Apparatus and method of plasma processing

Abstract

Abstract PURPOSE:To generate a high density plasma by a low radio frequency power and carry out a high speed plasma processing by a method wherein gas for treating samples is depressurized and excited by an electric field applied between 1st electrodes and a 2nd electrode and a magnetic field induced by an electromagnet in a vacuum chamber. CONSTITUTION:First electrodes 2A and 2B are provided outside a vacuum chamter 1 in which samples 7 are placed and a 2nd electrode 3 facing the 1st electrodes 2A and 2B is provided inside the chamber 1. An electromagnet 4 is also provided outside the chamber 1. Gas for treating the samples 7 is depressurized and excited in the chamber 1 by an electric field applied between the 1st electrodes 2A and 2B and the 2nd electrode 3 and a magnetic field induced by the electromagnet 4. An AC voltage is applied to the electrodes 2A and 2B and a DC voltage is applied to the electrode 3 or the electrode 3 is grounded. With this constitution, a higher density plasma is generated by a lower radio frequency power and a high speed plasma processing can be carried out.

Inventors

• 👤 Takashi Hirao
• 👤 孝 平尾

Bibliographic Details