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US5367180A Expired / Lapsed US ⏱️ 0.0 years remaining

Thin-film semiconductor device with field plate

Assignee: Fujifilm Business Innovation Corp
•
Filing: 1993-04-09
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Granted: 1994-11-22
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Expires: 2013-04-09
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Abstract

Abstract The invention is based on a thin-film semiconductor FET device. A field plate electrode for producing an electric field is formed on a channel-protecting film above the end of the gate electrode that is on the side of an offset region. Stable transistor characteristics can be maintained for a long time with the field plate electrode voltage set to a low value. The drain electrode is coated with a film of an anticorrosion metal. Where an integrated circuit with a high device density is fabricated from semiconductor devices of this construction, the drain electrodes are effectively prevented from being corroded.

Inventors

  • 👤 Ichiro Asai
  • 👤 Takao Tomono
  • 👤 Takeshi Nakamura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 09:38
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/67; H10D30/6704; H10D30/6713; H10D30/6715; H10D30/64; H10D30/66; H10D30/668; H10D30/6717; H10D30/6729; H10D30/673; H10D30/6733; H10D30/6734; H10D30/6737; H10D30/674; H10D30/6741; H10D30/6743; H10D64/00; H10D64/111

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 166 words
A thin-film semiconductor device comprising: an insulating substrate; a gate electrode having first and second ends on the substrate; a gate-insulating film overlaying the gate electrode; a semiconductor layer on the gate-insulating film having a first portion overlaying the gate electrode and a second portion; an inorganic channel-protecting film overlaying the semiconductor layer; a source electrode connected with the first portion of the semiconductor layer and overlaying the first end of the gate electrode; a drain electrode connected with the second portion of the semiconductor layer, wherein the gate electrode is disposed closer to the source electrode than to the drain electrode; an offset region in the semiconductor layer between the drain electrode and the second end of the gate electrode; a field plate electrode adapted to produce an electric field, the field plate electrode being directly disposed on the channel-protecting film and overlaying the second end of the gate electrode; and an organic interlayer insulating film overlaying the channel-protecting film and the field plate electrode.
Claim 2
Dependent Claim 166 words
A thin-film semiconductor device comprising: an insulating substrate; a gate electrode having first and second ends on the substrate; a gate-insulating film overlaying the gate electrode; a semiconductor layer on the gate-insulating film having a first portion overlaying the gate electrode and a second portion; an inorganic channel-protecting film overlaying the semiconductor layer; a source electrode connected with the first portion of the semiconductor layer and overlaying the first end of the gate electrode; a drain electrode connected with the second portion of the semiconductor layer, wherein the gate electrode is disposed closer to the source electrode than to the drain electrode; an offset region in the semiconductor layer between the drain electrode and the second end of the gate electrode; a field plate electrode adapted to produce an electric field, the field plate electrode being directly disposed on the channel-protecting film and overlaying the second end of the gate electrode; and an organic interlayer insulating film overlaying the channel-protecting film and the field plate electrode.
Claim 3
Dependent Claim 17 words
The thin-film semiconductor device according to claim 1, wherein the channel-protecting film is comprised of silicon nitride.
Claim 4
Dependent Claim 18 words
The thin-film semiconductor device according to claim 1, wherein the interlayer insulating film is comprised of polyimide resin.

References Cited (Backward Citations)

US4797108A Cited
US4885616A Cited
US4958205A Cited
US5017984A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-11-21 1998-05-23 1998-11-22 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-11-21 2002-05-23 2002-11-22 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-11-21 2006-05-23 2006-11-22 $7700.00 Window Closed / Lapsed

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