US4603101A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials
Assignee: Shin Etsu MicroSi Inc
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Filing: 1985-09-27
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Granted: 1986-07-29
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Expires: 2005-09-27
Abstract
Abstract t-Butylvinylaryl ethers are provided which can be used to make t-butyl substituted polyaryl ethers and photoresist compositions. The photoresist compositions can be made by combining the t-butylpolyaryl ethers with aromatic onium salts.
Inventors
- 👤 James V. Crivello
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 21:40
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; C; C08; C08F; C08F12/00; C08F12/02; C08F12/04; C08F12/14; C08F12/22; G03F7/038
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
133 words
A photoresist composition comprising (A) a polystyrene consisting essentially of chemically combined units of the formula ##STR9## (B) an effective amount of a cationic photoinitiator, (C) from 10 to 95 parts of an inert organic solvent per part of (A), where R is a monovalent radical selected from the class consisting of C.sub.(1-8) alkyl radicals and C.sub.(6-14) aryl radicals, R 1 and R 2 are the same or different C.sub.(1-8) monovalent alkyl radicals, R 3 is a monovalent radical selected from hydrogen and C.sub.(1-3) alkyl, and R 4 is a monovalent radical selected from hydrogen, C.sub.(1-3) alkyl and mixtures thereof, R 5 is selected from the same or different C.sub.(1-8) alkyl radicals, Cl, Br, NO 2 , CN, C.sub.(1-8) alkoxy and C.sub.(1-8) alkyl ester and a is equal to 0 to 2 inclusive.
Claim 2
Dependent Claim
133 words
A photoresist composition comprising (A) a polystyrene consisting essentially of chemically combined units of the formula ##STR9## (B) an effective amount of a cationic photoinitiator, (C) from 10 to 95 parts of an inert organic solvent per part of (A), where R is a monovalent radical selected from the class consisting of C.sub.(1-8) alkyl radicals and C.sub.(6-14) aryl radicals, R 1 and R 2 are the same or different C.sub.(1-8) monovalent alkyl radicals, R 3 is a monovalent radical selected from hydrogen and C.sub.(1-3) alkyl, and R 4 is a monovalent radical selected from hydrogen, C.sub.(1-3) alkyl and mixtures thereof, R 5 is selected from the same or different C.sub.(1-8) alkyl radicals, Cl, Br, NO 2 , CN, C.sub.(1-8) alkoxy and C.sub.(1-8) alkyl ester and a is equal to 0 to 2 inclusive.
Claim 3
Dependent Claim
17 words
A photoresist composition in accordance with claim 1, wherein the polymer consists of chemically combined 4-t-butoxystyrene units.
Claim 4
Dependent Claim
17 words
A photoresist composition in accordance with claim 1, where the polymer consists of chemically combined 4-t-butoxy-α-methylstyrene units.
Claim 5
Dependent Claim
14 words
A photoresist composition in accordance with claim 1, utilizing diaryliodonium salt as the photoinitiator.
Claim 6
Dependent Claim
15 words
A photoresist composition in accordance with claim 1, using a triarylsulfonium salt as the photoinitiator.
References Cited (Backward Citations)
US4491628A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-07-28 | 1990-01-27 | 1990-07-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-07-28 | 1994-01-27 | 1994-07-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-07-28 | 1998-01-27 | 1998-07-29 | $7700.00 | Window Closed / Lapsed |