Patent US5318632A successfully refreshed from Google Patents.
US5318632A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Wafer process tube apparatus and method for vertical furnaces
Assignee: Kawasaki Microelectronics Inc
•
Filing: 1993-05-21
•
Granted: 1994-06-07
•
Expires: 2013-05-21
Abstract
Abstract A cap inserted into a wafer process tube for vertical furnaces is provided with exhaust flow normalizing means which can control or prevent variations in exhaust flow rates in the process tube, and thereby control variations in thickness of wafers subjected to film forming and annealing. In the alternative, an annular hollow ring is hermetically sealed around an outer circumferential surface of the process tube. An exhaust pipe is connected to the hollow annular ring. Gas communication holes are formed in the wall of the process tube to accommodate the flow of gas between the tube and the hollow annular ring. The spacing and cross-sectional area of the communication holes are such as to equalize flow resistance circumferentially around the cap. In-plane variations and wafer to wafer variations in thickness and quality of wafers subjected to film forming and annealing thereby are reduced and controlled.
Inventors
- 👤 Kiyoshi Onodera
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 04:21
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45502; C23C16/4412; H; H10; H10P; H10P72/00; H10P72/04; H10P72/0431; H10P72/0436; Y; Y10; Y10S; Y10S156/00; Y10S156/912
Claims Analysis
Total Claims: 28
Claim 1
Independent Claim
131 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises: a cap inserted into said open end, but spaced apart from said tube with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having a groove about the circumference of said cap, with said groove having a diameter at least equal to that of said exhaust port and located vertically in close proximity to said exhaust port.
Claim 2
Independent Claim
131 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises: a cap inserted into said open end, but spaced apart from said tube with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having a groove about the circumference of said cap, with said groove having a diameter at least equal to that of said exhaust port and located vertically in close proximity to said exhaust port.
Claim 3
Dependent Claim
13 words
The apparatus set forth in claim 1 above, wherein said groove is horizontal.
Claim 4
Dependent Claim
27 words
The apparatus set forth in claim 1 above, wherein said groove is inclined with the lowest part of said groove in close proximity to said exhaust port.
Claim 5
Independent Claim
123 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises a cap inserted into said open end but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having an inclined ring fixed about the outer circumference of said cap with the lowest part of said ring in close proximity to said exhaust port.
Claim 6
Independent Claim
123 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises a cap inserted into said open end but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having an inclined ring fixed about the outer circumference of said cap with the lowest part of said ring in close proximity to said exhaust port.
Claim 7
Independent Claim
137 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises a cap inserted into said open end but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having horizontal ring means fixed to the outer circumference of said cap and located above said exhaust port near said upper end surface for equalizing flow resistance encountered by a gas flowing from said gas inlet to said exhaust port.
Claim 8
Independent Claim
137 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises a cap inserted into said open end but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having horizontal ring means fixed to the outer circumference of said cap and located above said exhaust port near said upper end surface for equalizing flow resistance encountered by a gas flowing from said gas inlet to said exhaust port.
Claim 9
Dependent Claim
57 words
The apparatus set forth in claim 5, wherein said horizontal ring means comprises a ring having a plurality of spaced apart cutout regions of uniform cross-sectional area, with the circumferential distance between such cutout regions gradually decreasing in proceeding one hundred eighty (180) degrees around said ring from a position in closest proximity to said exhaust port.
Claim 10
Dependent Claim
57 words
The apparatus set forth in claim 5, wherein said horizontal ring means comprises a ring having a plurality of cutout regions which are spaced apart by an equal circumferential distance, and which have cross-sectional areas that gradually increase in proceeding one hundred eighty degrees around said ring from a position in closest proximity to said exhaust port.
Claim 11
Dependent Claim
43 words
The apparatus set forth in claim 5, wherein said horizontal ring means comprises a ring with the vertical height of said ring gradually decreasing in proceeding one hundred eighty degrees around said ring from a position in closest proximity to said exhaust port.
Claim 12
Dependent Claim
43 words
The apparatus set forth in claim 5, wherein said horizontal ring means comprises a ring with the horizontal width of said ring gradually decreasing in proceeding one hundred eighty degrees around said ring from a position in closest proximity to said exhaust port.
Claim 13
Independent Claim
134 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises: a cap inserted into said open end, but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having an interior passage with a first open end centrally located in said upper end surface and a second open end located in the outer circumferential surface of said cap in close proximity to said exhaust port.
