processed; an inner tube arranged in the reaction tube to enclose the objects to be processed and having a plurality of holes through which activated radicals in plasma can be selectively passed; a plurality of pairs of high frequency electrodes arranged outside the reaction tube; and a means for supplying reaction gas into a space between the reaction tube and the inner tube; wherein said high frequency electrodes forming each pair are disposed adjacent to each other, and a high frequency electric field is formed between the reaction tube and the inner tube when a high frequency power is supplied to a space between the paired electrodes so as to generate a plasma of the reaction gas only in the space between the reaction tube and the inner tube.
Claim 2
Dependent Claim 152 words
A vertical type processing apparatus, comprising: a reaction tube erected in the vertical direction to house therein a plurality of objects to be processed; an inner tube arranged in the reaction tube to enclose the objects to be processed and having a plurality of holes through which activated radicals in plasma can be selectively passed; a plurality of pairs of high frequency electrodes arranged outside the reaction tube; and a means for supplying reaction gas into a space between the reaction tube and the inner tube; wherein said high frequency electrodes forming each pair are disposed adjacent to each other, and a high frequency electric field is formed between the reaction tube and the inner tube when a high frequency power is supplied to a space between the paired electrodes so as to generate a plasma of the reaction gas only in the space between the reaction tube and the inner tube.
Claim 3
Dependent Claim 21 words
The processing apparatus according to claim 1, wherein each of said paired electrodes is ring-shaped to coaxially enclose the reaction tube.
Claim 4
Dependent Claim 20 words
The processing apparatus according to claim 2, wherein each pair of the electrodes is connected to its corresponding power supply.
Claim 5
Dependent Claim 40 words
The processing apparatus according to claim 2, wherein each pair of the electrodes is divided along a vertical length of the reaction tube into a plurality of sections, and power and a power-supplying time are set independently for each section.
Claim 6
Dependent Claim 42 words
The processing apparatus according to claim 2, wherein each pair of the electrodes is divided along a vertical length of the reaction tube into a plurality of sections, and an on-off operation for the power application is performed independently for each section.
Claim 7
Dependent Claim 23 words
The processing apparatus according to claim 1, wherein each of said paired electrodes is erected along the outer circumference of the reaction tube.
Claim 8
Dependent Claim 31 words
The processing apparatus according to claim 1, wherein said reaction gas supply means has a gas supply pipe vertically extending in the space between the reaction tube and the inner tube.
Claim 9
Dependent Claim 23 words
The processing apparatus according to claim 7, wherein the gas supply pipe has a plurality of gas outlet holes facing the inner tube.
Claim 10
Dependent Claim 29 words
The processing apparatus according to claim 1, wherein each of the objects to be processed has a plate-like body and the objects are stacked horizontal in a support member.
Claim 11
Dependent Claim 16 words
The processing apparatus according to claim 9, further comprising a means for rotating the support member.
Claim 12
Dependent Claim 18 words
The processing apparatus according to claim 1, further comprising a means for heating interior of the reaction tube.
Claim 13
Dependent Claim 21 words
The processing apparatus according to claim 11, wherein said heating means are divided into plural heating zones in the vertical direction.
Claim 14
Dependent Claim 15 words
The processing apparatus according to claim 1, wherein said inner tube is formed of quartz.

References Cited (Backward Citations)

DE3102174A1 Cited
US4341616A Cited
JPS5743426A Cited
JPS58204526A Cited
JPS60137021A Cited
JPS63306629A Cited
JPH01315137A Cited
JPH0211327A Cited
US5015330A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-06-07 1996-12-07 1997-06-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-06-07 2000-12-07 2001-06-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-06-07 2004-12-07 2005-06-08 $7700.00 Window Closed / Lapsed

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