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US5319220A Expired / Lapsed US ⏱️ 0.0 years remaining

Silicon carbide semiconductor device

Assignee: Sharp Corp
•
Filing: 1992-06-08
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Granted: 1994-06-07
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Expires: 2012-06-08
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Abstract

Abstract A silicon carbide semiconductor device is provided which includes at least one heterojunction composed of two different polytypes of silicon carbide. The two polytypes of silicon carbide in the heterojunction include a β-type silicon carbide layer having an α-type silicon carbide layer disposed thereon.

Inventors

  • 👤 Akira Suzuki
  • 👤 Katsuki Furukawa
  • 👤 Mitsuhiro Shigeta
  • 👤 Yoshihisa Fujii
  • 👤 Atsuko Ogura

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 14:29
CPC Classifications
H; H10; H10H; H10H20/00; H10H20/80; H10H20/81; H10H20/822; H10H20/826; H10D; H10D10/00; H10D10/80; H10D10/821; H10D62/00; H10D62/80; H10D62/83; H10D62/832; H10D62/8325; H10F; H10F77/00; H10F77/10; H10F77/12; H10F77/122; H10F77/1226; Y; Y10; Y10S; Y10S438/00; Y10S438/931

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 137 words
A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a light-emitting diode including: an n-type conductivity β-type silicon carbide semiconductor substrate, a first p-type conductivity β-type silicon carbide semiconductor layer grown on said n-type conductivity β-type silicon carbide semiconductor substrate, a second p-type conductivity α-type silicon carbide semiconductor layer grown on said p-type conductivity B-type silicon carbide semiconductor layer formed on said n-type conductivity β-type silicon carbide semiconductor substrate, an n-sided ohmic electrode disposed on a back face of said n-type conductivity β-type silicon carbide semiconductor substrate opposite to the face of said n-type conductivity β-type silicon carbide semiconductor substrate having said first p-type conductivity β-type silicon carbide semiconductor layer grown thereon, and a p-sided ohmic electrode disposed on the upper face of said second p-type conductivity α-type silicon carbide semiconductor layer.
Claim 2
Dependent Claim 137 words
A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a light-emitting diode including: an n-type conductivity β-type silicon carbide semiconductor substrate, a first p-type conductivity β-type silicon carbide semiconductor layer grown on said n-type conductivity β-type silicon carbide semiconductor substrate, a second p-type conductivity α-type silicon carbide semiconductor layer grown on said p-type conductivity B-type silicon carbide semiconductor layer formed on said n-type conductivity β-type silicon carbide semiconductor substrate, an n-sided ohmic electrode disposed on a back face of said n-type conductivity β-type silicon carbide semiconductor substrate opposite to the face of said n-type conductivity β-type silicon carbide semiconductor substrate having said first p-type conductivity β-type silicon carbide semiconductor layer grown thereon, and a p-sided ohmic electrode disposed on the upper face of said second p-type conductivity α-type silicon carbide semiconductor layer.
Claim 3
Dependent Claim 121 words
A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a bipolar transistor including: an n-type conductivity β-type silicon carbide collector layer, a p-type conductivity β-type silicon carbide base layer grown on said n-type conductivity β-type silicon carbide collector layer, an n-type conductivity α-type silicon carbide emitter layer grown on said p-type conductivity β-type silicon carbide base layer, a collector electrode disposed on a back face of said n-type conductivity β-type silicon carbide collector layer opposite to the face of said n-type conductivity β-type silicon carbide collector layer having said p-type conductivity β-type silicon carbide base layer grown thereon, and an emitter electrode disposed on the upper face of said n-type conductivity α-type silicon carbide emitter layer.
Claim 4
Dependent Claim 121 words
A silicon carbide semiconductor device comprising at least one α/βheterojunction, wherein the device comprises a bipolar transistor including: an n-type conductivity β-type silicon carbide collector layer, a p-type conductivity β-type silicon carbide base layer grown on said n-type conductivity β-type silicon carbide collector layer, an n-type conductivity α-type silicon carbide emitter layer grown on said p-type conductivity β-type silicon carbide base layer, a collector electrode disposed on a back face of said n-type conductivity β-type silicon carbide collector layer opposite to the face of said n-type conductivity β-type silicon carbide collector layer having said p-type conductivity β-type silicon carbide base layer grown thereon, and an emitter electrode disposed on the upper face of said n-type conductivity α-type silicon carbide emitter layer.

References Cited (Backward Citations)

US3504181A Cited
US4531142A Cited
US4623425A Cited
JPS60145992A Cited
US4757028A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1997-06-06 1997-12-06 1998-06-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2001-06-06 2001-12-06 2002-06-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2005-06-06 2005-12-06 2006-06-07 $7700.00 Window Closed / Lapsed

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