Patent DE1160573B successfully refreshed from Google Patents.
US5352564A
Expired / Lapsed
US
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Resist compositions
Assignee: Shin-Etsu Chemical Co Ltd
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Filing: 1994-01-19
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Granted: 1994-10-04
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Expires: 2014-01-19
Abstract
Abstract A resist composition comprising a base resin, an acid release agent, and a dissolution inhibitor is improved in sensitivity and resolution when the base resin is typically selected from poly-t-butoxystyrene/poly-hydroxystyrene, poly-t-butoxystyrene/poly-p-methoxymethoxystyrene/polyhydroxystyrene, and poly-t-butoxystyrene/poly-p-methoxystyrene/polyhydroxystyrene copolymers. The composition forms a resist useful for the manufacture of LSI.
Inventors
- 👤 Yoshihumi Takeda
- 👤 Toshinobu Ishihara
- 👤 Ken'Ichi Itoh
- 👤 Kazumasa Maruyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 23:01
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0757; G03F7/0758; G03F7/027; G03F7/028; G03F7/029; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/11
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
180 words
A resist composition comprising a base resin, an acid release agent capable of generating an acid upon exposure to light, and a dissolution inhibitor containing an acid unstable group, said base resin being represented by the following rational formula (1), (2) or (3): ##STR29## wherein each of R 1 and R 3 is a hydrogen atom or methyl group, R 2 is a tert-butyl group, and letters a and b satisfy a+b=1, ##STR30## wherein each of R 1 , R 3 and R 5 is a hydrogen atom or methyl group, R 4 is a tert-butyl group, R 6 is an acid hydrolyzable group selected from the group consisting of methoxymethyl, tetrahydro-pyranyl, trialkylsilyl, isopropoxymethyl, tetrahydrofuranyl, and tert-butoxycarbonyl groups, and letters c, d and e satisfy c+d+e=1, ##STR31## wherein each of R 1 , R 3 and R 5 is a hydrogen atom or methyl group, R 7 is selected from the group consisting of tert-butyl, methoxymethyl, tetrahydropyranyl, and trialkylsilyl groups, and R 8 is a lower alkoxy group or a hydrogen atom, and letters f, g and h satisfy f+g+h=1.
Claim 2
Dependent Claim
180 words
A resist composition comprising a base resin, an acid release agent capable of generating an acid upon exposure to light, and a dissolution inhibitor containing an acid unstable group, said base resin being represented by the following rational formula (1), (2) or (3): ##STR29## wherein each of R 1 and R 3 is a hydrogen atom or methyl group, R 2 is a tert-butyl group, and letters a and b satisfy a+b=1, ##STR30## wherein each of R 1 , R 3 and R 5 is a hydrogen atom or methyl group, R 4 is a tert-butyl group, R 6 is an acid hydrolyzable group selected from the group consisting of methoxymethyl, tetrahydro-pyranyl, trialkylsilyl, isopropoxymethyl, tetrahydrofuranyl, and tert-butoxycarbonyl groups, and letters c, d and e satisfy c+d+e=1, ##STR31## wherein each of R 1 , R 3 and R 5 is a hydrogen atom or methyl group, R 7 is selected from the group consisting of tert-butyl, methoxymethyl, tetrahydropyranyl, and trialkylsilyl groups, and R 8 is a lower alkoxy group or a hydrogen atom, and letters f, g and h satisfy f+g+h=1.
Claim 3
Dependent Claim
21 words
A resist composition according to claim 1 wherein said base resin has a molecular weight dispersity Mw/Mn of 1.0 to 1.4.
Claim 4
Dependent Claim
18 words
A resist composition as in claim 1, wherein the base resin is of the rational formula (1) ##STR32##
Claim 5
Dependent Claim
21 words
A resist composition according to claim 3, wherein said base resin has a molecular weight dispersity Mw/Mn of 1.0 to 1.4.
Claim 6
Dependent Claim
18 words
A resist composition as in claim 1, wherein the base resin is of the rational formula (2) ##STR33##
Claim 7
Dependent Claim
21 words
A resist composition according to claim 5, wherein said base resin has a molecular weight dispersity Mw/Mn of 1.0 to 1.4.
Claim 8
Dependent Claim
18 words
A resist composition as in claim 1, wherein the base resin is of the rational formula (3) ##STR34##
Claim 9
Dependent Claim
21 words
A resist composition according to claim 7, wherein said base resin has a molecular weight dispersity Mw/Mn of 1.0 to 1.4.
Claim 10
Dependent Claim
26 words
A resist composition as in claim 1, wherein the base resin is of the rational formula ##STR35## wherein a+b=1 ##STR36## wherein c+d+e=1 or ##STR37## wherein f+g+h=1.
Claim 11
Dependent Claim
14 words
A resist composition as in claim 9, wherein the acid release agent is ##STR38##
Claim 12
Dependent Claim
13 words
A resist composition as in claim 9, wherein the dissolution inhibitor is 2,2,bis[p-(t-butoxycarboxyloxy)-phenylpropane.
Claim 13
Dependent Claim
26 words
A resist composition as in claim 1, wherein the base resin is a poly-tert-butoxy-α-methylstyrene, polyhydroxystyrene or of the rational formulae ##STR39## wherein a+b=1; a+d+e=1, and f+g+h=1.
References Cited (Backward Citations)
US4603101A
Cited
US5128231A
Cited
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1997-10-03 | 1998-04-04 | 1998-10-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-10-03 | 2002-04-04 | 2002-10-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-10-03 | 2006-04-04 | 2006-10-04 | $7700.00 | Window Closed / Lapsed |