US5314780A — Method for treating metal substrate for electro-p…

Claim 1

Independent Claim 142 words

A method of treating a metal substrate for an electrophotographic photosensitive member by a process comprising the steps of; a) cutting the surface of said substrate to remove the surface in the desired thickness; and b) bringing the cut surface of said substrate into contact with water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11 MΩ·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes a pressure of from 1 kg·f/cm 2 to 300 kg·f/cm 2 .

Claim 2

Independent Claim 142 words

A method of treating a metal substrate for an electrophotographic photosensitive member by a process comprising the steps of; a) cutting the surface of said substrate to remove the surface in the desired thickness; and b) bringing the cut surface of said substrate into contact with water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11 MΩ·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes a pressure of from 1 kg·f/cm 2 to 300 kg·f/cm 2 .

Claim 3

Dependent Claim 24 words

The method according to claim 1, wherein said process has the step of cleaning the substrate between said cutting step and said water-contact step.

Claim 4

Dependent Claim 17 words

The method according to claim 2, wherein said cleaning step is carried out using an organic solvent.

Claim 5

Dependent Claim 12 words

The method according to claim 3, wherein said organic solvent contains trichloroethane.

Claim 6

Dependent Claim 83 words

The method according to claim 2, wherein said cleaning step is carried out using water having a a resistivity of not less than 1M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 100,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 1,000 per milliliter and containing an organic matter in a quantity of not more than 100 mg per liter.

Claim 7

Dependent Claim 18 words

The method according to claim 2, wherein said cleaning step is carried out using water containing a surfactant.

Claim 8

Dependent Claim 29 words

The method according to claim 6, wherein said surfactant is selected from the group consisting of an anionic surfactant, a cationic surfactant, a nonionic surfactant and an amphoteric surfactant.

Claim 9

Dependent Claim 18 words

The method according to claim 2, wherein said cleaning step is carried out using water containing sodium tripolyphosphate.

Claim 10

Dependent Claim 25 words

The method according to claim 2, wherein said cleaning step is carried out using water having a temperature of from 10° C. to 90° C.

Claim 11

Dependent Claim 19 words

The method according to claim 2, wherein said cleaning step is carried out using water and an ultrasonic wave.

Claim 12

Dependent Claim 20 words

The method according to claim 10, wherein said ultrasonic wave has a frequency of from 100 Hz to 10 MHz.

Claim 13

Dependent Claim 20 words

The method according to claim 11, wherein said ultrasonic wave has an output of from 0.1 W/liter to 500 W/liter.

Claim 14

Dependent Claim 20 words

The method according to claim 11, wherein said ultrasonic wave has a frequency of from 20 kHz to 10 MHz.

Claim 15

Dependent Claim 25 words

The method according to claim 1, wherein said water-contact step is started in from 1 minute to 16 hours after completion of said cutting step.

Claim 16

Independent Claim 173 words

A method of manufacturing an electrophotographic photosensitive member having a metal substrate provided thereon with at least a photoconductive layer, by a process comprising the steps of; a) cutting the surface of said substrate to remove the surface in the desired thickness; b) bringing the cut surface of said substrate into contact with water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μM in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes at a pressure of from 1 kg·f/cm 2 to 300 kg·f/cm 2 ; and c) forming said photoconductive layer on the substrate having been subjected to the step of bringing the cut surface into said water.

Claim 17

Independent Claim 173 words

A method of manufacturing an electrophotographic photosensitive member having a metal substrate provided thereon with at least a photoconductive layer, by a process comprising the steps of; a) cutting the surface of said substrate to remove the surface in the desired thickness; b) bringing the cut surface of said substrate into contact with water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μM in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes at a pressure of from 1 kg·f/cm 2 to 300 kg·f/cm 2 ; and c) forming said photoconductive layer on the substrate having been subjected to the step of bringing the cut surface into said water.

Claim 18

Dependent Claim 24 words

The method according to claim 15, wherein said process has the step of cleaning the substrate between said cutting step and said water-contact step.

