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US5336456A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of producing a scribelined layout structure for plastic encapsulated circuits

Assignee: Intel Corp
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Filing: 1992-12-15
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Granted: 1994-08-09
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Expires: 2012-12-15
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Abstract

Abstract A method of producing surface features having topological variances in the scribeline areas of a wafer adjacent to the dies. Surface features are used to reduce fracturing of molding compound and to prevent movement of the molding compound with respect to the surface of a die in a plastic encapsulated integrated circuit.

Inventors

  • 👤 Steven R. Eskildsen
  • 👤 Suresh V. Golwalkar
  • 👤 Tito Barrios

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 18:46
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/10; H10W74/111; B; B29; B29C; B29C37/00; B29C37/0078; B29C37/0082; B29C45/00; B29C45/14; B29C45/14311; B29C70/00; B29C70/68; B29C70/681; B29C70/683; B29C70/70; B29L; B29L2031/00; B29L2031/34; B29L2031/3425

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 200 words
A method for reducing fracturing of molding compound surrounding an encapsulated integrated circuit die and preventing the movement of said molding compound with respect to the surface of said integrated circuit die, said method comprising the steps of: a) producing a plurality of surface features in the scribeline areas of a wafer adjacent to said die, such that said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die: c) encapsulating said die with said molding compound such that said molding compound extends into and makes contact with said surface features present in said scribeline areas, thereby locking said molding compound around said die and further wherein the step of producing surface features includes the step of producing a plurality of trenches etched into said scribeline areas in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die when said die is encapsulated with said molding; and wherein said trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding compound.
Claim 2
Independent Claim 200 words
A method for reducing fracturing of molding compound surrounding an encapsulated integrated circuit die and preventing the movement of said molding compound with respect to the surface of said integrated circuit die, said method comprising the steps of: a) producing a plurality of surface features in the scribeline areas of a wafer adjacent to said die, such that said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die: c) encapsulating said die with said molding compound such that said molding compound extends into and makes contact with said surface features present in said scribeline areas, thereby locking said molding compound around said die and further wherein the step of producing surface features includes the step of producing a plurality of trenches etched into said scribeline areas in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die when said die is encapsulated with said molding; and wherein said trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding compound.
Claim 3
Independent Claim 208 words
A method for reducing fracturing of molding compound surrounding an encapsulated integrated circuit die and preventing the movement of said molding compound with respect to the surface of said integrated circuit die, said method comprising the steps of: a) producing a plurality of surface features in the scribeline areas of a wafer adjacent to said die, such that said plurality of surface features have topological variance: b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die: c) encapsulating said die with said molding compound such that said molding compound extends into and makes contact with said surface features present in said scribeline areas, thereby locking said molding compound around said die, and further wherein the step of producing surface features includes the step of producing a plurality of trenches etched into said scribeline areas by use of a mask when fabricating said die; wherein said plurality of trenches are arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding compound.
Claim 4
Independent Claim 208 words
A method for reducing fracturing of molding compound surrounding an encapsulated integrated circuit die and preventing the movement of said molding compound with respect to the surface of said integrated circuit die, said method comprising the steps of: a) producing a plurality of surface features in the scribeline areas of a wafer adjacent to said die, such that said plurality of surface features have topological variance: b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die: c) encapsulating said die with said molding compound such that said molding compound extends into and makes contact with said surface features present in said scribeline areas, thereby locking said molding compound around said die, and further wherein the step of producing surface features includes the step of producing a plurality of trenches etched into said scribeline areas by use of a mask when fabricating said die; wherein said plurality of trenches are arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding compound.
Claim 5
Dependent Claim 232 words
A process for reducing stress on an encapsulated integrated circuit die and preventing the movement of a molding compound on said encapsulated integrated circuit die with respect to the surface of said integrated circuit die comprising the steps of: a) producing a plurality of surface features having a plurality of corners in the scribeline areas of a wafer adjacent to said die wherein said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die; and c) encapsulating said die with said molding compound such that said molding compound extends in and makes contact with said surface features present in said scribeline areas to lock said molding compound around said die, wherein said corners distribute the stress, and further wherein the step of producing includes the step of producing said topological variances of said surface features such that said surface features produced in said scribeline areas comprise a plurality of trenches etched into said scribeline areas and arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said plurality of trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding, such that the stress on said die is reduced.
Claim 6
Dependent Claim 232 words
A process for reducing stress on an encapsulated integrated circuit die and preventing the movement of a molding compound on said encapsulated integrated circuit die with respect to the surface of said integrated circuit die comprising the steps of: a) producing a plurality of surface features having a plurality of corners in the scribeline areas of a wafer adjacent to said die wherein said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die; and c) encapsulating said die with said molding compound such that said molding compound extends in and makes contact with said surface features present in said scribeline areas to lock said molding compound around said die, wherein said corners distribute the stress, and further wherein the step of producing includes the step of producing said topological variances of said surface features such that said surface features produced in said scribeline areas comprise a plurality of trenches etched into said scribeline areas and arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said plurality of trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in said molding, such that the stress on said die is reduced.
Claim 7
Dependent Claim 243 words
A process for reducing stress on an encapsulated integrated circuit die and preventing the movement of a molding compound on said encapsulated integrated circuit die with respect to the surface of said integrated circuit die comprising the steps of; a) producing a plurality of surface features having a plurality of corners in the scribeline areas of a wafer adjacent to said die wherein said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die; and c) encapsulating said die with said molding compound such that said molding compound extends in and makes contact with said surface features present in said scribeline areas to lock said molding compound around said die, wherein said corners distribute the stress, wherein the step of producing includes the step of producing said topological variances of said surface features such that said surface features produced in said scribeline areas comprise a plurality of trenches etched into said scribeline areas using a mask when fabricating said die; wherein said plurality of trenches are arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said plurality of trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in aid molding compound, such that the stress on said die is reduced.
Claim 8
Dependent Claim 243 words
A process for reducing stress on an encapsulated integrated circuit die and preventing the movement of a molding compound on said encapsulated integrated circuit die with respect to the surface of said integrated circuit die comprising the steps of; a) producing a plurality of surface features having a plurality of corners in the scribeline areas of a wafer adjacent to said die wherein said plurality of surface features have topological variance; b) separating said wafer into individual dies such that said plurality of surface features remain adjacent to said die; and c) encapsulating said die with said molding compound such that said molding compound extends in and makes contact with said surface features present in said scribeline areas to lock said molding compound around said die, wherein said corners distribute the stress, wherein the step of producing includes the step of producing said topological variances of said surface features such that said surface features produced in said scribeline areas comprise a plurality of trenches etched into said scribeline areas using a mask when fabricating said die; wherein said plurality of trenches are arranged in patterns designed such that said molding compound locks said die in both the x and y directions along the surface of said die; and wherein said plurality of trenches are arranged in patterns such that additional corners are produced in said scribeline areas to alleviate stresses in aid molding compound, such that the stress on said die is reduced.

References Cited (Backward Citations)

US3533896A Cited
US4224101A Cited
US4725561A Cited
US4904617A Cited
US4929300A Cited
US4984358A Cited
US5024970A Cited
US5017512A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-08-08 1998-02-07 1998-08-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-08-08 2002-02-07 2002-08-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-08-08 2006-02-07 2006-08-09 $7700.00 Window Closed / Lapsed

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