US5332482A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method and apparatus for depositing an oxide film
Assignee: Rohm Co Ltd
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Filing: 1993-03-26
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Granted: 1994-07-26
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Expires: 2013-03-26
Abstract
Abstract The specification discloses a method and apparatus for depositing an oxide film by ion-beam sputtering in which an oxide film is formed on the surface of a wafer by sputtering particles from a target toward the wafer and supplying ozone adjacent to the wafer to oxidize the particles that are close to the surface of the wafer.
Inventors
- 👤 Katsumi Sameshima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 07:48
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0047; C23C14/22; C23C14/34; C23C14/46
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
90 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward a surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface before the particles are deposited on the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 2
Independent Claim
90 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward a surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface before the particles are deposited on the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 3
Dependent Claim
101 words
A film-depositing apparatus comprising a target, an ion beam source for emitting an ion beam toward the target, means for supporting a member having a surface in a position for the surface to receive the particles sputtered from the target, and ozone supply means for supplying ozone to a region adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target before they are deposited on the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 4
Dependent Claim
101 words
A film-depositing apparatus comprising a target, an ion beam source for emitting an ion beam toward the target, means for supporting a member having a surface in a position for the surface to receive the particles sputtered from the target, and ozone supply means for supplying ozone to a region adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target before they are deposited on the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 5
Independent Claim
93 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward an irregular surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface to form a substantially uniform layer on the irregular surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 6
Independent Claim
93 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward an irregular surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface to form a substantially uniform layer on the irregular surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 7
Independent Claim
85 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a lead titanate zirconate target toward a surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 8
Independent Claim
85 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a lead titanate zirconate target toward a surface on which an oxide film is to be formed and supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 9
Independent Claim
93 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward a surface on which an oxide film is to be formed, supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface and heating the surface to provide high crystallinity in the oxide film while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
Claim 10
Independent Claim
93 words
A method for depositing an oxide film by ion-beam sputtering comprising sputtering particles from a target toward a surface on which an oxide film is to be formed, supplying ozone adjacent to the surface from an ozonizer to produce a blanket of ozone without oxygen ions adjacent to the surface to oxidize particles that have been sputtered from the target at a location close to the surface and heating the surface to provide high crystallinity in the oxide film while avoiding damage to the deposited film resulting from the presence of ionized oxygen.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-07-25 | 1998-01-24 | 1998-07-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-07-25 | 2002-01-24 | 2002-07-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-07-25 | 2006-01-24 | 2006-07-26 | $7700.00 | Window Closed / Lapsed |