Abstract A process for forming a thin film on a surface of a semiconductor device. The process involves formation of a silicon dioxide film by plasma enhanced thermal oxidation, employing a mixture of ozone and oxygen which are generated separately from the reactor chamber in a volume ratio of about 1-10/1, preferably about 5-7/1, at a temperature generally below 440° C., preferably about 350°-400° C. The process is used to form sidewall oxide spacers on polysilicon gates for field effect transistors. A relatively fast oxidation rate is achieved at a temperature significantly below that employed in conventional oxidation processes, and this serves to reduce dopant diffusion from the polysilicon. In addition, the resulting film demonstrates low stress with good conformal step coverage of the polysilicon gates. Another use of the process is to grow thin gate oxides and oxide-nitride-oxide with a thickness of less than 100Å. An oxide film of uniform thickness is formed by controlling the temperature, RF power, exposure time and oxygen/ozone ratio for thin gate oxide (<100Å) application in ULSI FET fabrication.
A method for oxidizing a surface of a substrate comprising the steps of: placing said substrate in a chamber, heating said chamber to a temperature not exceeding 440° C., supplying a plasma comprising a mixture of reactive gases of oxygen and ozone including both oxygen and ozone ions and radicals, which mixture is generated outside said chamber, into said chamber, and oxidizing said surface to grow an oxide layer in the presence of said mixture.
Claim 2
Independent Claim
75 words
A method for oxidizing a surface of a substrate comprising the steps of: placing said substrate in a chamber, heating said chamber to a temperature not exceeding 440° C., supplying a plasma comprising a mixture of reactive gases of oxygen and ozone including both oxygen and ozone ions and radicals, which mixture is generated outside said chamber, into said chamber, and oxidizing said surface to grow an oxide layer in the presence of said mixture.
Claim 3
Dependent Claim
30 words
A method as in claim 1 further comprising the step of applying r.f. energy into said chamber to re-excite and re-distribute ozone in said chamber to achieve oxide thickness uniformity.
Claim 4
Dependent Claim
17 words
A method as in claim 2 wherein said r.f. Power is in the range of (100-600) watts.
Claim 5
Dependent Claim
11 words
A method as in claim 1 wherein said substrate is silicon.
Claim 6
Dependent Claim
11 words
A method as in claim 1 wherein said substrate is GaAs.
Claim 7
Dependent Claim
16 words
A method as in claim 1 wherein said substrate is an alloy of SiGe x .
Claim 8
Dependent Claim
20 words
A method as in claim 1 wherein said mixture comprises ozone and oxygen in a volume ratio of about 1-10/1.
Claim 9
Dependent Claim
34 words
A method as in claim 1 further comprising the steps of elevating the temperature in said chamber and subjecting said substrate to rapid thermal oxidation in an oxygen-ozone plasma environment further oxidizing said surface.
Claim 10
Dependent Claim
20 words
A method as in claim 8 wherein said temperature is less than 800° C. for said rapid thermal oxidation step.
Claim 11
Dependent Claim
17 words
A method as claimed in claim 1 wherein said temperature is in the range of 350°-400° C.