US5015330A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Film forming method and film forming device
Assignee: Toshiba Corp
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Filing: 1990-02-28
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Granted: 1991-05-14
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Expires: 2010-02-28
Abstract
Abstract A film forming method comprises the steps of placing a plurality of objects to be processed and supplying an etching gas in a reaction container, removing a natural oxidization originated film on an object to be processed placed in the reaction container under a heating condition by plasma etching, exhausting the etching gas after stopping supply of the etching gas so as to stop making of the plasma, and supplying a film forming gas in the reaction container without rendering the reaction container open to air so as to form a film on the objects.
Inventors
- 👤 Katsuya Okumura
- 👤 Takahiko Moriya
- 👤 Shinji Miyazaki
- 👤 Yoshio Kumagai
- 👤 Susumu Tanaka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 14:20
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32357; C; C23; C23C; C23C16/00; C23C16/02; C23C16/0227; C23C16/0245; C23C16/44; C23C16/448; C23C16/452; C23C16/54; Y; Y10; Y10S; Y10S156/00; Y10S156/917; Y10S438/00; Y10S438/905; Y10S438/913
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
100 words
A film forming method comprising the steps of: placing a plurality of objects to be processed in a reaction container; supplying an etching gas in said reaction container; making said etching gas into a plasma; removing a natural oxidization originated film on said objects to be processed under a heating condition by said plasma; exhausting said etching gas after stopping supply of said etching gas so as to stop making of said plasma; and supplying a film forming gas in said reaction container without rendering said reaction container open to air so as to form a film on said objects.
Claim 2
Dependent Claim
100 words
A film forming method comprising the steps of: placing a plurality of objects to be processed in a reaction container; supplying an etching gas in said reaction container; making said etching gas into a plasma; removing a natural oxidization originated film on said objects to be processed under a heating condition by said plasma; exhausting said etching gas after stopping supply of said etching gas so as to stop making of said plasma; and supplying a film forming gas in said reaction container without rendering said reaction container open to air so as to form a film on said objects.
Claim 3
Dependent Claim
85 words
A film forming device for performing a predetermined treatment on a plurality of objects to be processed accommodated in a reaction container using a process gas and a reactive gas, said device comprising: a plasma mechanism, provided outside said reaction container, for making said process gas into a plasma; and a plasma transporting tube for guiding process-gas plasma provided by said plasma mechanism inside said reaction container in a direction parallel to respective surfaces of said objects on which a film is to be formed.
Claim 4
Dependent Claim
85 words
A film forming device for performing a predetermined treatment on a plurality of objects to be processed accommodated in a reaction container using a process gas and a reactive gas, said device comprising: a plasma mechanism, provided outside said reaction container, for making said process gas into a plasma; and a plasma transporting tube for guiding process-gas plasma provided by said plasma mechanism inside said reaction container in a direction parallel to respective surfaces of said objects on which a film is to be formed.
Claim 5
Dependent Claim
82 words
A film forming method comprising the steps of: making an etching gas into a plasma by means of a plasma mechanism provided outside a reaction chamber; introducing said etching gas made into plasma into a reaction container and removing a surface layer of each of a plurality of objects to be processed by said etching gas made into plasma; and introducing a reactive gas into said reaction container to form a film on a cleaned surface of said objects to be processed.
Claim 6
Dependent Claim
82 words
A film forming method comprising the steps of: making an etching gas into a plasma by means of a plasma mechanism provided outside a reaction chamber; introducing said etching gas made into plasma into a reaction container and removing a surface layer of each of a plurality of objects to be processed by said etching gas made into plasma; and introducing a reactive gas into said reaction container to form a film on a cleaned surface of said objects to be processed.
Claim 7
Dependent Claim
38 words
A film forming method according to claim 3, wherein the film formed on each of said objects to be processed is formed by a process gas made into a plasma by said plasma mechanism and said respective gas.
Claim 8
Dependent Claim
38 words
A film forming method according to claim 4, wherein after said etching gas is made into a plasma by said plasma mechanism, said plurality of objects to be processed are etched using said plasma of said etching gas.
Claim 9
Dependent Claim
24 words
A film forming method according to claim 5, wherein an interior of said reaction container is cleaned by said plasma of said etching gas.
References Cited (Backward Citations)
US4192706A
Cited
US4065369A
Cited
US4668337A
Cited
US4786352A
Cited
US4795529A
Cited
US4882299A
Cited
US4871416A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-05-13 | 1994-11-12 | 1995-05-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-05-13 | 1998-11-12 | 1999-05-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-05-13 | 2002-11-12 | 2003-05-14 | $7700.00 | Window Closed / Lapsed |