Claim 14
Independent Claim
134 words
An apparatus for normalizing gas flow rates in a wafer process tube of a vertical furnace, wherein said tube has a lower open end and an upper end enclosed about a gas inlet, and further has an exhaust port in a wall of said tube near said open end, which comprises: a cap inserted into said open end, but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port, and a lower end surface of said cap hermetically sealed to said open end below said exhaust port, said cap having an interior passage with a first open end centrally located in said upper end surface and a second open end located in the outer circumferential surface of said cap in close proximity to said exhaust port.
Claim 15
Dependent Claim
30 words
The apparatus set forth in claim 10 above, with said passage having a cavity near said first open end and of diameter larger than that of said first open end.
Claim 16
Independent Claim
120 words
A method for normalizing gas flow rates in a wafer process tube of a vertical furnace, said tube having a lower open end, an upper end enclosed about a gas inlet, and an exhaust port in a wall of said tube near said open end, comprising the steps of: inserting a cap through said open end and into but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port; hermetically sealing a lower end surface of said cap to said open end to avoid leakage of gas from said tube; and altering the outer circumferential surface of said cap to normalize gas flow rates between said gas inlet and said exhaust port.
Claim 17
Independent Claim
120 words
A method for normalizing gas flow rates in a wafer process tube of a vertical furnace, said tube having a lower open end, an upper end enclosed about a gas inlet, and an exhaust port in a wall of said tube near said open end, comprising the steps of: inserting a cap through said open end and into but spaced apart from said tube, with an upper end surface of said cap located above said exhaust port; hermetically sealing a lower end surface of said cap to said open end to avoid leakage of gas from said tube; and altering the outer circumferential surface of said cap to normalize gas flow rates between said gas inlet and said exhaust port.
Claim 18
Dependent Claim
42 words
The method set forth in claim 12, wherein the step of altering includes: forming a groove having a diameter at least equal to that of said exhaust port about the circumference of said cap and in close proximity to said exhaust port.
Claim 19
Dependent Claim
12 words
The method set forth in claim 13, wherein said groove is horizontal.
Claim 20
Dependent Claim
26 words
The method set forth in claim 13 wherein said groove is inclined with the lowest part of said groove in close proximity to said exhaust port.
Claim 21
Dependent Claim
23 words
The method set forth in claim 12, wherein the step of altering includes: fixing a ring about the outer circumference of said cap.
Claim 22
Dependent Claim
26 words
The method set forth in claim 16, wherein said ring is inclined with a lowest part of said ring in close proximity to said exhaust port.
Claim 23
Dependent Claim
23 words
The method set forth in claim 16, wherein said ring is horizontal and located above said exhaust port near said upper end surface.
Claim 24
Dependent Claim
58 words
The method set forth in claim 18, further comprising the steps of removing a plurality of regions from said ring, wherein said regions are spaced apart by equal circumferential distances, and said regions have cross-sectional areas that gradually increase in proceeding one hundred eighty degrees around said ring from a position in closest proximity to said exhaust port.
Claim 25
Dependent Claim
46 words
The method set forth in claim 18, further comprising the step of shaping said ring in vertical height such that said ring gradually decreases in vertical height in proceeding one hundred eighty degrees around said ring form a position in closest proximity to said exhaust port.
Claim 26
Dependent Claim
46 words
The method set forth in claim 18, further comprising the step of shaping said ring in horizontal width such that said ring gradually decreases in horizontal width in proceeding one hundred eighty degrees around said ring from a position in closes proximity to said exhaust port.
Claim 27
Dependent Claim
56 words
The method set forth in claim 12, wherein the step of altering includes forming an interior passage through said cap with a first open end of said passage located centrally in said upper end surface and a second open end located in the outer circumferential surface of said cap in close proximity to said exhaust port.
Claim 28
Dependent Claim
40 words
The method set forth in claim 22, further including the step of forming a cavity in said cap having a diameter larger than that of said first open end and axially aligned with said passage near said first open end.
References Cited (Backward Citations)
US4640223A
Cited
EP0385382A2
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-06-06 | 1997-12-06 | 1998-06-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-06-06 | 2001-12-06 | 2002-06-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-06-06 | 2005-12-06 | 2006-06-07 | $7700.00 | Window Closed / Lapsed |