Abstract This invention describes a low resistance contact structure to n-type GaAs and a method for making such a contact structure. The contact structure is formed by depositing successive layers of Ni, Au, Ge, and Ni. A fifth layer is then deposited on the first four layers. The fifth layer is a metallic tungsten oxide. The metallic tungsten oxide is formed by sputtering tungsten onto the 4 layer stack in a low pressure argon plus oxygen atmosphere. The resulting 5 layer stack is then annealed in a rapid thermal anneal (RTA) process. The RTA process heats the stack for 5 seconds at 600 degrees. The resulting structure consists of an intermetallic NiGe compound having a small amount of a AuGa compound dispersed within it and being covered by a metallic tungsten oxide film. The oxygen from the metallic tungsten oxide film acts as a gettering mechanism to create gallium vacancies in the GaAs lattice structure during the RTA process. The oxygen forms a compound with gallium which is sandwiched between the metallic tungsten layer and the NiGe metallurgy. The sheet resistance of the contact metallurgy is low because the metallic tungsten oxide film is substantially thicker than that required to provide oxygen for the gettering process. The contact resistance to the n-type GaAs is low because the oxygen acts in a similar fashion to gold and creates more gallium vacancies in the GaAs. These vacancies are filled with an n-type dopant (Ge), supplied by the contact metallurgy, to create a better ohmic contact. The contact structure is reliable because there is a low gold content in the contact and because the nickel stabilizes the germanium which is not used for filling the gallium vacancies in the GaAs lattice.
A method for fabricating a contact to GaAs, comprising: depositing a first layer on said GaAs, said first layer comprising nickel; depositing a second layer on said first layer, said second layer comprising gold; depositing a third layer on said second layer, said third layer comprising germanium; depositing a fourth layer on said third layer, said fourth layer comprising nickel; depositing a fifth layer on said fourth layer, said fifth layer comprising metallic tungsten oxide; and annealing said deposited layers to form a multi-metallic compound interposed between said GaAs and said metallic tungsten oxide layer wherein said multi-metallic compound comprises a gallium oxide compound.
Claim 2
Independent Claim
104 words
A method for fabricating a contact to GaAs, comprising: depositing a first layer on said GaAs, said first layer comprising nickel; depositing a second layer on said first layer, said second layer comprising gold; depositing a third layer on said second layer, said third layer comprising germanium; depositing a fourth layer on said third layer, said fourth layer comprising nickel; depositing a fifth layer on said fourth layer, said fifth layer comprising metallic tungsten oxide; and annealing said deposited layers to form a multi-metallic compound interposed between said GaAs and said metallic tungsten oxide layer wherein said multi-metallic compound comprises a gallium oxide compound.
Claim 3
Dependent Claim
64 words
A method for fabricating a contact to GaAs, as in claim 1, wherein: said first layer is approximately 0 to 50 Angstroms thick; said second layer is approximately 40 to 60 Angstroms thick; and said third and fourth layers have a combined thickness of at least approximately 400 Angstroms and where said third layer is approximately 2.2 times as thick as said fourth layer.
Claim 4
Dependent Claim
40 words
A method for fabricating a contact to GaAs, as in claim 1; wherein: said deposition of said fifth layer comprises sputtering tungsten onto said fourth layer, said sputtering occurring in an atmosphere consisting essentially of an inert gas and oxygen.
Claim 5
Dependent Claim
40 words
A method for fabricating a contact to GaAs, as in claim 2, wherein: said deposition of said fifth layer comprises sputtering tungsten onto said fourth layer, said sputtering occurring in an atmosphere consisting essentially of an inert gas and oxygen.