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US5346729A Expired / Lapsed US ⏱️ 0.0 years remaining

Solar-induced chemical vapor deposition of diamond-type carbon films

Assignee: Alliance for Sustainable Energy LLC
•
Filing: 1993-05-17
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Granted: 1994-09-13
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Expires: 2013-05-17
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Abstract

Abstract An improved chemical vapor deposition method for depositing transparent continuous coatings of sp 3 -bonded diamond-type carbon films, comprising: a) providing a volatile hydrocarbon gas/H 2 reactant mixture in a cold wall vacuum/chemical vapor deposition chamber containing a suitable substrate for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm 2 through said reactant mixture to produce substrate temperatures of about 750° C. to about 950° C. to activate deposition of the film on said substrate.

Inventors

  • 👤 J. Roland Pitts
  • 👤 C. Edwin Tracy
  • 👤 David E. King
  • 👤 James T. Stanley

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 16:19
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/27; C23C16/44; C23C16/48; C23C16/481; Y; Y10; Y10S; Y10S427/00; Y10S427/103

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 94 words
A chemical vapor deposition method for depositing transparent continuous coatings of sp 3 -bonded diamond carbon film, comprising: a) providing a volatile hydrocarbon gas/ H 2 reactant mixture in a cold wall vacuum chemical vapor deposition chamber containing a substrate for said films, at pressures of from about 1 to about 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm 2 through said reactant mixture to produce substrate temperatures of about 750° C. to about 950° C. to activate deposition of the film on said substrate.
Claim 2
Dependent Claim 94 words
A chemical vapor deposition method for depositing transparent continuous coatings of sp 3 -bonded diamond carbon film, comprising: a) providing a volatile hydrocarbon gas/ H 2 reactant mixture in a cold wall vacuum chemical vapor deposition chamber containing a substrate for said films, at pressures of from about 1 to about 50 Torr; and b) directing a concentrated solar flux of from about 40 to about 60 watts/cm 2 through said reactant mixture to produce substrate temperatures of about 750° C. to about 950° C. to activate deposition of the film on said substrate.
Claim 3
Dependent Claim 11 words
The process of claim 1, wherein the volatile hydrocarbon is methane.
Claim 4
Dependent Claim 11 words
The process of claim 1, wherein the volatile hydrocarbon is ethane.
Claim 5
Dependent Claim 11 words
The process of claim 1, wherein the volatile hydrocarbon is ethylene.
Claim 6
Dependent Claim 35 words
The process of claim 2, wherein the substrate is Ni on which an interface layer selected from silicon nitride or silicon carbide has been interposed prior to providing said volatile hydrocarbon gas/H 2 reactant mixture.
Claim 7
Dependent Claim 11 words
The process of claim 2, wherein the substrate is polycrystalline silicon.
Claim 8
Dependent Claim 11 words
The process of claim 2, wherein the substrate is gallium arsenide.
Claim 9
Dependent Claim 13 words
The process of claim 2, wherein the substrate is a single crystalline silicon.
Claim 10
Dependent Claim 20 words
The process of claim 2, wherein the substrate is a polycrystalline silicon wafer prepolished with about 1 μm diamond powder.
Claim 11
Dependent Claim 19 words
The process of claim 2, wherein the methane is from about 1 to about 10% by volume in hydrogen.
Claim 12
Dependent Claim 11 words
The process of claim 1, wherein neopentane is substituted for hydrogen.
Claim 13
Dependent Claim 11 words
The process of claim 1, wherein neopentane is admixed with hydrogen.

References Cited (Backward Citations)

US4565618A Cited
JPS61236691A Cited
JPS62138394A Cited
US5053180A Cited
US4869923A Cited
US5015494A Cited
JPS63288991A Cited
JPS63288992A Cited
US4992298A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-09-12 1998-03-14 1998-09-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-09-12 2002-03-14 2002-09-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-09-12 2006-03-14 2006-09-13 $7700.00 Window Closed / Lapsed

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