Claim 19

Dependent Claim 17 words

The method according to claim 16, wherein said cleaning step is carried out using an organic solvent.

Claim 20

Dependent Claim 12 words

The method according to claim 17, wherein said organic solvent contains trichloroethane.

Claim 21

Dependent Claim 83 words

The method according to claim 16, wherein said cleaning step is carried out using water having a a resistivity of not less than 1M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 100,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 1,000 per milliliter and containing an organic matter in a quantity of not more than 100 mg per liter.

Claim 22

Dependent Claim 18 words

The method according to claim 16, wherein said cleaning step is carried out using water containing a surfactant.

Claim 23

Dependent Claim 29 words

The method according to claim 20, wherein said surfactant is selected from the group consisting of an anionic surfactant, a cationic surfactant, a nonionic surfactant and an amphoteric surfactant.

Claim 24

Dependent Claim 18 words

The method according to claim 16, wherein said cleaning step is carried out using water containing sodium tripolyphosphate.

Claim 25

Dependent Claim 25 words

The method according to claim 16, wherein said cleaning step is carried out using water having a temperature of from 10° C. to 90° C.

Claim 26

Dependent Claim 19 words

The method according to claim 16, wherein said cleaning step is carried out using water and an ultrasonic wave.

Claim 27

Dependent Claim 20 words

The method according to claim 24, wherein said ultrasonic wave has a frequency of from 100 Hz to 10 MHz.

Claim 28

Dependent Claim 20 words

The method according to claim 25, wherein said ultrasonic wave has an output of from 0.1 W/liter to 500 W/liter.

Claim 29

Dependent Claim 20 words

The method according to claim 25, wherein said ultrasonic wave has a frequency of from 20 kHz to 10 MHz.

Claim 30

Dependent Claim 25 words

The method according to claim 15, wherein said water-contact step is started in from 1 minute to 16 hours after completion of said cutting step.

Claim 31

Dependent Claim 20 words

The method according to claim 15, wherein said photoconductive layer comprises a non-monocrystalline material containing at least a silicon atom.

Claim 32

Dependent Claim 22 words

The method according to claim 15, wherein said process further comprises the step of forming a surface layer on said photoconductive layer.

Claim 33

Dependent Claim 20 words

The method according to claim 30, wherein said surface layer comprises a non-monocrystalline material containing at least a silicon atom.

Claim 34

Dependent Claim 42 words

The method according to claim 15, wherein at least one of an infrared absorbing layer and/or a charge injection blocking layer is formed on the substrate having been subjected to said water-contact step, followed by said step of forming said photoconductive layer.

Claim 35

Dependent Claim 29 words

The method according to claim 32, wherein at least one of said infrared absorbing layer and/or said charge injection blocking layer comprises a non-monocrystalline material containing a silicon atom.

Claim 36

Dependent Claim 16 words

The method according to claim 33, wherein said infrared absorbing layer further contains a germanium atom.

Claim 37

Dependent Claim 27 words

The method according to claim 33, wherein said charge injection blocking layer further contains a Group III atom or a Group V atom of the periodic table.

Claim 38

Dependent Claim 15 words

The method according to claim 31, wherein said surface layer further contains a carbon atom.

Claim 39

Independent Claim 137 words

A method of manufacturing an electrophotographic photosensitive member by a process comprising the steps of: (a) cutting the surface of a metal substrate in a given precision; (b) cleaning the cut surface of said substrate with water; (c) bringing the cleaned surface of said substrate into contact with pure water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes to clean the surface.

Claim 40

Independent Claim 137 words

A method of manufacturing an electrophotographic photosensitive member by a process comprising the steps of: (a) cutting the surface of a metal substrate in a given precision; (b) cleaning the cut surface of said substrate with water; (c) bringing the cleaned surface of said substrate into contact with pure water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes to clean the surface.

Claim 41

Dependent Claim 76 words

The method according to claim 37, wherein the carbon atoms contained in said first photoconductive layer are in an amount of from 0.5 to 50 atomic % at its surface on the side of said metal substrate and substantially 0% at, or in the vicinity of, its surface on the side of said second photoconductive layer, and the hydrogen atoms contained in said photoconductive layers are in an amount of from 1 to 40 atomic %.

Claim 42

Dependent Claim 81 words

The method according to claim 38, wherein the carbon atoms contained in said surface layer are in an amount of from 40 to 90 atomic % as a value expressed by 100×carbon atom/(carbon atom+silicon atom), and halogen atoms are contained therein in such a proportion that said halogen atoms are in a content of not more than 20 atomic % and the hydrogen atoms and the halogen atoms are in a content of from 30 to 70 atomic % in total.

Claim 43

Dependent Claim 14 words

The method according to claim 37, wherein said first photoconductive layer contains halogen atoms.

Claim 44

Dependent Claim 41 words

The method according to claim 40, wherein the halogen atoms contained in said first photoconductive layer are so distributed as to have a maximum content at, or in the vicinity of, its surface on the side of said second photoconductive layer.

Claim 45

Independent Claim 227 words

A method of manufacturing an electrophotographic photosensitive member by a process comprising the steps of: (a) cutting the surface of a metal substrate in a given precision; (b) cleaning the cut surface of said substrate with water; (c) bringing the cleaned surface of said substrate into contact with pure water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes to clean the surface; and (d) forming on the cleaned substrate surface by plasma CVD a light receiving layer comprising a photoconductive layer and a surface layer each comprising a non-monocrystalline material mainly composed of a silicon atom such that said photoconductive layer contains carbon atoms and hydrogen atoms throughout the layer and said carbon atoms being distributed in a non-uniform content in the layer thickness direction and in a higher content at its surface on the side of said metal substrate and such that said surface layer contains carbon atoms and hydrogen atoms.

Claim 46

Independent Claim 227 words

A method of manufacturing an electrophotographic photosensitive member by a process comprising the steps of: (a) cutting the surface of a metal substrate in a given precision; (b) cleaning the cut surface of said substrate with water; (c) bringing the cleaned surface of said substrate into contact with pure water having a temperature of from 5° C. to 90° C., having a resistivity of not less than 11M Ω·cm at 25° C., containing fine particles with a particle diameter of not smaller than 0.2 μm in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for 10 seconds to 30 minutes to clean the surface; and (d) forming on the cleaned substrate surface by plasma CVD a light receiving layer comprising a photoconductive layer and a surface layer each comprising a non-monocrystalline material mainly composed of a silicon atom such that said photoconductive layer contains carbon atoms and hydrogen atoms throughout the layer and said carbon atoms being distributed in a non-uniform content in the layer thickness direction and in a higher content at its surface on the side of said metal substrate and such that said surface layer contains carbon atoms and hydrogen atoms.

Claim 47

Dependent Claim 74 words

The method according to claim 42, wherein the carbon atoms contained in said photoconductive layer are in an amount of from 0.5 to 50 atomic % at its surface on the side of said conductive substrate and substantially 0% at, or in the vicinity of, its surface on the side of said surface layer, and the hydrogen atoms contained in said photoconductive layer are in an amount of from 1 to 40 atomic %.

Claim 48

Dependent Claim 81 words

The method according to claim 43, wherein the carbon atoms contained in said surface layer are in an amount of from 40 to 90 atomic % as a value expressed by 100×carbon atom/(carbon atom+silicon atom), and halogen atoms are contained therein in such a proportion that said halogen atoms are in a content of not more than 20 atomic % and the hydrogen atoms and the halogen atoms are in a content of from 30 to 70 atomic % in total.

Claim 49

Dependent Claim 13 words

The method according to claim 42, wherein said photoconductive layer contains halogen atoms.

Claim 50

Dependent Claim 39 words

The method according to claim 40, wherein the halogen atoms contained in said photoconductive layer are so distributed as to have a maximum content at, or in the vicinity of, its surface on the side of said surface layer.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1997-05-23	1997-11-22	1998-05-24	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2001-05-23	2001-11-22	2002-05-24	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2005-05-23	2005-11-22	2006-05-24	$7700.00	Window Closed / Lapsed

Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member

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